公开(公告)号：NL2011248A

公开(公告)日：2014-03-03

申请号：NL2011248

申请日：2013-08-01

Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

Inventor： WARD CHRISTOPHER ,  LEENDERS MARTINUS ,  SCHUSTER MARK ,  VALENTIN CHRISTIAAN

IPC: G03F7/20

公开(公告)号：NL2010916A

公开(公告)日：2014-01-07

申请号：NL2010916

申请日：2013-06-05

Applicant: ASML NETHERLANDS BV ,  ASML HOLDING NV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  BLOKS RUUD ,  DELMASTRO PETER ,  LAURENT THIBAULT ,  LEENDERS MARTINUS ,  SCHUSTER MARK ,  WARD CHRISTOPHER ,  BOXTEL FRANK

IPC: G03F7/20

Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.

公开(公告)号：NL2005478A

公开(公告)日：2011-05-18

申请号：NL2005478

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DZIOMKINA NINA ,  KRUIJF NIEK ,  GRAAF ROELOF ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

Abstract: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. It may be resistant to degradation through exposure to DUV radiation. It may have a liquid phobic coating or property.

公开(公告)号：NL2010954A

公开(公告)日：2013-12-23

申请号：NL2010954

申请日：2013-06-12

Applicant: ASML NETHERLANDS BV

Inventor： WIT PAUL ,  LEENDERS MARTINUS ,  OTTENS JOOST ,  ZUTPHEN TOM ,  DRENT WILLIAM

IPC: G03F7/20

公开(公告)号：NL2006272A

公开(公告)日：2011-11-07

申请号：NL2006272

申请日：2011-02-22

Applicant: ASML NETHERLANDS BV

Inventor： HAM RONALD ,  BARAGONA MARCO ,  GROEN ROBERTUS ,  MAESSEN RALPH ,  TOONDER JACOB ,  KOVACEVIC-MILIVOJEVIC MILICA ,  LEENDERS MARTINUS ,  MULKENS JOHANNES ,  MOERMAN RICHARD ,  RIEPEN MICHEL ,  SHULEPOV SERGEI ,  STEFFENS KOEN ,  CROMWIJK JAN ,  SONDAG-HUETHORST JEANNET

IPC: G03F7/20

公开(公告)号：NL2006458A

公开(公告)日：2011-11-08

申请号：NL2006458

申请日：2011-03-23

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS ,  BENSCHOP JOZEF ,  PADIY ALEXANDRE VIKTOROVYCH ,  CHEN TAO

IPC: G03F7/20

公开(公告)号：NL2005479A

公开(公告)日：2011-05-18

申请号：NL2005479

申请日：2010-10-07

Applicant: ASML NETHERLANDS BV

Inventor： GRAAF ROELOF ,  DZIOMKINA NINA ,  KERKHOF MARCUS ,  LEENDERS MARTINUS ,  LIEBREGTS PAULUS ,  ROOIJ GERARDUS ,  HOUBEN MARTIJN ,  BADAM VIJAY ,  SONDAG-HUETHORST JEANNET ,  KRUIJF NIEK

IPC: G03F7/20

Abstract: A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.

公开(公告)号：NL2005167A

公开(公告)日：2011-04-05

申请号：NL2005167

申请日：2010-07-29

Applicant: ASML NETHERLANDS BV

Inventor： HOEKERD KORNELIS ,  PADIY ALEXANDRE VIKTOROVYCH ,  GRAAF ROELOF ,  JANSEN HANS ,  LEENDERS MARTINUS ,  NET ANTONIUS ,  KRAMER PIETER ,  KUIJPER ANTHONIE ,  MARTENS ARJAN ,  GRAAF SANDRA

IPC: G03F7/20

Abstract: A cleaning liquid supply system is disclosed. The cleaning liquid supply system may supply an emulsified cleaning liquid to clean an immersion lithographic apparatus. A lithographic apparatus is also disclosed.