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公开(公告)号：WO2022135948A1
公开(公告)日：2022-06-30
申请号：PCT/EP2021/084913
申请日：2021-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： XU, Huina , MATSUSHITA, Yana , HASAN, Tanbir , KOU, Ren-Jay , GOEL, Namita , LI, Hongmei , PISARENCO, Maxim , KOOIMAN, Marleen , BATISTAKIS, Chrysostomos , ONVLEE, Johannes
IPC: G06T7/00
Abstract: A method and apparatus for analyzing an input electron microscope image of a first area on a first wafer are disclosed. The method comprises obtaining a plurality of mode images from the input electron microscope image corresponding to a plurality of interpretable modes. The method further comprises evaluating the plurality of mode images, and determining, based on evaluation results, contributions from the plurality of interpretable modes to the input electron microscope image. The method also comprises predicting one or more characteristics in the first area on the first wafer based on the determined contributions. In some embodiments, a method and apparatus for performing an automatic root cause analysis based on an input electron microscope image of a wafer are also disclosed.
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公开(公告)号：WO2011144387A1
公开(公告)日：2011-11-24
申请号：PCT/EP2011/055500
申请日：2011-04-08
Applicant: ASML NETHERLANDS B.V. , ONVLEE, Johannes , DEKKER, Albert , SPIERDIJK, Johannus , DE MAN, Hendrik
Inventor： ONVLEE, Johannes , DEKKER, Albert , SPIERDIJK, Johannus , DE MAN, Hendrik
CPC classification number: G03F7/70916 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70808 , G03F7/70833 , G03F7/70883
Abstract: A lithographic apparatus including an optical column to project a beam on a target portion of a substrate is disclosed, the optical column having a projection system configured to project the beam onto the target portion. The apparatus further includes an actuator to move the optical column or at least part thereof with respect to the substrate and a window (940) between the moving part of the optical column and the target portion of the substrate and/or between the moving part of the optical column and a non -moving part of the optical column, the window constructed and arranged within the apparatus to reduce or minimize movement of the window.
Abstract translation: 公开了一种包括在基板的目标部分上投射光束的光学柱的光刻设备，该光学柱具有被配置为将光束投影到目标部分上的投影系统。 该装置还包括致动器，用于相对于基板移动光学柱或其至少一部分，以及在光学柱的运动部分和基板的目标部分之间和/或在基板的移动部分之间的窗口（940） 光学柱和光学柱的非移动部分，窗口构造和布置在设备内以减少或最小化窗口的移动。
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3.发明申请
公开(公告)号：WO2017215924A1
公开(公告)日：2017-12-21
申请号：PCT/EP2017/063252
申请日：2017-06-01
Applicant: ASML NETHERLANDS B.V.
Inventor： BIJNEN, Franciscus, Godefridus, Casper , BOSHOUWERS, Augustinus, Hubert, Maria , ONVLEE, Johannes
Abstract: A target structure (402) such as an alignment mark on a semiconductor substrate (400) becomes obscured by an opaque layer (408) so that it cannot be located by an alignment sensor (AS). A position for the mark is determined using an edge position sensor (412) and relative position information that defines the position of the mark relative to one or more edge portions of the substrate is stored prior to formation of the opaque layer. A window (410) can be opened in the opaque layer, based on the determined position. After revealing the target structure, the alignment sensor can if desired measure more accurately the position of the target structure, for use in controlling further lithographic steps. The edge position sensor may be a camera having an angle-selective behaviour. The edge position sensor may be integrated within the alignment sensor hardware.
Abstract translation: 诸如半导体衬底（400）上的对准标记之类的目标结构（402）变得被不透明层（408）遮挡，使得它不能被对准传感器（AS）定位。 使用边缘位置传感器（412）确定标记的位置，并且在形成不透明层之前存储限定标记相对于衬底的一个或多个边缘部分的位置的相对位置信息。 基于确定的位置，窗口（410）可以在不透明层中打开。 在揭示目标结构之后，如果需要，对准传感器可以更准确地测量目标结构的位置，以用于控制进一步的光刻步骤。 边缘位置传感器可以是具有角度选择行为的照相机。 边缘位置传感器可以集成在对准传感器硬件中。
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公开(公告)号：WO2017092986A1
公开(公告)日：2017-06-08
申请号：PCT/EP2016/077039
申请日：2016-11-09
Applicant: ASML NETHERLANDS B.V.
Inventor： MOEST, Bearrach , VOOGD, Robbert, Jan , VAN KESSEL, Marcel, Theodorus, Maria , ONVLEE, Johannes , BROUWER, Cornelis, Melchior , PAARHUIS, Bart, Dinand
CPC classification number: G03F7/70983 , G03F7/70633 , G03F7/70675 , G03F9/70 , G03F9/7019 , G03F9/7026
Abstract: A method of controlling a lithographic apparatus having an exposure mode configured to expose a wafer held by a substrate table to an image of a pattern on a production reticle via a projection system, wherein in the exposure mode the production reticle is held at a reticle stage and is protected by a pellicle. The method comprises determining characteristics of the projecting in a calibration mode. The determining comprises moving the reticle stage holding a further reticle protected by a further pellicle, the further reticle having a mark. During the moving the further reticle is illuminated with radiation to form an aerial image of the mark, the aerial image is projected via the projection system onto a sensor and the projected aerial image is sensed as received at the sensor. The characteristics of the sensed aerial image are determined.
Abstract translation: 一种控制具有曝光模式的光刻设备的方法，所述曝光模式被配置为经由投影系统将由衬底台保持的晶片暴露于制作光罩上的图案的图像，其中在所述曝光模式中， 生产光罩保持在光罩台上并受到薄膜保护。 该方法包括在校准模式下确定投影的特性。 该确定包括移动保持由另一薄膜保护的另一光罩的光罩平台，该另一光罩具有标记。 在移动过程中，进一步的十字线被辐射照亮以形成标记的空中图像，空中图像通过投影系统投影到传感器上，并且投影的空中图像在传感器处被感测到。 感测到的航拍图像的特征被确定。
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公开(公告)号：WO2016169727A1
公开(公告)日：2016-10-27
申请号：PCT/EP2016/056498
申请日：2016-03-24
Applicant: ASML NETHERLANDS B.V.
Inventor： VAN DE RUIT, Kevin , PAARHUIS, Bart, Dinand , VAN DAMME, Jean-Philippe, Xavier , ONVLEE, Johannes , BROUWER, Cornelis, Melchior , KRAMER, Pieter, Jacob
CPC classification number: G03F7/70983 , G01B2210/56 , G03F1/62 , G03F7/2002 , G03F7/70258 , G03F7/7085
Abstract: A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support to support a patterning device, a substrate table to hold a substrate; and a projection system to project the patterned radiation beam onto a target portion of the substrate. The support is provided with a transparent layer to protect the pattering device. The apparatus further comprises a transparent layer deformation-determining device to determine a deformation profile of the transparent layer, the deformation profile of the transparent layer expressing a deformation of the transparent layer during a scanning movement of the lithographic apparatus, a compensator device which is configured to control at least one of the projection system, the substrate table and the support in response to the deformation profile of the transparent layer to compensate for the deformation of the transparent layer during the scanning movement of the apparatus.
Abstract translation: 光刻设备包括被配置为调节辐射束的照明系统，支撑图案形成装置的支撑件，用于保持衬底的衬底台; 以及将图案化的辐射束投影到基板的目标部分上的投影系统。 该支撑件设有透明层以保护图案装置。 该装置还包括透明层变形确定装置，用于确定透明层的变形分布，在光刻设备的扫描运动期间表示透明层的变形的透明层的变形轮廓，配置的补偿装置 以响应于透明层的变形轮廓来控制投影系统，衬底台和支撑体中的至少一个，以补偿在装置的扫描运动期间透明层的变形。
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Patent Agency Ranking6.发明申请PATTERNING DEVICE SUPPORT, LITHOGRAPHIC APPARATUS, AND METHOD OF CONTROLLING PATTERNING DEVICE TEMPERATURE 审中-公开绘图设备支持，平面设备和控制设备温度的方法
公开(公告)号：WO2014067802A1
公开(公告)日：2014-05-08
申请号：PCT/EP2013/071933
申请日：2013-10-21
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： EBERT, Earl , ONVLEE, Johannes , NAYFEH, Samir , SCHUSTER, Mark, , DELMASTRO, Peter , WARD, Christopher , VAN BOXTEL, Frank, , ALIKHAN, Abdullah , BURBANK, Daniel, , GALBURT, Daniel
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/70341 , G03F7/70716 , G03F7/70808 , G03F7/70858 , G03F7/70866
Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.
Abstract translation: 用于控制图案形成装置（1102）的温度的图案形成装置支撑件（1100）可以包括可移动部件（1104）。 可移动部件可以包括用于提供穿过图案形成装置的表面的气流的气体入口（1108）和用于提取气体流的气体出口（1110）。 图案形成装置支撑件还可以包括联接到管道（1114,1116）的气流发生器（1118），用于使气流从气体出口再循环到气体入口。
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公开(公告)号：WO2011104180A1
公开(公告)日：2011-09-01
申请号：PCT/EP2011/052408
申请日：2011-02-18
Applicant: ASML NETHERLANDS B.V. , VAN ZWET, Erwin , DE JAGER, Pieter , ONVLEE, Johannes , FRITZ, Erik
Inventor： VAN ZWET, Erwin , DE JAGER, Pieter , ONVLEE, Johannes , FRITZ, Erik
IPC: G03F7/20
CPC classification number: G03F7/704 , G03F7/70275 , G03F7/70391
Abstract: The invention relates to a lithographic apparatus comprising one or more optical columns capable of projecting a beam on a target portion on a substrate held by the substrate support. The one or more optical columns may comprise one or more self-emissive contrast devices to emit the beam. The optical column may comprise a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.
Abstract translation: 本发明涉及一种光刻设备，包括一个或多个能够将光束投射在由基板支撑件保持的基板上的目标部分上的光学柱。 一个或多个光学柱可以包括一个或多个发射光束的自发射对比度装置。 光学柱可以包括将光束投影到目标部分上的投影系统。 目标部分具有基板的扫描方向的高度和主要垂直于扫描方向的切线宽度，其中基板沿扫描方向除以高度的扫描速度基本上对应于光学柱的转速或 其一部分除以目标部分的切线宽度。
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8.发明申请ESTIMATING DEFORMATION OF A PATTERNING DEVICE AND/OR A CHANGE IN ITS POSITION 审中-公开估计设计的变形和/或其位置的变化
公开(公告)号：WO2015165623A1
公开(公告)日：2015-11-05
申请号：PCT/EP2015/054650
申请日：2015-03-05
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： MOEST, Bearrach , DELMASTRO, Peter, A. , ONVLEE, Johannes , VAN DER WIELEN, Adrianus, Martinus , WARD, Christopher, Charles
IPC: G03F7/20
CPC classification number: G03F7/70616 , G01B11/14 , G03F7/70058 , G03F7/70775 , G03F7/70783 , G03F7/70875
Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
Abstract translation: 提供了一种用于确定图案形成装置相对于图案形成装置的变形和/或移动位置的系统和方法。 该系统包括测量图案形成装置上的多个参考标记的相应位置的第一感测子系统和测量图案形成装置的边缘相对于支撑件的位置的第二感测子系统。 该系统还包括一个控制器，用于基于测量的图案形成装置上的标记的相应位置来确定图案化部分的绝对位置和绝对位置的变化，基于图案化装置的边缘确定相对位置的变化 测量边缘位置，并且估计图案形成装置相对于支撑件的位置的变化以及图案形成装置的图案化部分的图案变形在一段时间内的变化。
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公开(公告)号：WO2014048651A1
公开(公告)日：2014-04-03
申请号：PCT/EP2013/067615
申请日：2013-08-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： ONVLEE, Johannes , MASON, Christopher , EBERT, Earl , DELMASTRO, Peter
IPC: G03F7/20
CPC classification number: G03F7/70875 , G03F7/708
Abstract: Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams (206) and delivers them to a patterning device (210) that absorbs a portion of the radiation from the beams and develops a spatially dependent heating profile. In a further embodiment, a plurality of resistive heating sources (906) generates heat in response to an applied voltage or current. The generated heat is absorbed by the patterning device from the resistive heating sources and leads to the development of a spatially dependent heating profile. Thermal stresses, strains, and deformations can be controlled by controlling the spatially dependent heating profile.
Abstract translation: 公开了用于控制掩模版加热的系统和方法。 在一个实施例中，多个辐射源产生多个辐射束（206）并且将它们传送到图案形成装置（210），该图案形成装置吸收来自光束的一部分辐射并产生空间上依赖的加热曲线。 在另一实施例中，多个电阻加热源（906）响应于所施加的电压或电流产生热量。 产生的热量被图案形成装置从电阻加热源吸收并导致空间依赖的加热曲线的发展。 可以通过控制空间依赖的加热曲线来控制热应力，应变和变形。
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公开(公告)号：WO2011104177A1
公开(公告)日：2011-09-01
申请号：PCT/EP2011/052405
申请日：2011-02-18
Applicant: ASML NETHERLANDS B.V. , VAN ZWET, Erwin , DE JAGER, Pieter , ONVLEE, Johannes , Fritz, Erik
Inventor： VAN ZWET, Erwin , DE JAGER, Pieter , ONVLEE, Johannes , Fritz, Erik
CPC classification number: G03F7/70891 , G02B7/028 , G03F7/70391 , G03F7/704
Abstract: The invention relates to a lithographic apparatus with a substrate table constructed to hold a substrate and an optical column 924, 930) capable of creating a pattern on a target portion of the substrate. The apparatus has an actuator (928) to move the optical column or part thereof with respect to the substrate. The movement of the optical column or part thereof through a medium causes a heat load on the optical column or part thereof. The apparatus is constructed or operated to reduce the influence of the heat load on the operation of the apparatus.
Abstract translation: 本发明涉及一种光刻设备，其具有用于保持基板的基板台和能够在基板的目标部分上产生图案的光学柱924,930。 该装置具有致动器（928），用于相对于基板移动光学柱或其一部分。 光学柱或其部分通过介质的移动导致光学柱或其一部分上的热负荷。 该装置被构造或操作以减少热负荷对装置的操作的影响。
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