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公开(公告)号：WO2020126242A1
公开(公告)日：2020-06-25
申请号：PCT/EP2019/081282
申请日：2019-11-14
Applicant: ASML NETHERLANDS B.V.
Inventor： BRANTJES, Nicolaas Petrus Marcus , COX, Matthijs , MENCHTCHIKOV, Boris , TABERY, Cyrus, Emil , ZHANG, Youping , ZOU, Yi , LIN, Chenxi , CHENG, Yana , HASTINGS, Simon, Philip, Spencer , GENIN, Maxime, Philippe, Frederic
Abstract: Disclosed is a method for determining a correction relating to a performance metric of a semiconductor manufacturing process, the method comprising: obtaining a first set of pre-process metrology data; processing the first set of pre-process metrology data by decomposing the pre-process metrology data into one or more components which: a) correlate to the performance metric; or b) are at least partially correctable by a control process which is part of the semiconductor manufacturing process; and applying a trained model to the processed first set of pre-process metrology data to determine the correction for said semiconductor manufacturing process.
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公开(公告)号：WO2019063245A1
公开(公告)日：2019-04-04
申请号：PCT/EP2018/073663
申请日：2018-09-04
Applicant: ASML NETHERLANDS B.V.
Inventor： TINNEMANS, Patricius, Aloysius Jacobus , HULSEBOS, Edo, Maria , MEGENS, Henricus, Johannes, Lambertus , ERDAMAR, Ahmet Koray , VERHEES, Loek, Johannes, Petrus , ROELOFS, Willem, Seine, Christian , VAN DE VEN, Wendy, Johanna, Martina , YAGUBIZADE, Hadi , CEKLI, Hakki, Ergun , BRINKHOF, Ralph , VU, Tran, Thanh, Thuy , GOOSEN, Maikel, Robert , VAN T WESTEINDE, Maaike , KOU, Weitian , RIJPSTRA, Manouk , COX, Matthijs , BIJNEN, Franciscus, Godefridus, Casper
Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
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Patent Agency Ranking
公开(公告)号：EP3504593A1
公开(公告)日：2019-07-03
申请号：EP18768811.4
申请日：2018-09-04
Applicant: ASML Netherlands B.V.
Inventor： TINNEMANS, Patricius, Aloysius Jacobus , HULSEBOS, Edo, Maria , MEGENS, Henricus, Johannes, Lambertus , ERDAMAR, Ahmet Koray , VERHEES, Loek, Johannes, Petrus , ROELOFS, Willem, Seine, Christian , VAN DE VEN, Wendy, Johanna, Martina , YAGUBIZADE, Hadi , CEKLI, Hakki, Ergun , BRINKHOF, Ralph , VU, Tran, Thanh, Thuy , GOOSEN, Maikel, Robert , VAN T WESTEINDE, Maaike , KOU, Weitian , RIJPSTRA, Manouk , COX, Matthijs , BIJNEN, Franciscus, Godefridus, Casper
Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured to measure a property of a substrate is disclosed. The method includes: determining a quality parameter for a plurality of substrates; determining measurement parameter values for the plurality of substrates using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameter values; and determining the one or more optimized values of the operational parameter based on the comparing.
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公开(公告)号：EP3627228A1
公开(公告)日：2020-03-25
申请号：EP19206439.2
申请日：2018-09-04
Applicant: ASML Netherlands B.V.
Inventor： BIJNEN, Franciscus Godefridus Casper , BRINKHOF, Ralph , CEKLI, Hakki, Ergun , COX, Matthijs , ERDAMAR, Ahmet Koray , GOOSEN, Maikel Robert , HULSEBOS, Edo Maria , KOU, Weitian , MEGENS, Henricus Johannes Lambertus , RIJPSTRA, Manouk , ROELOFS, Willem Seine Christian , TINNEMANS, Patricius Aloysius Jacobus , VAN DE VEN, Wendy Johanna Martina , VAN T WESTEINDE, Maaike , VERHEES, Loek Johannes Petrus , VU, Tran Thanh Thuy , YAGUBIZADE, Hadi
Abstract: A method for determining one or more optimized values of an operational parameter of a sensor system configured for measuring a property of a substrate is disclosed the method comprising: determining a quality parameter for a plurality of substrates; determining measurement parameters for the plurality of substrates obtained using the sensor system for a plurality of values of the operational parameter; comparing a substrate to substrate variation of the quality parameter and a substrate to substrate variation of a mapping of the measurement parameters; and determining the one or more optimized values of the operational parameter based on the comparing.
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公开(公告)号：EP3671347A1
公开(公告)日：2020-06-24
申请号：EP18214013.7
申请日：2018-12-19
Applicant: ASML Netherlands B.V.
Inventor： BRANTJES, Nicolaas Petrus Marcus , COX, Matthijs
Abstract: Disclosed is a method and associated apparatus for determining performance metric corrections relating to a performance metric of a lithographic process. The method comprises obtaining a first set of pre-exposure metrology data, (for example having been measured on a substrate in a process external to an exposure process to expose a structure on the substrate). The first set of pre-exposure metrology data is processed to remove control components which are at least partially correctable by a control process which is part of the lithographic process. A trained model is applied to the processed pre-exposure metrology data to determine said performance metric corrections for said substrate.
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公开(公告)号：EP3899662A1
公开(公告)日：2021-10-27
申请号：EP19801044.9
申请日：2019-11-14
Applicant: ASML Netherlands B.V.
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公开(公告)号：EP3504593B1
公开(公告)日：2019-12-11
申请号：EP18768811.4
申请日：2018-09-04
Applicant: ASML Netherlands B.V.
Inventor： TINNEMANS, Patricius, Aloysius Jacobus , HULSEBOS, Edo, Maria , MEGENS, Henricus, Johannes, Lambertus , ERDAMAR, Ahmet Koray , VERHEES, Loek, Johannes, Petrus , ROELOFS, Willem, Seine, Christian , VAN DE VEN, Wendy, Johanna, Martina , YAGUBIZADE, Hadi , CEKLI, Hakki, Ergun , BRINKHOF, Ralph , VU, Tran, Thanh, Thuy , GOOSEN, Maikel, Robert , VAN T WESTEINDE, Maaike , KOU, Weitian , RIJPSTRA, Manouk , COX, Matthijs , BIJNEN, Franciscus, Godefridus, Casper
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