公开(公告)号：US20240014003A1

公开(公告)日：2024-01-11

申请号：US18345956

申请日：2023-06-30

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/20

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20230360877A1

公开(公告)日：2023-11-09

申请号：US18144821

申请日：2023-05-08

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Qingpo XI ,  Youfei JIANG ,  Weiming REN ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/12

CPC classification number: H01J37/12 ,  H01J37/28 ,  H01J2237/0048

Abstract: Disclosed herein is an apparatus comprising: a source of charged particles configured to emit a beam of charged particles along a primary beam axis of the apparatus; a condenser lens configured to cause the beam to concentrate around the primary beam axis; an aperture; a first multi-pole lens; a second multi-pole lens; wherein the first multi-pole lens is downstream with respect to the condenser lens and upstream with respect to the second multi-pole lens; wherein the second multi-pole lens is downstream with respect to the first multi-pole lens and upstream with respect to the aperture.

公开(公告)号：US20210193433A1

公开(公告)日：2021-06-24

申请号：US17074001

申请日：2020-10-19

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/141 ,  H01J37/29 ,  H01J37/14 ,  H01J37/153 ,  H01J37/20 ,  H01J37/244

Abstract: A secondary projection imaging system in a multi-beam apparatus is proposed, which makes the secondary electron detection with high collection efficiency and low cross-talk. The system employs one zoom lens, one projection lens and one anti-scanning deflection unit. The zoom lens and the projection lens respectively perform the zoom function and the anti-rotating function to remain the total imaging magnification and the total image rotation with respect to the landing energies and/or the currents of the plural primary beamlets. The anti-scanning deflection unit performs the anti-scanning function to eliminate the dynamic image displacement due to the deflection scanning of the plural primary beamlets.

公开(公告)号：US20200243299A1

公开(公告)日：2020-07-30

申请号：US16649975

申请日：2018-09-21

Applicant: ASML Netherlands B.V.

Inventor： Joe WANG ,  Chia Wen LIN ,  Zhongwei CHEN ,  Chang-chun YEH

IPC: H01J37/244 ,  H01J37/22

Abstract: Disclosed herein an apparatus and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage; optics configured to direct a beam of the charged particles to a sample supported on the stage; a signal detector configured to detect backscattered particles of the charged particles in the beam from the sample; wherein the signal detector has angular resolution. In an example, the methods comprises obtaining an image of backscattered particles from a region of a sample; determining existence or location of a buried feature based on the image.

公开(公告)号：US20240128044A1

公开(公告)日：2024-04-18

申请号：US18392494

申请日：2023-12-21

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/06 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/1474 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20230282441A1

公开(公告)日：2023-09-07

申请号：US18158444

申请日：2023-01-23

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/06 ,  H01J37/10

CPC classification number: H01J37/1474 ,  H01J37/1477 ,  H01J37/1478 ,  H01J37/28 ,  H01J37/06 ,  H01J37/10 ,  H01J2237/024 ,  H01J2237/0453 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1205 ,  H01J2237/1516 ,  H01J2237/1536 ,  H01J2237/1534

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit forms plural and parallel images of one single electron source by deflecting plural beamlets of a parallel primary-electron beam therefrom, and one objective lens focuses the plural deflected beamlets onto a sample surface and forms plural probe spots thereon. A movable condenser lens is used to collimate the primary-electron beam and vary the currents of the plural probe spots, a pre-beamlet-forming means weakens the Coulomb effect of the primary-electron beam, and the source-conversion unit minimizes the sizes of the plural probe spots by minimizing and compensating the off-axis aberrations of the objective lens and condenser lens.

公开(公告)号：US20200286705A1

公开(公告)日：2020-09-10

申请号：US16799773

申请日：2020-02-24

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Weiming REN ,  Shuai LI ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US20210391138A1

公开(公告)日：2021-12-16

申请号：US17353790

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Xuedong LIU ,  Weiming REN ,  Shuai LI ,  Zhongwei CHEN

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/04 ,  H01J37/153

Abstract: One modified source-conversion unit and one method to reduce the Coulomb Effect in a multi-beam apparatus are proposed. In the modified source-conversion unit, the aberration-compensation function is carried out after the image-forming function has changed each beamlet to be on-axis locally, and therefore avoids undesired aberrations due to the beamlet tilting/shifting. A Coulomb-effect-reduction means with plural Coulomb-effect-reduction openings is placed close to the single electron source of the apparatus and therefore the electrons not in use can be cut off as early as possible.

公开(公告)号：US20210384008A1

公开(公告)日：2021-12-09

申请号：US17373716

申请日：2021-07-12

Applicant: ASML Netherlands B.V.

Inventor： Shuai LI ,  Weiming REN ,  Xuedong LIU ,  Juying DOU ,  Xuerang HU ,  Zhongwei CHEN

IPC: H01J37/28 ,  H01J37/10

Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.

公开(公告)号：US20210142979A1

公开(公告)日：2021-05-13

申请号：US17026044

申请日：2020-09-18

Applicant: ASML Netherlands B.V.

Inventor： Frank Nan ZHANG ,  Zhongwei CHEN ,  Yixiang WANG ,  Ying Crystal SHEN

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.