公开(公告)号：JP2001222970A

公开(公告)日：2001-08-17

申请号：JP2000387423

申请日：2000-12-20

Applicant: AXCELIS TECH INC

Inventor： SAADATMAND KOUROSH ,  SWENSON DAVID RICHARD ,  DIVERGILIO WILLIAM FRANK ,  QUINN STEPHEN MICHAEL ,  WAN ZHIMIN ,  BENVENISTE VICTOR M

IPC: H01J37/04 ,  H01J37/12 ,  H01J37/16 ,  H01J37/317

Abstract: PROBLEM TO BE SOLVED: To provide an electrical insulator tetrode lens assembly preventing insulation breakdown caused by voltage. SOLUTION: The electrostatic tetrode lens assembly 60 comprises four electrodes, namely, a first electrode pair 84a, 84c each of which is laid out from the axial line 86 to the outside of the radial direction approximately 90 deg. apart and located at the opposite sides 180 deg. apart and a second electrode pair 84b, 84d located at opposite sides 180 deg. apart, the housing 62 equipped with the installation surface 64 to install the electrostatic tetrode lens assembly 60 on the ion injection device, the first and the second electric leads 104, 108 to supply power to the above No.1 and No.2 electrode pairs 104, 108, and a plural number of electric insulation members 92 made of a glass material including the first, the second electric insulation members to mount the first, the second electrode pairs on the housing. The insulation materials have a resistance to the accumulated graphite scattered from the electrodes and diminish breakdown by a high voltage/current.

公开(公告)号：DE60130945T2

公开(公告)日：2008-07-24

申请号：DE60130945

申请日：2001-07-13

Applicant: AXCELIS TECH INC

Inventor： BENVENISTE VICTOR M ,  DIVERGILIO WILLIAM F ,  SINCLAIR FRANK

IPC: G21K5/04 ,  H01J37/317 ,  H01J37/02 ,  H01J37/05 ,  H01J37/30 ,  H01J37/32 ,  H01J49/42 ,  H01L21/265 ,  H01P3/16

Abstract: An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet (114) mounted in a passageway (139) along the path (129) of an ion beam(128), a power source (174) adapted to provide an electric field in the passageway (139), and a magnetic device (170) adapted to provide a multi-cusped magnetic field in the passageway (139), which may include a plurality of magnets (220) mounted along at least a portion of the passageway (139). The power source (174) and the magnets (220) may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion (234) of the passageway (139). The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam. The invention further comprises a mass analyzer waveguide (250) adapted to couple the electric field to the beam plasma consistently along the length of the mass analyzer passageway to thereby improve the creation of the ECR condition. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method (300) of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.

公开(公告)号：DE60130945D1

公开(公告)日：2007-11-29

申请号：DE60130945

申请日：2001-07-13

Applicant: AXCELIS TECH INC

Inventor： BENVENISTE VICTOR M ,  DIVERGILIO WILLIAM F ,  SINCLAIR FRANK

IPC: G21K5/04 ,  H01J37/317 ,  H01J37/02 ,  H01J37/05 ,  H01J37/30 ,  H01J37/32 ,  H01J49/42 ,  H01L21/265 ,  H01P3/16

Abstract: An apparatus and method for providing a low energy, high current ion beam for ion implantation applications are disclosed. The apparatus includes a mass analysis magnet (114) mounted in a passageway (139) along the path (129) of an ion beam(128), a power source (174) adapted to provide an electric field in the passageway (139), and a magnetic device (170) adapted to provide a multi-cusped magnetic field in the passageway (139), which may include a plurality of magnets (220) mounted along at least a portion of the passageway (139). The power source (174) and the magnets (220) may cooperatively interact to provide an electron cyclotron resonance (ECR) condition along at least a portion (234) of the passageway (139). The multi-cusped magnetic field may be superimposed on the dipole field at a specified field strength in a region of the mass analyzer passageway to interact with an electric field of a known RF or microwave frequency for a given low energy ion beam. The invention further comprises a mass analyzer waveguide (250) adapted to couple the electric field to the beam plasma consistently along the length of the mass analyzer passageway to thereby improve the creation of the ECR condition. The invention thus provides enhancement of beam plasma within a mass analyzer dipole magnetic field for low energy ion beams without the introduction of externally generated plasma. The invention further includes a method (300) of providing ion beam containment in a low energy ion implantation system, as well as an ion implantation system.