公开(公告)号：JP2001222970A

公开(公告)日：2001-08-17

申请号：JP2000387423

申请日：2000-12-20

Applicant: AXCELIS TECH INC

Inventor： SAADATMAND KOUROSH ,  SWENSON DAVID RICHARD ,  DIVERGILIO WILLIAM FRANK ,  QUINN STEPHEN MICHAEL ,  WAN ZHIMIN ,  BENVENISTE VICTOR M

IPC: H01J37/04 ,  H01J37/12 ,  H01J37/16 ,  H01J37/317

Abstract: PROBLEM TO BE SOLVED: To provide an electrical insulator tetrode lens assembly preventing insulation breakdown caused by voltage. SOLUTION: The electrostatic tetrode lens assembly 60 comprises four electrodes, namely, a first electrode pair 84a, 84c each of which is laid out from the axial line 86 to the outside of the radial direction approximately 90 deg. apart and located at the opposite sides 180 deg. apart and a second electrode pair 84b, 84d located at opposite sides 180 deg. apart, the housing 62 equipped with the installation surface 64 to install the electrostatic tetrode lens assembly 60 on the ion injection device, the first and the second electric leads 104, 108 to supply power to the above No.1 and No.2 electrode pairs 104, 108, and a plural number of electric insulation members 92 made of a glass material including the first, the second electric insulation members to mount the first, the second electrode pairs on the housing. The insulation materials have a resistance to the accumulated graphite scattered from the electrodes and diminish breakdown by a high voltage/current.

公开(公告)号：AU5859501A

公开(公告)日：2001-12-11

申请号：AU5859501

申请日：2001-05-22

Applicant: AXCELIS TECH INC

Inventor： SAADATMAND KOUROSH ,  SCHERER ERNST FREDERICK

IPC: H01J37/04 ,  H01J37/317 ,  H05H7/02

Abstract: An integrated RF amplifier and resonator is provided for use with an ion accelerator. The amplifier includes an output substantially directly coupled with a resonator coil. The amplifier output may be coupled capacitively or inductively. In addition, an apparatus is provided for accelerating ions in an ion implanter. The apparatus comprises an amplifier with an RF output, a tank circuit with a coil substantially directly coupled to the RF output of the amplifier, and an electrode connected to the coil for accelerating ions. Also provided is a method for coupling an RF amplifier with a resonator in an ion accelerator. The method comprises connecting the RF output of the amplifier to a coupler, and locating the coupler proximate the coil, thereby substantially directly coupling the RF output of the amplifier with the resonator coil.

公开(公告)号：WO0237906A2

公开(公告)日：2002-05-10

申请号：PCT/GB0104851

申请日：2001-10-31

Applicant: AXCELIS TECH INC ,  EATON LTD

Inventor： SAADATMAND KOUROSH ,  GRAF MICHAEL ANTHONY ,  MCINTYRE EDWARD KIRBY

IPC: H01J37/317 ,  H05H7/00

CPC classification number: H01J37/3171 ,  H01J2237/028 ,  H05H7/00

Abstract: A mass analysis magnet assembly (16) is provided for use in an ion implanter (10), comprising: (i) a magnet (44) for mass analyzing an ion beam (15) output by an ion source (14), the magnet providing an interior region (49) through which the ion beam passes; and (ii) a neutron containment chamber (52) coupled to the magnet (44). The neutron containment chamber provides a containment space (58) in communication with the interior region (49) of the magnet (44), and a neutron absorbing wall (54) that in part defines the containment space. The neutron-absobing wall (54) is at least partially covered by a lining (56) capable of releasing neutrons when impacted by deuterons that are carried along with the ion beam (15) through the containment space (58). Preferably, the linning (56) is comprised of graphite, and the wall is comprised of either paraffin or polyethylene. The wall (54) includes portions (60) that either absorb neutrons released by the graphite lining (56) or substantially reduce the energies thereof.

Abstract translation: 提供用于离子注入机（10）的质量分析磁体组件（16），其包括：（i）用于质量分析由离子源（14）输出的离子束（15）的磁体（44），所述磁体 提供离子束通过的内部区域（49）; 和（ii）耦合到磁体（44）的中子容纳室（52）。 中子容纳室提供与磁体（44）的内部区域（49）连通的容纳空间（58）和部分限定容纳空间的中子吸收壁（54）。 中子吸收壁（54）至少部分被衬垫（56）覆盖，所述内衬能够在与氘核碰撞时释放中子，所述氘核与离子束（15）一起通过容纳空间（58）携带。 优选地，衬层（56）由石墨组成，壁由石蜡或聚乙烯组成。 壁（54）包括吸收由石墨衬里（56）释放的中子或基本上减少其能量的部分（60）。

公开(公告)号：WO0193646A3

公开(公告)日：2002-03-28

申请号：PCT/GB0102274

申请日：2001-05-22

Applicant: AXCELIS TECH INC ,  EATON LTD

Inventor： DIVERGILIO WILLIAM FRANK ,  SAADATMAND KOUROSH ,  SCHERER ERNST FREDERICK

IPC: H01J37/04 ,  H01J37/317 ,  H05H7/02

CPC classification number: H05H7/02

Abstract: An integrated RF amplifier (120) and resonator (100) is provided for use with an ion accelerator. The amplifier (120) includes an output substantially directly coupled with a resonator coil (L). The amplifier output may be coupled capacitively or inductively. In addition, an apparatus is provided for accelerating ions in an ion implanter. The apparatus comprises an amplifier (120) with an RF output (122), a tank circuit (100) with a coil (L) substantially directly coupled to the RF output (122) of the amplifier (120), and an electrode (108) connected to the coil (L) for accelerating ions. Also provided is a method (500) for coupling an RF amplifier (120) with a resonator (100) in an ion accelerator. The method comprises connecting (502) the RF output (122) of the amplifier (120) to a coupler, and locating (504) the coupler proximate the coil (L), thereby substantially directly coupling the RF output (122) of the amplifier (120) with the resonator coil (L).

Abstract translation: 提供集成RF放大器（120）和谐振器（100）以与离子加速器一起使用。 放大器（120）包括基本上直接与​​谐振器线圈（L）耦合的输出。 放大器输出可以电容或电感耦合。 此外，提供了用于加速离子注入机中的离子的装置。 该装置包括具有RF输出（122）的放大器（120），具有基本上直接耦合到放大器（120）的RF输出端（122）的线圈（L）的电路（108）和电极 ）连接到线圈（L），用于加速离子。 还提供了一种用于在离子加速器中将RF放大器（120）与谐振器（100）耦合的方法（500）。 该方法包括将放大器（120）的RF输出（122）连接（502）到耦合器，并将耦合器定位（504）靠近线圈（L），从而基本上直接耦合放大器的RF输出（122） （120）与谐振器线圈（L）。

公开(公告)号：DE60230290D1

公开(公告)日：2009-01-22

申请号：DE60230290

申请日：2002-08-23

Applicant: AXCELIS TECH INC

Inventor： SAADATMAND KOUROSH ,  DIVERGILIO WILLIAM

IPC: H01J37/317 ,  G21K1/08 ,  G21K5/04 ,  H01J37/147 ,  H05H7/18

Abstract: An ion buncher stage for a linear accelerator system is disclosed for bunching ions in an ion implantation system. The ion buncher stage may be employed upstream of one or more accelerating stages such that the loss of ions in the linear accelerator system is reduced. The invention further includes an asymmetrical double gap buncher stage, as well as a slit buncher stage for further improvement of ion implantation efficiency. Also disclosed are methods for accelerating ions in an ion implanter linear accelerator.

公开(公告)号：AU2002216269A1

公开(公告)日：2002-07-16

申请号：AU2002216269

申请日：2001-12-27

Applicant: AXCELIS TECH INC

Inventor： DIVERGILIO WILLIAM FRANK ,  SWENSON DAVID D ,  SAADATMAND KOUROSH

IPC: C23C14/48 ,  H01J37/317 ,  H01L21/265 ,  H05H9/00 ,  H01J37/30

Abstract: A method and apparatus are disclosed for accelerating ions in an ion implantation system. An ion accelerator is provided which comprises a plurality of energizable electrodes energized by a variable frequency power source, in order to accelerate ions from an ion source. The variable frequency power source allows the ion accelerator to be adapted to accelerate a wide range of ion species to desired energy levels for implantation onto a workpiece, while reducing the cost and size of an ion implantation accelerator.

公开(公告)号：SG78388A1

公开(公告)日：2001-02-20

申请号：SG1999004236

申请日：1999-09-01

Applicant: AXCELIS TECH INC

Inventor： MCINTYRE EDWARD KIRBY JR ,  DIVERGILIO WILLIAM FRANK ,  SAADATMAND KOUROSH ,  SCHERER ERNST FREDERICK ,  SWENSON DAVID RICHARD ,  WENZEL KEVIN WAYNE

IPC: H01L21/66 ,  C23C14/48 ,  H01J37/304 ,  H01J37/317 ,  H01J49/40 ,  H01J49/44 ,  H01L21/265 ,  H01J37/244

Abstract: In accordance with the present invention, an ion implanter (10) including a time of flight energy measurement apparatus (200) for measuring and controlling the energy of an ion beam (14). The ion implanter (10) includes an ion source (12) for generating the ion beam (14), an ion acceleration assembly (18) for accelerating the beam (14) resulting in the beam (14) comprising a series of ion pulses (P0, P1, ...., P(n+1)) having a predetermined frequency (F) and beam forming and directing structure (50) for directing the ion beam (14) at workpieces (21) supported in an implantation chamber (22) of the implanter (10). The time of flight energy measurement apparatus (200) includes spaced apart first and second sensors (210, 310, 220, 320), timing circuitry (204) and conversion circuitry (206). The time of flight energy measurement apparatus (200) measures an average kinetic energy of an ion (E(ion)) included in a selected ion pulse of the ion beam. The first sensor (210, 310) and a second sensor (220, 320) are disposed adjacent the ion beam (14) and spaced a predetermined distance apart, the second sensor (220, 320) being downstream of the first sensor (210, 310). The first sensor (210, 310) generates a signal when an ion pulse of the ion beam (14) passes the first sensor (210, 310) and the second sensor (220, 320) generates a signal when an ion pulse of the ion beam (14) passes the second sensor (220, 320). The timing circuitry (204) of the energy measurement apparatus (200) is electrically coupled to the first and second sensors (210, 310, 220, 320) and determines an elapsed time, t, for the selected ion pulse to traverse the predetermined distance between the first and second sensors (210, 310, 220, 320). The timing circuitry (204) calculates an average number of ion pulses. N. in the ion beam (14) between the first and second sensors (210, 310, 220, 320) based on the approximation of the ion beam energy (E(approx.)) and calculates an offset time. t(offset). for the selected ion pulse using the formula, t(offset) = N x T. The timing circuitry (204) than determines the elapsed time, t. The conversion circuitry (206) converts the elapsed time. t. for the selected ion pulse into a measure of the energy of the ion beam (E(ion)).

公开(公告)号：NZ522808A

公开(公告)日：2004-06-25

申请号：NZ52280801

申请日：2001-05-22

Applicant: AXCELIS TECH INC

Inventor： DIVERGILIO WILLIAM FRANK ,  SAADATMAND KOUROSH ,  SCHERER ERNST FREDERICK

IPC: H01J37/04 ,  H01J37/317 ,  H05H7/02

Abstract: An integrated RF amplifier (120) and resonator (100) is provided for use with an ion accelerator. The amplifier (120) includes an output substantially directly coupled with a resonator coil (L). The amplifier output may be coupled capacitively or inductively. In addition, an apparatus is provided for accelerating ions in an ion implanter. The apparatus comprises an amplifier (120) with an RF output (122), a tank circuit (100) with a coil (L) substantially directly coupled to the RF output (122) of the amplifier (120), and an electrode (108) connected to the coil (L) for accelerating ions. Also provided is a method (500) for coupling an RF amplifier (120) with a resonator (100) in an ion accelerator. The method comprises connecting (502) the RF output (122) of the amplifier (120) to a coupler, and locating (504) the coupler proximate the coil (L), thereby substantially directly coupling the RF output (122) of the amplifier (120) with the resonator coil (L).

公开(公告)号：WO0237906A8

公开(公告)日：2003-05-15

申请号：PCT/GB0104851

申请日：2001-10-31

Applicant: AXCELIS TECH INC ,  EATON LTD

Inventor： SAADATMAND KOUROSH ,  GRAF MICHAEL ANTHONY ,  MCINTYRE EDWARD KIRBY

IPC: H01J37/317 ,  H05H7/00

CPC classification number: H01J37/3171 ,  H01J2237/028 ,  H05H7/00

Abstract: A mass analysis magnet assembly (16) is provided for use in an ion implanter (10), comprising: (i) a magnet (44) for mass analyzing an ion beam (15) output by an ion source (14), the magnet providing an interior region (49) through which the ion beam passes; and (ii) a neutron containment chamber (52) coupled to the magnet (44). The neutron containment chamber provides a containment space (58) in communication with the interior region (49) of the magnet (44), and a neutron absorbing wall (54) that in part defines the containment space. The neutron-absobing wall (54) is at least partially covered by a lining (56) capable of releasing neutrons when impacted by deuterons that are carried along with the ion beam (15) through the containment space (58). Preferably, the linning (56) is comprised of graphite, and the wall is comprised of either paraffin or polyethylene. The wall (54) includes portions (60) that either absorb neutrons released by the graphite lining (56) or substantially reduce the energies thereof.

Abstract translation: 提供用于离子注入机（10）的质量分析磁体组件（16），其包括：（i）用于质量分析由离子源（14）输出的离子束（15）的磁体（44），所述磁体 提供离子束通过的内部区域（49）; 和（ii）耦合到磁体（44）的中子容纳室（52）。 中子容纳室提供与磁体（44）的内部区域（49）连通的容纳空间（58）和部分限定容纳空间的中子吸收壁（54）。 中子吸收壁（54）至少部分被衬垫（56）覆盖，所述内衬能够在与氘核碰撞时释放中子，所述氘核与离子束（15）一起通过容纳空间（58）携带。 优选地，衬层（56）由石墨组成，壁由石蜡或聚乙烯组成。 壁（54）包括吸收由石墨衬里（56）释放的中子或基本上减少其能量的部分（60）。

公开(公告)号：WO0237905A3

公开(公告)日：2002-08-01

申请号：PCT/GB0104833

申请日：2001-10-31

Applicant: AXCELIS TECH INC ,  EATON LTD

Inventor： SAADATMAND KOUROSH ,  GRAF MICHAEL ANTHONY ,  MCINTYRE EDWARD KIRBY

IPC: G21K1/093 ,  C23C14/48 ,  G21K5/00 ,  G21K5/04 ,  H01J37/05 ,  H01J37/317 ,  H01J49/26 ,  H01L21/265 ,  H05H5/02 ,  H05H7/00

CPC classification number: H01J37/3171 ,  H01J2237/028 ,  H05H7/00

Abstract: A mass analysis magnet assembly (16) is provided for use in an ion implanter (10), comprising: (i) a magnet (44) for mass analyzing an ion beam (15) output by an ion source (14), the magnet providing an interior region (49) through which the ion beam passes; and (ii) at least one strike plate (48) in part forming an outer boundary of the interior region (49). The at least one strike plate is comprised of an isotopically pure carbon-based material. The isotopically pure carbon-based material, preferably by mass greater than 99 % carbon C-12, prevents neutron radiation when impacted by deuterons extracted from the ion source (14). The strike plate (48) may comprise an upper layer (56) of isotopically pure carbon C-12 isotope positioned atop a lower substrate (54).

Abstract translation: 提供用于离子注入机（10）的质量分析磁体组件（16），包括：（i）用于质量分析由离子源（14）输出的离子束（15）的磁体（44），所述磁体 提供离子束穿过的内部区域（49）; 和（ii）部分形成内部区域（49）的外边界的至少一个冲击板（48）。 该至少一个冲击板由同位素纯的基于碳的材料组成。 同位素纯的基于碳的材料，优选以大于99％的碳C-12的质量，防止被从离子源（14）提取的氘核所冲击时的中子辐射。 撞击板（48）可以包括位于下基板（54）顶上的同位素纯碳C-12同位素的上层（56）。