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公开(公告)号：DE2657558A1
公开(公告)日：1978-06-22
申请号：DE2657558
申请日：1976-12-18
Applicant: BASF AG
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公开(公告)号：DE3137416A1
公开(公告)日：1983-03-31
申请号：DE3137416
申请日：1981-09-19
Applicant: BASF AG
IPC: C08F285/00 , C08F287/00 , C08L23/00 , C08L51/00 , C08L51/02 , C08L53/00 , C08L77/00 , C08L101/00 , G03F7/004 , G03F7/032 , G03F7/033 , G03F7/038 , C08J5/18 , C09J3/14 , G03C1/68 , G03F7/26
Abstract: Photopolymerizable mixtures of (a) one or more block copolymers, (b) one or more photopolymerizable, ethylenically unsaturated, low molecular weight compounds and (c) a photopolymerization initiator, with or without (d) other additives, contain as component (a) block copolymers which are composed solely of elastomeric polymer blocks, and contain two or more elastomeric polymer blocks having a glass transition temperature of from -20 DEG C. to +15 DEG C., linked by one or more elastomeric polymer blocks having a glass transition temperature of below -20 DEG C.
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Patent Agency Ranking
公开(公告)号：DE2456439A1
公开(公告)日：1976-08-12
申请号：DE2456439
申请日：1974-11-29
Applicant: BASF AG
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公开(公告)号：DE3047026A1
公开(公告)日：1982-07-22
申请号：DE3047026
申请日：1980-12-13
Applicant: BASF AG
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公开(公告)号：DE2942183A1
公开(公告)日：1981-05-07
申请号：DE2942183
申请日：1979-10-18
Applicant: BASF AG
IPC: C08F2/00 , C08F2/48 , C08F16/12 , C08F16/14 , C08F20/10 , C08F20/18 , C08F287/00 , C08F297/00 , C08F297/04 , C08L53/02 , G03F7/033 , C08J3/28 , C09J3/14 , G03C1/68
Abstract: Photopolymerizable compositions based on an elastomeric styrene-diene block polymer, one or more photopolymerizable olefinically unsaturated monomers and one or more photopolymerization initiators exhibit improved properties if they contain, as an essential constituent, an elastomeric block copolymer of the general structure A-B-C, where A is a thermoplastic, non-elastomeric polymer block based on styrene compounds and having a second order transition point above +25 DEG C., B is an elastomeric polymer block based on butadiene and/or isoprene and having a second order transition point below -20 DEG C. and C is a polymer block, different from B, having a second order transition point of from -30 DEG C. to +15 DEG C., C being either a homopolymer or copolymer block based on butadiene or isoprene or a random copolymer block based on conjugated dienes and styrene compounds. The photopolymerizable compositions may be used, inter alia, for the production of photo-curable adhesives, resilient and flexible sheet material and, in particular, flexographic relief printing plates.
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公开(公告)号：DE2444118A1
公开(公告)日：1976-04-01
申请号：DE2444118
申请日：1974-09-14
Applicant: BASF AG
Inventor： WERTHER HEINZ-ULRICH DIPL CHEM , WIGGER AUGUST DIPL CHEM DR , ELZER ALBERT DIPL PHYS DR , ZUERGER MANFRED , RICHTER PETER DIPL CHEM DR
Abstract: The invention relates to relief plates for flexographic printing comprising a relatively soft elastomeric base (U) having a modulus of elasticity of from 10 to 200 kg/cm2 and a thickness of from 0.5 to 6 mm and, firmly bonded thereto, a thin, relatively hard, difficultly soluble intermediate layer Z having a modulus of elasticity of from 1 x 103 to 2.1 x 106 kg/cm2 and a thickness of from 5 to 500 mu and, firmly bonded to said intermediate layer Z, a relief layer P' consisting of a photocrosslinked elastomeric mixture having a modulus of elasticity of from 30 to 2000 kg/cm2 and a thickness of from 200 to 300 mu , the modulus of elasticity of the photocrosslinked relief layer P' being the same as or higher than that of the base U and the neutral surface of the relief plate lying in or near the intermediate layer Z. The invention also relates to photosensitive laminates for the production of such plates.
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