公开(公告)号：WO2015004042A3

公开(公告)日：2015-03-19

申请号：PCT/EP2014064409

申请日：2014-07-07

Applicant: BASF SE

Inventor： GRÜNE PHILIPP ,  RÜTTINGER WOLFGANG ,  SCHMITT CHRISTINE ,  WALSDORFF CHRISTIAN

IPC: C07C5/48

CPC classification number: C07C5/48 ,  C07C2521/18 ,  C07C2523/04 ,  C07C2523/26 ,  C07C2523/28 ,  C07C2523/31 ,  C07C2523/745 ,  C07C2523/75 ,  C07C2523/887 ,  Y02P20/584 ,  C07C11/167

Abstract: The invention relates to a method for the oxidative dehydrogenation of n-butenes to form butadiene, said method comprising two or more production steps (i) and at least one regeneration step (ii). In said method: (i) in a production step a starting gas mixture containing n-butene is mixed with a gas containing oxygen and the mixed gas is brought into contact with a multi-metal-oxide catalyst containing at least molybdenum and another metal in a fixed-bed reactor, at a temperature of between 220 and 490 °C. A product gas mixture at least containing butadiene, oxygen and steam is thus obtained at the outlet of the fixed-bed reactor; (ii) in a regeneration step, to regenerate the multi-metal oxide catalyst, a regeneration gas mixture containing oxygen is passed over the catalyst fixed bed at a temperature between 200 and 450 °C and the carbon deposited on the catalyst is burnt off. A regeneration step (ii) is carried out between two production steps (i), the oxygen content of the product gas mixture at the outlet of the fixed-bed reactor is at least 5 vol. % and the duration of a production step (i) is less than 1,000 h.

Abstract translation: 本发明涉及一种用于正丁烯的氧化脱氢为丁二烯的方法，包括在一个生产步骤中的两个或更多个生产步骤（i）和至少一个再生步骤（ii），其中（i），与含氧气体原料气体混合物的含正丁烯- 混合，将混合气体被带入在220的温度下，以490℃与含有至少钼一个布置在固定催化剂床的多金属氧化物催化剂和另外的金属在固定床反应器中接触，其中所述固定床反应器的输出，一个产物气体混合物至少含丁二烯， 是通过在200的温度下使含酸味Regeneriergasgemischs至450℃以上的在催化剂上沉积的碳，其中，剪贴板中的催化剂固定床和燃烧得到的氧气和水蒸汽和（ii）在多金属氧化物催化剂的再生步骤被再生 的两个单独的生产步骤（i）再生步骤（ii）中进行，其中氧含量至少为5％（体积）在固定床反应器的出口处的产物气体混合物，并且生产步骤（i）的持续时间小于1，000小时。

公开(公告)号：EP2625241A4

公开(公告)日：2014-04-23

申请号：EP11830275

申请日：2011-10-04

Applicant: BASF SE

Inventor： SCHMITT CHRISTINE ,  KARPOV ANDREY ,  ROSOWSKI FRANK ,  BRANDS MARIO ,  LI YUZHUO

IPC: C09G1/02 ,  H01L21/306 ,  H01L21/321

CPC classification number: H01L21/30625 ,  C09G1/02 ,  H01L21/3212

公开(公告)号：EP2625237A4

公开(公告)日：2014-03-19

申请号：EP11830273

申请日：2011-10-04

Applicant: BASF SE

Inventor： DRESCHER BETTINA ,  NOLLER BASTIAN MARTEN ,  SCHMITT CHRISTINE ,  SUGIHARTO ALBERT BUDIMAN ,  LI YUZHUO

IPC: C09G1/02 ,  C09K3/14 ,  H01L21/306 ,  H01L21/321

CPC classification number: C09K13/04 ,  C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  C09K13/06 ,  H01L21/30625 ,  H01L21/3212

Abstract: A chemical mechanical polishing (CMP) composition Abstract Use of a chemical mechanical polishing (CMP) composition comprising (A) inorganic particles, organic particles, or a mixture thereof, (B) a heteropolyacid or a salt thereof, (C) a salt comprising chloride, fluoride, bromide, or a mixture thereof as anion, and (D) an aqueous medium, for polishing a substrate comprising a self-passivating metal, germanium, nickel phosphorous (NiP), or a mixture thereof.