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公开(公告)号：US20190193034A1
公开(公告)日：2019-06-27
申请号：US16225666
申请日：2018-12-19
Applicant: EBARA CORPORATION
Inventor： Yoichi NAKAGAWA , Suguru OZAWA , Toshifumi WATANABE , Tao XU
IPC: B01F3/04
CPC classification number: B01F3/04737 , B01F3/04439 , B01F2003/04886 , C02F1/78 , C02F2201/782 , C02F2209/40 , G02F2001/1316 , H01L21/67051
Abstract: A gas-dissolved liquid producing apparatus 1 includes a gas supply unit 2, a first liquid supply unit 3, a gas-dissolved liquid generator 4, a second liquid generator 20, a second liquid supply unit 21, a flow rate measuring unit 14, and a controller 23. The controller 23 controls the supply amount of the first liquid to be supplied to the gas-dissolved liquid generator 4 according to the flow rate of circulated gas-dissolved liquid measured by the flow rate measuring unit 14. The gas-dissolved liquid generator 4 dissolves gas supplied from the gas supply unit 2 in first liquid supplied from the first liquid supply unit 3 and second liquid supplied from the second liquid supply unit 21 to generate gas-dissolved liquid.
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公开(公告)号：US20210245115A1
公开(公告)日：2021-08-12
申请号：US17164026
申请日：2021-02-01
Applicant: EBARA CORPORATION
Inventor： Suguru OZAWA , Yuji ARAKI , Yoichi NAKAGAWA , Toshifumi WATANABE
Abstract: A gas solution manufacturing device 1 includes a gas supply line 2 configured to supply a gas as a raw material of a gas solution, a liquid supply line 3 configured to supply a liquid as a raw material of the gas solution, a gas solution production unit 4 configured to mix the gas and the liquid together to produce the gas solution, a gas-liquid separation unit 5 configured to perform gas-liquid separation of the produced gas solution into a supplied liquid to be supplied to a use point and a discharged gas to be discharged through an exhaust port, and a gas dissolving unit 6 provided in the liquid supply line 4 and configured to dissolve the discharged gas resulting from the gas-liquid separation in the liquid. The gas dissolving unit 6 is configured with a hollow fiber membrane configured with a gas permeable membrane.
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公开(公告)号：US20220105478A1
公开(公告)日：2022-04-07
申请号：US17488814
申请日：2021-09-29
Applicant: EBARA CORPORATION
Inventor： Suguru OZAWA , Yuji ARAKI , Toshifumi WATANABE , Yoichi NAKAGAWA , Risa KIMURA , Tao XU
Abstract: A gas solution supply device 1 includes: a first gas-liquid separator 8 in which gas solution is stored; a second gas-liquid separator 16 provided at a stage subsequent to the first gas-liquid separator 8 and in which gas solution to be supplied to a use point is stored; an intermediate line 17 provided between the first gas-liquid separator 8 and the second gas-liquid separator 16; a pressure booster pump 18 provided on the intermediate line 17 and increases a pressure of gas solution being supplied from the first gas-liquid separator 8 to the second gas-liquid separator 16; a gas supply line 2 that supplies gas as a material of the gas solution; and a gas dissolving unit 20 provided on the intermediate line 17 and dissolves the gas supplied from the gas supply line 2 in the gas solution supplied from the first gas-liquid separator 8.
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Patent Agency Ranking
公开(公告)号：US20170282132A1
公开(公告)日：2017-10-05
申请号：US15511803
申请日：2015-09-09
Applicant: EBARA CORPORATION
Inventor： Suguru OZAWA , Minoru HARADA , Munehito TAKAHASHI
CPC classification number: B01F3/0446 , B01F5/0413 , B01F15/00149 , B01F15/00162 , B01F15/0022 , B01F15/00357 , B01F15/00422 , B01F2003/04886 , B01F2215/004 , C01B13/11 , C01B2201/64 , C02F1/78 , C02F2103/04 , C02F2201/782 , C02F2209/03 , C02F2209/38 , C02F2209/40 , H01L21/02052 , H01L21/67017
Abstract: An ozone water production device (1) includes: flow rate controllers (4, 5) that each control a flow rate of gas which is a raw material; a flow rate meter (12) that measures a flow rate of water which is a raw material; a booster pump (13) that controls pressure of the water; an ozone water generating unit (8) that generates ozone water by mixing ozone gas and the water; and a pressure sensor (17) that measures pressure of the ozone water which is to be supplied to a use point (19). The booster pump (13) controls the pressure of the water such that the pressure of the ozone water measured by the pressure sensor (17) is constant. The flow rate controllers (4, 5) each control the flow rate of the gas in accordance with the flow rate of the water measured by the flow rate meter (12).
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公开(公告)号：US20210017056A1
公开(公告)日：2021-01-21
申请号：US16922415
申请日：2020-07-07
Applicant: EBARA CORPORATION
Inventor： Yoichi NAKAGAWA , Suguru OZAWA , Yuji ARAKI , Toshifumi WATANABE
Abstract: A gas dissolved liquid manufacturing device includes: a pump configured to pressurize a liquid; a pipe communicating with the pump; a nozzle disposed in the pipe, the nozzle being configured to generate micro bubbles using a supplied gas; and a gas-liquid separation tank whose upper part communicates with the pipe, the gas-liquid separation tank being configured to separate a gas-liquid mixture generated by the nozzle into a gas and a liquid.
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公开(公告)号：US20190015801A1
公开(公告)日：2019-01-17
申请号：US16069862
申请日：2017-01-13
Applicant: EBARA CORPORATION
Inventor： Suguru OZAWA , Yoichi NAKAGAWA , Muneto TAKAHASHI , Tao XU , Toshio YOKOYAMA
Abstract: Provided is a supply-liquid producing apparatus capable of producing a supply liquid by an amount needed at a use point.A supply-liquid producing apparatus includes a mixer that mixes water and ozone gas to produce ozone water; a booster pump that increases the pressure of the water supplied to the mixer; a gas-liquid separation tank that separates the ozone water produced by the mixer into ozone water to be supplied to a use point and exhaust gas to be discharged from an exhaust port; a flowmeter that measures the flow rate of the ozone water supplied from the gas-liquid separation tank to the use point; a flow control unit that adjusts the flow rate of the water supplied to the mixer by controlling the booster pump in response to the flow rate of the ozone water measured by the flowmeter; and an exhaust pressure control unit that controls the exhaust pressure to keep constant the water level in the gas-liquid separation tank.
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公开(公告)号：US20240075410A1
公开(公告)日：2024-03-07
申请号：US18363815
申请日：2023-08-02
Applicant: EBARA CORPORATION
Inventor： Suguru OZAWA , Yuji ARAKI , Yoichi NAKAGAWA , Toshifumi WATANABE , Risa KIMURA , Ryuta KATO
CPC classification number: B01D19/0036 , B01F21/02
Abstract: There is provided a gas solution supply apparatus capable of preventing bubbles from being generated in use at a point-of-use even if gas solution to be provided to a point-of-use has a high concentration. The gas solution supply apparatus 1 includes: a gas dissolving unit 4 that dissolves a source gas in a source liquid to produce a first gas solution; a first gas-liquid separator 10 that stores the first gas solution produced and produces a second gas solution through gas-liquid separation of the first gas solution; a pressure reducer 17 that depressurizes the second gas solution produced in the first gas-liquid separator 10; and a second gas-liquid separator 12 that stores the depressurized second gas solution and produces a third gas solution through gas-liquid separation of the second gas solution. The third gas solution is supplied to a point-of-use.
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公开(公告)号：US20170200623A1
公开(公告)日：2017-07-13
申请号：US15386420
申请日：2016-12-21
Applicant: EBARA CORPORATION
Inventor： Suguru OZAWA , Toshio YOKOYAMA , Tetsuji TOGAWA
CPC classification number: H01L21/67051 , B08B3/024 , B08B3/08 , B08B3/10 , B08B7/0071 , B08B2230/01 , G03F7/422 , H01L21/67098 , H01L21/67109
Abstract: A cleaning apparatus 1 is provided with a heating unit 5 that heats a cleaning surface of a substrate W, a cleaning unit 6 that supplies ozone water to the cleaning surface of the substrate W and cleans the cleaning surface and a control unit 7 that controls the heating of the cleaning surface and the supply of the cleaning liquid so as to clean the cleaning surface after heating the cleaning surface of the substrate W.
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