Method of depositing material
    1.
    发明公开
    Method of depositing material 审中-公开
    Verfahren zum Aufbringen von材料

    公开(公告)号:EP2481828A1

    公开(公告)日:2012-08-01

    申请号:EP12152789.9

    申请日:2012-01-27

    Applicant: FEI Company

    Abstract: Material is deposited in a desired pattern by spontaneous deposition of precursor gas at regions of a surface that are prepared using a beam to provide conditions to support the initiation of the spontaneous reaction. One the reaction is initiated, it continues in the absence of the beam at the regions of the surface at which the reaction was initiated.

    Abstract translation: 通过在使用光束制备的表面的区域处自发沉积前体气体以提供支持自发反应开始的条件,将材料沉积成所需的图案。 一个反应开始,它在反应开始的表面区域没有光束的情况下继续。

Patent Agency Ranking