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    ATTACHMENT OF NANO-OBJECTS TO BEAM-DEPOSITED STRUCTURES
    1.
    发明公开
    ATTACHMENT OF NANO-OBJECTS TO BEAM-DEPOSITED STRUCTURES 审中-公开
    纳米物体附着到束流沉积结构

    公开(公告)号：EP3243931A1

    公开(公告)日：2017-11-15

    申请号：EP16187654.5

    申请日：2016-09-07

    Applicant: FEI Company

    Inventor： Kianinia, Mehran ,  Shimoni, Olga ,  Aharonovich, Igor ,  Lobo, Charlene ,  Toth, Milos ,  Randolph, Steven ,  Chandler, Clive

    IPC: C23F4/02 ,  C25D5/02 ,  H01J37/18 ,  H01J37/30

    Abstract: Beam-induced deposition decomposes a precursor at precise positions on a surface. The surface is processed to provide linker groups on the surface of the deposit, and the sample is processed to attach nano-objects to the linker groups. The nano-objects are used in a variety of application. When a charged particle beam is used to decompose the precursor, the charged particle beam can be used to form an image of the surface with the nano-objects attached.

    Abstract translation: 光束诱导沉积在表面上的精确位置分解前体。 处理表面以在沉积物的表面上提供连接基团，并且处理样品以将纳米物体连接至连接基团。 纳米物体用于各种应用。 当使用带电粒子束来分解前体时，带电粒子束可以用来形成附着有纳米物体的表面的图像。

    Gas-assisted laser ablation
    2.
    发明公开
    Gas-assisted laser ablation 有权
    Gasunterstützte激光烧蚀

    公开(公告)号：EP2700470A1

    公开(公告)日：2014-02-26

    申请号：EP13193643.7

    申请日：2010-08-04

    Applicant: FEI COMPANY

    Inventor： Toth, Milos ,  Straw, Marcus

    IPC: B23K26/12 ,  B23K26/16 ,  B23K26/36 ,  B23K26/06

    CPC classification number: B29C35/08 ,  B23K26/0624 ,  B23K26/12 ,  B23K26/126 ,  B23K26/127 ,  B23K26/16 ,  B23K26/36 ,  B41M5/24

    Abstract: An improved apparatus for laser processing that prevents material redeposition during laser ablation but allows material to be removed at a high rate. In a preferred embodiment, laser ablation is performed in a chamber (140, 501) filled with high pressure precursor (etchant) gas so that sample particles ejected during laser ablation will react with the precursor gas in the gas atmosphere of the sample chamber. When the ejected particles (108) collide with precursor gas particles (202), the precursor is dissociated, forming a reactive component that binds the ablated material. In turn, the reaction between the reactive dissociation by-product and the ablated material forms a new, volatile compound (204) that can be pumped away in a gaseous state rather than redepositing onto the sample (104).

    Abstract translation: 一种用于激光加工的改进的装置，其防止在激光烧蚀期间的材料再沉积，但允许以高速率去除材料。 在优选实施例中，在填充有高压前体（蚀刻剂）气体的室（140,501）中进行激光烧蚀，使得在激光烧蚀期间喷射的样品颗粒将与样品室的气体气氛中的前体气体反应。 当排出的颗粒（108）与前体气体颗粒（202）碰撞时，前体解离，形成结合烧蚀材料的反应性组分。 反过来，反应性离解副产物与烧蚀材料之间的反应形成新的挥发性化合物（204），其可以气态泵送而不是重新沉积到样品（104）上。

    Use of nitrogen based compounds in beam-induced processing
    3.
    发明公开
    Use of nitrogen based compounds in beam-induced processing 有权
    维尔芬霍恩（Zen Verwendung von stickstoffbasierten Verbindungen bei strahleninduzierter Bearbeitung

    公开(公告)号：EP2309020A1

    公开(公告)日：2011-04-13

    申请号：EP10178148.2

    申请日：2010-09-22

    Applicant: FEI COMPANY

    Inventor： Lobo, Charlene ,  Toth, Milos ,  Randolph, Steven ,  Chandler, Clive

    IPC: C23C14/00 ,  C23C14/04 ,  C23C14/22 ,  C23C14/46 ,  C23C14/54 ,  C23C14/58

    CPC classification number: C23C14/0031 ,  C23C14/04 ,  C23C14/048 ,  C23C14/221 ,  C23C14/46 ,  C23C14/54 ,  C23C14/548 ,  C23C14/5846 ,  C23C14/5873

    Abstract: A system for beam-induced deposition or etching, in which a charged particle or laser beam can be directed to a work piece within a single vacuum chamber, either normally incident or at an angle. Simultaneously with beam illumination of the work piece, a deposition or etch precursor gas is co-injected or premixed with a purification compound and (optionally) a carrier gas prior to injection into the process chamber. The beam decomposes the deposition precursor gas to deposit a film only in areas illuminated by the beam, or decomposes the etch precursor gas to etch a film only in areas illuminated by the beam. Undesired impurities such as carbon in the deposited film are removed during film growth by interaction with adsorbed species on the work piece surface that are generated by interaction of the beam with adsorbed molecules of the film purification compound. Alternatively, the film purification compound can be used to inhibit oxidation of the material etched by the etch precursor gas. By co-injecting or premixing the deposition or etch precursor gas and film purification compound prior to injection, the deposition or etch process may be optimized with respect to growth/etch rate and achievable material purity.

    Abstract translation: 用于束诱导沉积或蚀刻的系统，其中带电粒子或激光束可以被定向到单个真空室内的工件，正常入射或以一定角度。 在工件的光束照射的同时，沉积或蚀刻前体气体在注入到处理室之前与净化化合物和（任选的）载气共注入或预混合。 光束分解沉积前体气体以仅在由光束照射的区域中沉积膜，或者分解蚀刻前体气体以仅在由光束照射的区域中蚀刻膜。 通过与通过膜与纯化组合物的吸附分子的相互作用产生的工件表面上的吸附物质的相互作用，在膜生长过程中，除去沉积膜中的不期望的杂质如碳。 或者，膜纯化化合物可用于抑制由蚀刻前体气体蚀刻的材料的氧化。 通过在注入之前共沉积或预混合沉积或蚀刻前体气体和膜纯化化合物，可以相对于生长/蚀刻速率和可实现的材料纯度优化沉积或蚀刻工艺。

    METHOD OF IMAGING A SAMPLE WITH CHARGED PARTICLE BEAM USING AN IMAGING GAS
    6.
    发明授权
    METHOD OF IMAGING A SAMPLE WITH CHARGED PARTICLE BEAM USING AN IMAGING GAS 有权
    用成像气体成像带电荷粒子束的样品的方法

    公开(公告)号：EP3096343B1

    公开(公告)日：2017-12-27

    申请号：EP16169828.7

    申请日：2016-05-17

    Applicant: FEI Company

    Inventor： Shanley, Toby ,  Scott, John ,  Toth, Milos

    IPC: H01J37/244 ,  H01J37/18 ,  H01J37/22 ,  H01J37/28

    CPC classification number: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801 ,  H01J2237/2806

    Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH 3 CH 2 OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH 3 CH 2 OH to ionize the CH 3 CH 2 OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH 3 CH 2 OH-based processes.

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