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    Multiple Sample Attachment to Nano Manipulator for High Throughput Sample Preparation
    3.
    发明公开
    Multiple Sample Attachment to Nano Manipulator for High Throughput Sample Preparation 有权
    Mehrfachprobennahmebefestigung an Nanomanipulator zur Probenvorbereitung mit hohem Durchsatz

    公开(公告)号：EP2778652A3

    公开(公告)日：2016-05-25

    申请号：EP14159460.6

    申请日：2014-03-13

    Applicant: FEI COMPANY

    Inventor： Schmidt, Michael ,  Stone, Stacey ,  Senowitz, Corey

    IPC: G01N1/28 ,  H01J37/20 ,  H01J37/302

    CPC classification number: H01J37/3023 ,  G01N1/286 ,  H01J2237/201 ,  H01J2237/208 ,  H01J2237/31745

    Abstract: An improved method for extracting and handling multiple samples for S/TEM analysis is disclosed. Preferred embodiments of the present invention make use of a micromanipulator that attaches multiple samples at one time in a stacked formation and a method of placing each of the samples onto a TEM grid. By using a method that allows for the processing of multiple samples, the throughput of sample prep in increased significantly.

    Abstract translation: 公开了一种用于提取和处理多个样品进行S / TEM分析的改进方法。 本发明的优选实施例利用将叠层结构中的多个样品同时附着的显微操纵器和将每个样品放置在TEM网格上的方法。 通过使用允许多个样品处理的方法，样品制备的生产量显着增加。

    AUTOMATED TEM SAMPLE PREPARATION
    4.
    发明公开
    AUTOMATED TEM SAMPLE PREPARATION 审中-公开
    自动化TEM-PROBENHERSTELLUNG

    公开(公告)号：EP3018693A1

    公开(公告)日：2016-05-11

    申请号：EP15192862.9

    申请日：2015-11-04

    Applicant: FEI Company

    Inventor： Brogden, Valerie ,  Blackwood, Jeff ,  Schmidt, Michael ,  Trivedi, Dhruti ,  Young, Richard ,  Miller, Tom ,  Routh, Jr., Brian ,  Stone, Stacey ,  Templeton, Todd

    IPC: H01J37/304 ,  G01N1/28

    CPC classification number: H01J37/3023 ,  G01N1/286 ,  G01N2001/2873 ,  H01J37/28 ,  H01J37/285 ,  H01J37/3045 ,  H01J37/31 ,  H01J2237/208 ,  H01J2237/31745

    Abstract: Techniques are described that facilitate automated extraction of lamellae and attaching the lamellae to sample grids for viewing on transmission electron microscopes. Some embodiments of the invention involve the use of machine vision to determine the positions of the lamella, the probe, and/or the TEM grid to guide the attachment of the probe to the lamella and the attachment of the lamella to the TEM grid. Techniques that facilitate the use of machine vision include shaping a probe tip so that its position can be readily recognized by image recognition software. Image subtraction techniques can be used to determine the position of the lamellae attached to the probe for moving the lamella to the TEM grid for attachment. In some embodiments, reference structures are milled on the probe or on the lamella to facilitate image recognition.

    Abstract translation: 描述了有助于自动提取薄片并将薄片附着到样品网格上以在透射电子显微镜上观察的技术。 本发明的一些实施例涉及使用机器视觉来确定薄片，探针和/或TEM网格的位置，以将探针附着到薄片和将薄片附接到TEM网格。 便于使用机器视觉的技术包括成形探针尖端，使其位置可以被图像识别软件容易地识别。 图像减法技术可用于确定附着于探针的薄片的位置，以将薄片移动到TEM网格以进行附着。 在一些实施例中，参考结构在探头上或薄片上铣削以便于图像识别。

    Protective layer for charged-particle-beam processing
    5.
    发明公开
    Protective layer for charged-particle-beam processing 有权
    用于处理的带电粒子束提供保护层的装置

    公开(公告)号：EP1918981A2

    公开(公告)日：2008-05-07

    申请号：EP07119686.9

    申请日：2007-10-31

    Applicant: FEI COMPANY

    Inventor： Blackwood, Jeff ,  Stone, Stacey

    IPC: H01L21/00 ,  H01J37/26 ,  H01J37/30

    CPC classification number: H01L21/6715 ,  H01J2237/26 ,  H01J2237/31745

    Abstract: A protective layer is applied to a work piece (104) to protect the surface during charged particle beam processing by directing a fluid (112) toward the surface. The surface is preferably not touched by the applicator (108). Ink jet print-type print heads are suitable applicators. Ink jet-type print heads allow a wide variety of fluids to be used to form the protective layer. Useful fluids that form protective layers include colloidal silica having small silver particles, hydrocarbon-based inks, and dyes.

    Abstract translation: 的保护层施加到工件（104）通过引导朝向所述表面的流体（112），以保护带电粒子束处理期间的表面。 表面优选不通过涂抹器（108）触摸。 喷墨打印型打印头都适合施用器。 喷墨型的打印头允许多种流体被用于形成保护层。 有用的流体做形式的保护层包括具有胶体二氧化硅小的银颗粒，基于烃的油墨，和染料。

    Method for preparing samples for imaging
    6.
    发明公开
    Method for preparing samples for imaging 审中-公开
    一种制备样本的成像过程

    公开(公告)号：EP2749863A3

    公开(公告)日：2016-05-04

    申请号：EP13197357.0

    申请日：2013-12-16

    Applicant: FEI COMPANY

    Inventor： Schmidt, Michael ,  Blackwood, Jeff ,  Stone, Stacey ,  Lee, Sang Hoon ,  Kelley, Ronald

    IPC: H01L21/205

    CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Method for preparing samples for imaging
    8.
    发明公开
    Method for preparing samples for imaging 审中-公开
    Verfahren zur Vorbereitung von ProbenfürBildgebung

    公开(公告)号：EP2749863A2

    公开(公告)日：2014-07-02

    申请号：EP13197357.0

    申请日：2013-12-16

    Applicant: FEI COMPANY

    Inventor： Schmidt, Michael ,  Blackwood, Jeff ,  Stone, Stacey ,  Lee, Sang Hoon ,  Kelley, Ronald

    IPC: G01N1/28

    CPC classification number: G01N1/32 ,  G01N1/28 ,  H01L21/30655

    Abstract: A method and apparatus is provided for preparing samples for observation in a charged particle beam system in a manner that reduces or prevents artifacts. Material is deposited onto the sample using charged particle beam deposition just before or during the final milling, which results in an artifact-free surface. Embodiments are useful for preparing cross sections for SEM observation of samples having layers of materials of different hardnesses. Embodiments are useful for preparation of thin TEM samples.

    Abstract translation: 提供了一种方法和装置，用于以减少或防止伪影的方式制备用于在带电粒子束系统中观察的样品。 在最终研磨之前或期间，使用带电粒子束沉积将材料沉积到样品上，这导致无伪影的表面。 实施例对于制备具有不同硬度的材料层的样品的SEM观察的横截面是有用的。 实施例可用于制备薄TEM样品。

    Protective layer for charged-particle-beam processing
    9.
    发明公开
    Protective layer for charged-particle-beam processing 有权
    用于带电粒子束处理保护层

    公开(公告)号：EP1918981A3

    公开(公告)日：2009-07-22

    申请号：EP07119686.9

    申请日：2007-10-31

    Applicant: FEI COMPANY

    Inventor： Blackwood, Jeff ,  Stone, Stacey

    IPC: H01L21/00 ,  H01J37/317 ,  H01J37/26 ,  H01J37/30

    CPC classification number: H01L21/6715 ,  H01J2237/26 ,  H01J2237/31745

    Abstract: A protective layer is applied to a work piece (104) to protect the surface during charged particle beam processing by directing a fluid (112) toward the surface. The surface is preferably not touched by the applicator (108). Ink jet print-type print heads are suitable applicators. Ink jet-type print heads allow a wide variety of fluids to be used to form the protective layer. Useful fluids that form protective layers include colloidal silica having small silver particles, hydrocarbon-based inks, and dyes.

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