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1.发明公开
公开(公告)号：EP2590203A2
公开(公告)日：2013-05-08
申请号：EP12191348.7
申请日：2012-11-06
Applicant: FEI COMPANY
Inventor： Parker, William , Utlaut, Mark , Tuggle, David , Graham, Jeremy
IPC: H01J37/09
CPC classification number: G21K1/00 , H01J37/09 , H01J2237/045 , H01J2237/0453
Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening (432) is made in a thin conductive film (420) positioned over a cavity (430) in a support substrate (410), where the aperture size and shape is determined by the opening in the conductive film and not determined by the cavity in the substrate.
Abstract translation: 用于制造改进的射束定义孔结构和方法得以实现。 的孔开口（432）是在导电性薄膜（420）在支撑基底定位在腔（430）（410），其中所述孔的尺寸和形状是确定通过在导电膜中的开口所开采和不取决于由 在基片上的空腔中。
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2.发明授权METHOD OF FABRICATING A BEAM-DEFINING APERTURE FOR A FOCUSED ION BEAM AND BEAM DEFINITION OF A FOCUSED ION BEAM WITH SUCH AN APERTURE 有权FOR PRODUCING限定面板A A METHOD光束聚焦的聚焦离子束的离子束梁和定义与这种PANEL
公开(公告)号：EP2590203B1
公开(公告)日：2017-02-01
申请号：EP12191348.7
申请日：2012-11-06
Applicant: FEI COMPANY
Inventor： Parker, William , Utlaut, Mark , Tuggle, David , Graham, Jeremy
IPC: H01J37/09
CPC classification number: G21K1/00 , H01J37/09 , H01J2237/045 , H01J2237/0453
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3.发明授权Aberration-corrected wien ExB mass filter with removal of neutrals from the beam 有权从光束去除中性粒子的像差校正维恩ExB滤质器
公开(公告)号：EP2511935B1
公开(公告)日：2015-06-03
申请号：EP12164205.2
申请日：2012-04-16
Applicant: FEI Company
Inventor： Tuggle, David , Parker, N. William , Utlaut, Mark
IPC: H01J37/05
CPC classification number: H01J37/05 , H01J37/317 , H01J2237/053 , H01J2237/055 , H01J2237/057 , H01J2237/31749
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公开(公告)号：EP2590203A3
公开(公告)日：2014-06-04
申请号：EP12191348.7
申请日：2012-11-06
Applicant: FEI COMPANY
Inventor： Parker, William , Utlaut, Mark , Tuggle, David , Graham, Jeremy
IPC: H01J37/09
CPC classification number: G21K1/00 , H01J37/09 , H01J2237/045 , H01J2237/0453
Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening (432) is made in a thin conductive film (420) positioned over a cavity (430) in a support substrate (410), where the aperture size and shape is determined by the opening in the conductive film and not determined by the cavity in the substrate.
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公开(公告)号：EP2725602A2
公开(公告)日：2014-04-30
申请号：EP13189977.5
申请日：2013-10-24
Applicant: FEI Company
Inventor： Tuggle, David , McGinn, James , Otis, Charles
IPC: H01J37/244
CPC classification number: H01J37/244 , H01J2237/12 , H01J2237/1501 , H01J2237/24485 , H01J2237/2449 , H01J2237/24514
Abstract: A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. In a method of analyzing the energy of a charged particle beam, a retarding field through which the beam (114) passes is provided by applying a voltage to the element (116B) of the electrostatic focusing lens (116) retarding the beam, and the retarding field is incrementally increased by incrementally changing this voltage to alter the number of charged particles that pass through the electrostatic lens. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer.
Abstract translation: 延迟场分析仪使用带电粒子束系统的现有组件，无需插入单独的延迟场分析器设备。 在分析带电粒子束的能量的方法中，通过向静电会聚透镜（116）的元件（116B）施加电压来使束（114）通过的延迟场被提供，从而使束延迟，并且 通过递增地改变该电压以增加通过静电透镜的带电粒子的数量来增加阻滞场的增加。 使用现有色谱柱的组分减少了分析光束所需的时间。 使用现有色谱柱的成像功能有利于光束与分析仪的对准。
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Patent Agency Ranking6.发明公开Retarding field analyzer integral with particle beam column 有权Teilchenstrahlensäule集成Bremsfeldanalysiergerät
公开(公告)号：EP2725602A3
公开(公告)日：2016-03-16
申请号：EP13189977.5
申请日：2013-10-24
Applicant: FEI Company
Inventor： Tuggle, David , McGinn, James , Otis, Charles
IPC: H01J37/244
CPC classification number: H01J37/244 , H01J2237/12 , H01J2237/1501 , H01J2237/24485 , H01J2237/2449 , H01J2237/24514
Abstract: A retarding field analyzer uses the existing components of a charged particle beam system eliminating the need for inserting a separate retarding field analyzer device. In a method of analyzing the energy of a charged particle beam, a retarding field through which the beam (114) passes is provided by applying a voltage to the element (116B) of the electrostatic focusing lens (116) retarding the beam, and the retarding field is incrementally increased by incrementally changing this voltage to alter the number of charged particles that pass through the electrostatic lens. Using components of the existing column reduces the time required to analyze the beam. Using the imaging capabilities of the existing column facilitates alignment of the beam with the analyzer.
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7.发明公开Aberration-corrected wien ExB mass filter with removal of neutrals from the beam 有权Aberrationskorrigierter Wien-ExB-Massenfilter mit Beseitigung von Neutralen aus dem Strahl
公开(公告)号：EP2511935A1
公开(公告)日：2012-10-17
申请号：EP12164205.2
申请日：2012-04-16
Applicant: FEI Company
Inventor： Tuggle, David , Parker, N. William , Utlaut, Mark
IPC: H01J37/05
CPC classification number: H01J37/05 , H01J37/317 , H01J2237/053 , H01J2237/055 , H01J2237/057 , H01J2237/31749
Abstract: A mass filter for an ion beam system includes at least two stages (306U,306L) and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.
Abstract translation: 用于离子束系统的质量过滤器包括至少两个级（306U，306L）并且减少色差。 一个实施例包括两个对称质量过滤器级，其组合减少或消除色差，以及入射和出射边缘场误差。 实施例还可以防止中性粒子到达样品表面，并避免光束路径中的交叉。 在一个实施方案中，过滤器可以从产生多种物质的源传递单种离子。 在其它实施例中，过滤器可以通过具有一定能量范围的单个离子种类并将多能量离子聚焦在衬底表面上的相同点。
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公开(公告)号：EP2725602B1
公开(公告)日：2017-07-26
申请号：EP13189977.5
申请日：2013-10-24
Applicant: FEI Company
Inventor： Tuggle, David , McGinn, James , Otis, Charles
IPC: H01J37/244
CPC classification number: H01J37/244 , H01J2237/12 , H01J2237/1501 , H01J2237/24485 , H01J2237/2449 , H01J2237/24514
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公开(公告)号：EP2511934B1
公开(公告)日：2015-11-18
申请号：EP12164204.5
申请日：2012-04-16
Applicant: FEI Company
Inventor： Tuggle, David , Parker, N. William
IPC: H01J37/05
CPC classification number: H01J37/05 , H01J2237/31749
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公开(公告)号：EP2511934A1
公开(公告)日：2012-10-17
申请号：EP12164204.5
申请日：2012-04-16
Applicant: FEI Company
Inventor： Tuggle, David , Parker, N. William
IPC: H01J37/05
CPC classification number: H01J37/05 , H01J2237/31749
Abstract: An ExB Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used to provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.
Abstract translation: ExB Wien质量过滤器提供独立可调的电场，并结合质量分离所需的偶极电场。 独立可调的电场可用于提供更大的光学孔径，以校正散光并使光束在平行于和/或垂直于磁场的方向上偏转。
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