公开(公告)号：SG176657A1

公开(公告)日：2012-01-30

申请号：SG2011089596

申请日：2010-06-03

Applicant: FUJIFILM CORP

Inventor： ENOMOTO YUICHIRO ,  TARUTANI SHINJI ,  SHIBUYA AKINORI ,  YAMAGUCHI SHUHEI

公开(公告)号：SG186712A1

公开(公告)日：2013-02-28

申请号：SG2012091492

申请日：2011-02-24

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  ENOMOTO YUICHIRO ,  MIZUTANI KAZUYOSHI ,  TSUCHIHASHI TORU ,  FUJII KANA

Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

公开(公告)号：SG184290A1

公开(公告)日：2012-11-29

申请号：SG2012071619

申请日：2011-03-25

Applicant: FUJIFILM CORP

Inventor： KATAOKA SHOHEI ,  IWATO KAORU ,  KAMIMURA SOU ,  TSUCHIHASHI TORU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  MIZUTANI KAZUYOSHI ,  TARUTANI SHINJI ,  KATO KEITA

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition and a method of forming a pattern using the same, ensuring excellent the etching resistivity and the stability during a post-exposure delay (PED) period. The composition contains a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, and a compound that generates an acid of pKa≧−1.5 when exposed to actinic rays or radiation.

公开(公告)号：SG182354A1

公开(公告)日：2012-08-30

申请号：SG2012049441

申请日：2011-01-07

Applicant: FUJIFILM CORP

Inventor： ENOMOTO YUICHIRO ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  IWATO KAORU ,  KATO KEITA ,  SHIBUYA AKINORI

Abstract: Provided is a pattern forming method comprising (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the actinic ray-sensitive or radiation-sensitive resin composition comprises (A) a resin capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (D) a solvent, and (G) a compound having at least either one of a fluorine atom and a silicon atom and having basicity or being capable of increasing the basicity by the action of an acid.

公开(公告)号：SG183808A1

公开(公告)日：2012-10-30

申请号：SG2012061438

申请日：2011-03-25

Applicant: FUJIFILM CORP

Inventor： KATO KEITA ,  TARUTANI SHINJI ,  TSUCHIHASHI TORU ,  KAMIMURA SOU ,  ENOMOTO YUICHIRO ,  FUJII KANA ,  IWATO KAORU ,  KATAOKA SHOHEI ,  MIZUTANI KAZUYOSHI

Abstract: Provided is a method of forming a pattern, ensuring excellent exposure latitude (EL) and focus latitude (depth of focus DOF). The method of forming a pattern includes (A) forming a film from a resist composition, the resist composition, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent, thereby forming a negative pattern. The resist composition contains (a) a resin that is configured to decompose when acted on by an acid and &Dgr;SP thereof represented by formula (1) below is 2.5 (MPa)1/2 or above, (b) a compound that is composed to generate an acid when exposed to actinic rays or radiation, and (c) a solvent. &Dgr;SP=SPF-SPI •••(1)

公开(公告)号：SG176867A1

公开(公告)日：2012-01-30

申请号：SG2011092947

申请日：2010-06-14

Applicant: FUJIFILM CORP

Inventor： ENOMOTO YUICHIRO ,  KAMIMURA SOU ,  TARUTANI SHINJI

Abstract: A pattern forming method, including: (i) forming a film from a chemical amplification resist composition; (ii) exposing the film, so as to form an exposed film; and (iii) developing the exposed film by using a developer containing an organic solvent, wherein the chemical amplification resist composition contains: (A) a resin capable of decreasing a solubility of the resin (A) in the developer containing an organic solvent by an action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a basic compound or ammonium salt compound whose basicity decreases upon irradiation with an actinic ray or radiation, and a resist composition used for the pattern forming method and a resist film formed from the resist composition are provided.

公开(公告)号：EP2521941A4

公开(公告)日：2013-10-23

申请号：EP11731870

申请日：2011-01-07

Applicant: FUJIFILM CORP

Inventor： ENOMOTO YUICHIRO ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  IWATO KAORU ,  KATO KEITA ,  SHIBUYA AKINORI

IPC: G03F7/004 ,  C08F20/34 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041

公开(公告)号：EP2539769A4

公开(公告)日：2013-11-20

申请号：EP11747578

申请日：2011-02-24

Applicant: FUJIFILM CORP

Inventor： IWATO KAORU ,  KATAOKA SHOHEI ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  ENOMOTO YUICHIRO ,  MIZUTANI KAZUYOSHI ,  TSUCHIHASHI TORU ,  FUJII KANA

IPC: G03F7/038 ,  C08F220/28 ,  C08F232/00 ,  G03F7/039 ,  G03F7/32 ,  H01L21/027

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0757 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  Y10T428/24479

Abstract: Provided is a method of forming a pattern, ensuring excellent sensitivity, limiting resolving power, roughness characteristic, exposure latitude (EL), dependence on post-exposure bake (PEB) temperature and focus latitude (depth of focus DOF), and a resist composition for use in the method. The method comprises (A) forming a film from a resist composition comprising a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group, which resin thus when acted on by an acid decreases its solubility in a developer containing an organic solvent, (B) exposing the film to light, and (C) developing the exposed film using a developer containing an organic solvent.

Abstract translation: 提供一种形成图案的方法，其确保极好的灵敏度，限制分辨率，粗糙度特性，曝光宽容度（EL），曝光后烘焙（PEB）温度和焦点宽容度（焦深DOF）的依赖性，以及抗蚀剂组合物 用于该方法中。 该方法包括：（A）由抗蚀剂组合物形成膜，所述抗蚀剂组合物包含含有重复单元的树脂，所述重复单元含有在被酸作用时分解从而产生醇羟基的基团，因此该树脂因此当被酸作用时降低 其在含有有机溶剂的显影液中的溶解性，（B）将该膜曝光，以及（C）使用含有有机溶剂的显影液使曝光的显影液显影。

公开(公告)号：EP2732460A4

公开(公告)日：2015-05-27

申请号：EP12811906

申请日：2012-07-09

Applicant: FUJIFILM CORP

Inventor： KODAMA KUNIHIKO ,  ENOMOTO YUICHIRO ,  USUKI KAZUYUKI ,  OMATSU TADASHI ,  KITAGAWA HIROTAKA

IPC: H01L21/027 ,  B29C59/02 ,  C08F2/44 ,  C08F2/48 ,  C08F220/10 ,  C09D4/06 ,  G11B5/84

CPC classification number: C08K5/053 ,  B29C59/005 ,  C08F2/46 ,  C08F2/48 ,  C08F220/10 ,  C08F220/22 ,  C08F222/1006 ,  C08F230/08 ,  C08F2220/1833 ,  C08F2220/185 ,  C08F2220/1875 ,  C08F2220/1891 ,  C08F2220/382 ,  C08F2222/1013 ,  C08F2222/102 ,  C09D4/06 ,  G11B5/855 ,  Y10T428/24479 ,  C09D133/04 ,  C08L71/02

Abstract: Disclosed is a to provide a curable composition for imprints capable of keeping a good patternability and of producing less defects even after repetitive pattern transfer. The curable composition for imprints comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a non-polymerizable compound (C) having a polyalkylene glycol structure having at least one terminal hydroxy group, or at least one etherified terminal hydroxy group, and containing substantially no fluorine atom and no silicon atom.

Abstract translation: 本发明是为了提供能够保持良好的图案化性和即使在重复图案转印之后产生较少缺陷的印痕的可固化组合物。 用于印记的可固化组合物包括：可聚合化合物（A）; 光聚合引发剂（B）; 和具有至少一个末端羟基的聚亚烷基二醇结构或至少一个醚化末端羟基并且基本上不含氟原子且不含硅原子的不可聚合化合物（C）。

公开(公告)号：EP2609468A4

公开(公告)日：2014-04-30

申请号：EP11820079

申请日：2011-08-26

Applicant: FUJIFILM CORP

Inventor： ENOMOTO YUICHIRO ,  TARUTANI SHINJI ,  KAMIMURA SOU ,  KATO KEITA ,  FUJII KANA

IPC: G03F7/32 ,  G03F7/038 ,  G03F7/039 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

CPC classification number: G03F7/40 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405 ,  H01L29/02