-
1.发明公开ACTINIC RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN 审中-公开反对光化射线或 辐射敏感树脂组合物，在光化射线或 辐射敏感薄膜和结构教育过程
公开(公告)号：EP2776889A4
公开(公告)日：2015-06-17
申请号：EP12847779
申请日：2012-11-02
Applicant: FUJIFILM CORP
Inventor： SHIBUYA AKINORI , TOKUGAWA YOKO , MATSUDA TOMOKI , ITO JUNICHI , KATAOKA SHOHEI , FUKUHARA TOSHIAKI , TANGO NAOHIRO , IWATO KAORU , YOSHIDOME MASAHIRO , SUGIYAMA SHINICHI
CPC classification number: G03F7/038 , C07C303/32 , C07C309/04 , C07C309/12 , C07D295/16 , C07D327/06 , C07D339/08 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , G03F7/325
Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition including (A) a compound represented by a general formula (1) below that generates an acid when exposed to actinic rays or radiation, and (B) a resin.
-
2.发明公开ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME 审中-公开光化辐射敏感性树脂组合物和结构，教育的过程，
公开(公告)号：EP2478415A4
公开(公告)日：2015-02-25
申请号：EP10817324
申请日：2010-09-16
Applicant: FUJIFILM CORP
Inventor： IIZUKA YUSUKE , TAKAHASHI HIDENORI , SHIRAKAWA MICHIHIRO , YOSHIDOME MASAHIRO , HIRANO SHUJI
IPC: G03F7/039 , C08F220/26 , G03F7/004 , H01L21/027
CPC classification number: C08F220/26 , G03F7/0397 , G03F7/2041
-
Search Results
2
records
(took 0.02 seconds)
