公开(公告)号：JPH09172411A

公开(公告)日：1997-06-30

申请号：JP27199796

申请日：1996-10-15

Applicant: IBM

Inventor： RABI SHIYANKAA ANASU ,  SAJIIRU MUNISUWAMI GOODA ,  MAAKU SAMUSON MIRUSHIYUTEIN ,  MAAKU BII RITSUTAA ,  DENISU RII ROJIYAAZU

IPC: H04B10/60 ,  H04B10/07 ,  H04B10/114 ,  H04B10/40 ,  H04B10/50 ,  H04B10/69 ,  H04B10/28 ,  H04B10/04 ,  H04B10/06 ,  H04B10/14 ,  H04B10/26

Abstract: PROBLEM TO BE SOLVED: To obtain an automatically adaptive threshold setting circuit by measuring a current flowing a reverse bias IR light detector corresponding to the surrounding light level and using this current for adjusting the sensitivity of a receiver. SOLUTION: The current flowing through a resistor 21 is a function of surrounding light in the light detector 11, the outputs of a buffer and a level shifter 22 becomes input to a current mirror consisting of transistors 23 and 24, and the current mirror operates as a variable impedance. One input of a level restoring circuit 26 is connected to the positive input of an amplifier 17 to be a node A and the other input is connected to a node B. A threshold is set by drawing a current through a resistor 25 and generating voltage at the node B so as to sense a voltage level at the output of the post amplifier 17. Then voltage at a node C is always offset from a level at the node A to be positive and this offset quantity is the threshold.

公开(公告)号：JPH05121313A

公开(公告)日：1993-05-18

申请号：JP8070492

申请日：1992-04-02

Applicant: IBM

Inventor： MARII ANJIEROPOUROSU ,  MITSUCHIERU SAIMONZU KOOEN ,  ANDORUU TOMASU SUCHIYUAATO POM ,  DENISU RII ROJIYAAZU

IPC: H01L21/027 ,  G02B6/122 ,  G02B6/42 ,  H01L31/10

Abstract: PURPOSE: To protect a photosensitive region in an integrated circuit from stray light and restrain interference in an optical connector, etc. by coating an entire photosensitive region with a specified material and exposing it to a radiation ray. CONSTITUTION: A photosensor 201 is integrated onto a wafer 200. An entire photosensitive region 203 is coated with a first material, which is converted into a light-blocking layer, when irradiated by a lithographic method for protecting the photosensitive region 203 in an integrated circuit, including at least one photodetection region 202 from the action of a stray light. A coated photosensitive region is exposed to the radiation ray by a lithographic method, and the first material is converted into a light blocking layer. In the process, exposure is carried out by a method, which ensures that any photodetection region contained inside an integrated circuit is not covered with a light-blocking layer.

公开(公告)号：JPH0540214A

公开(公告)日：1993-02-19

申请号：JP11769391

申请日：1991-05-22

Applicant: IBM

Inventor： MAAKU FUIIRUDEINGU BURETSUGUMA ,  UIRIAMU DEIIN BUREWAA ,  MITSUCHIERU SHIMONZU KOOHEN ,  GUREN UORUDEN JIYONSON ,  ISUMAIRU SEBUDETSUTO NOYAN ,  MODESUTO MAIKERU OPURISUKO ,  MAAKU BII RITSUTAA ,  DENISU RII ROJIYAAZU ,  JIININ MADERIN TOREUERA

IPC: G02B6/42 ,  G02B6/43 ,  H01L31/12 ,  H01L31/167 ,  H04B10/00

Abstract: PURPOSE: To provide an electrooptical connector which copes with high-density applications and meets positioning requests in a wide range and has a high optical crosstalk immunity. CONSTITUTION: A connector provided with an upper half part and a low half part 201 is provided, and each half part is provided with an LED chip 202 or 204 and a detector chip 203 or 205, and a small lens array 210 acting as an energy transfer medium is provided between two half parts to form optical connection.