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公开(公告)号:JPH07233325A
公开(公告)日:1995-09-05
申请号:JP31944394
申请日:1994-11-30
Applicant: IBM
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公开(公告)号:JPH05121313A
公开(公告)日:1993-05-18
申请号:JP8070492
申请日:1992-04-02
Applicant: IBM
Inventor: MARII ANJIEROPOUROSU , MITSUCHIERU SAIMONZU KOOEN , ANDORUU TOMASU SUCHIYUAATO POM , DENISU RII ROJIYAAZU
IPC: H01L21/027 , G02B6/122 , G02B6/42 , H01L31/10
Abstract: PURPOSE: To protect a photosensitive region in an integrated circuit from stray light and restrain interference in an optical connector, etc. by coating an entire photosensitive region with a specified material and exposing it to a radiation ray. CONSTITUTION: A photosensor 201 is integrated onto a wafer 200. An entire photosensitive region 203 is coated with a first material, which is converted into a light-blocking layer, when irradiated by a lithographic method for protecting the photosensitive region 203 in an integrated circuit, including at least one photodetection region 202 from the action of a stray light. A coated photosensitive region is exposed to the radiation ray by a lithographic method, and the first material is converted into a light blocking layer. In the process, exposure is carried out by a method, which ensures that any photodetection region contained inside an integrated circuit is not covered with a light-blocking layer.
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