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公开(公告)号：AU539639B2
公开(公告)日：1984-10-11
申请号：AU6298180
申请日：1980-10-06
Applicant: IBM
Inventor： AVIRAM ARI , HATZAKIS MICHAEL , KAUFMAN FRANK B , KRAMER STEVEN R , HOFER DONALD C , JONES FLETCHER
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公开(公告)号：AU539640B2
公开(公告)日：1984-10-11
申请号：AU6298380
申请日：1980-10-06
Applicant: IBM
Inventor： AVIRAM ARI , HOFER DONALD C , KAUFMAN FRANK B , KRAMER STEVEN ROBERT
IPC: G03F7/004 , G03C1/675 , G03C5/00 , G03C5/16 , G03F7/038 , H01L21/027 , H01L21/302 , G03C1/727
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3.发明专利
公开(公告)号：CA1161685A
公开(公告)日：1984-02-07
申请号：CA358898
申请日：1980-08-25
Applicant: IBM
Inventor： AVIRAM ARI , HOFER DONALD C , KAUFMAN FRANK B , KRAMER STEVEN R
IPC: G03F7/004 , G03C1/675 , G03C5/00 , G03C5/16 , G03F7/038 , H01L21/027 , H01L21/302 , G03C1/495
Abstract: new class of X-ray resists are described. The resists are donor polymer-doped halocarbon acceptor transfer complexes. They are prepared from known polymeric backbones such as polyvinylchloride, polyglutamic acid, polyvinylbenzylchloride, polyepichlorohydrin, poly(.alpha.halophosphazenes), polyacrylic chloride, polystyrene and the like, and donor molecules such as tetrathiafulvalenes, tetraselenafulvalenes, dithiadiselenafulvalene, ferrocenes, phenothiazines, pyrazoline and an amine having the general formula R-NH2 where R can be selected from alkyl and aryl groups. A lithographic method is also described.
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4.发明专利
公开(公告)号：CA1163671A
公开(公告)日：1984-03-13
申请号：CA358901
申请日：1980-08-25
Applicant: IBM
Inventor： AVIRAM ARI , HATZAKIS MICHAEL , JONES FLETCHER , KAUFMAN FRANK B , KRAMER STEVEN R , HOFER DONALD C
IPC: G03D7/00
Abstract: A new class of E-beam resists is described. The resists are donor polymer-doped halocarbon acceptor transfer complexes. They are prepared from known polymeric backbones such as polyvinylchloride, polyglutamic acid, polyvinylbenzylchloxide, polyepichlorohydrin, poly(ahalophosphazenes), polyacrylic chloride, polystyrene and the like; and donor molecules such as tetrathiafulvalenes, tetraselenafulvalenes, dithiadiselenafulvalene, ferrocenes, phenothiazines, pyrazoline and an amine having the general formula R-NH2 where R can be selected from alkyl and aryl groups. A lithographic method is also described.
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公开(公告)号：FR2376413A1
公开(公告)日：1978-07-28
申请号：FR7735650
申请日：1977-11-18
Applicant: IBM
Inventor： HOFER DONALD C , KAHWATY VINCENT N , VALENTINO CARL R
Abstract: A method is described for the quantitative analysis of a solution in which the solvent produces a nuclear magnetic resonant (NMR) spectral peak that dominates the system. A first spectrum containing the peak is made by operation of a nuclear magnetic resonant spectrometer at a first gain setting. The NMR apparatus is a pulse-modulated, Fourier-transform type spectrometer. A second spectrum is produced in which a 180 DEG pulse is applied to invert the spectral component magnetization followed after a period of time by a 90 DEG pulse. The period of time is sufficient to allow the solvent or component producing the unwanted peak to relax from the inverted state to a point where there is minimum magnetization along the longitudinal axis. At this point, in many solutions the other components have completely relaxed so that the 90 DEG pulse produces a free induction decay signal which, after undergoing the Fourier-transformation, yields a spectrum that does not include any significant peak due to the solvent. Thereafter, the quantitative analysis is performed by measuring the areas under the respective component peaks and simultaneously solving a series of equations in which the weight of the various components is proportional to the respective areas under the peaks and to the gain settings of the spectrometer.
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Patent Agency Ranking
公开(公告)号：DE69618752T2
公开(公告)日：2002-09-12
申请号：DE69618752
申请日：1996-10-01
Applicant: IBM
Inventor： BREYTA GREGORY , DIPIETRO RICHARD A , HOFER DONALD C , ITO HIROSHI
IPC: G03F7/004 , G03F7/039 , H01L21/027
Abstract: A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.
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公开(公告)号：DE69618752D1
公开(公告)日：2002-03-14
申请号：DE69618752
申请日：1996-10-01
Applicant: IBM
Inventor： BREYTA GREGORY , DIPIETRO RICHARD A , HOFER DONALD C , ITO HIROSHI
IPC: G03F7/004 , G03F7/039 , H01L21/027
Abstract: A radiation sensitive resist compsn. comprises: (a) bis (lower alkyl phenyl) iodonium camphor sulphonate; and (b) a copolymer comprising hydroxystyrene and (meth)acrylate having an acid-clearable substituent.
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8.发明专利
公开(公告)号：CA1175990A
公开(公告)日：1984-10-09
申请号：CA358894
申请日：1980-08-25
Applicant: IBM
Inventor： AVIRAM ARI , KAUFMAN FRANK B , KRAMER STEVEN R , SHAW JANE M , HOFER DONALD C
Abstract: A new class of phot resists is described. The resists are donor polymer-doped halcarbon acceptor transfer complexes. They are prepared from know polymeric backbones such as polyvinylchloride, polyglutamic acid, polyvinylbenzylchloxide, polyepichlorohydrin, poly(.alpha.halophosphazenes), polyacrylic chloride, polystyrene and the like; and donor molecules such as tetrathiafulvalenes, tetraselenafulvalenes, dithiadiselenafulvalene, ferrocenes, phenothiazines, pyrazoline and an amine having the general formula R-NH2 where R can be selected from alkyl and aryl groups. A lithographic method is also described.
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公开(公告)号：CA1223782A
公开(公告)日：1987-07-07
申请号：CA508355
申请日：1986-05-05
Applicant: IBM
Inventor： HOFER DONALD C , LA VERGNE DEBRA B , TWIEG ROBERT J , VOLKSEN WILLI
IPC: H01L23/24
Abstract: PROCESS FOR PLANARIZING A SUBSTRATE A surface coating of high glass temperature and superior mechanical properties along with excellent planarization and gap filling is used to coat substrates. The coating comprises a polyamide alkyl ester from a pyromellitic alkyl diester and a para-linked aromatic diamine dissolved in a solvent containing at least 10% of a co-solvent boiling above 220.degree.C.
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公开(公告)号：AU549136B2
公开(公告)日：1986-01-16
申请号：AU6298280
申请日：1980-10-06
Applicant: IBM
Inventor： AVIRAM ARI , HOFER DONALD C , KAURMAN FRANK B , KRAMER STEVEN R , SHAW JANE M
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