公开(公告)号：DE3068815D1

公开(公告)日：1984-09-06

申请号：DE3068815

申请日：1980-11-20

Applicant: IBM

Inventor： BRODSKY MARC HERBERT ,  GREEN DENNIS CLINTON ,  KUCZA JOSEPH ALBERT ,  PLECENIK RICHARD MICHAEL ,  SCOTT BRUCE ALBERT

IPC: H01L31/04 ,  C23C16/06 ,  C23C16/24 ,  C23C16/32 ,  C23C16/34 ,  C23C16/40 ,  H01L21/205 ,  H01L21/314 ,  H01L21/316 ,  H01L21/318 ,  C23C11/00 ,  H01L21/02

Abstract: The films (10) are formed on a substrate (9) by means of chemical vapor deposition where a gas atmosphere containing at least one silane or germane of a higher order is used. The gases forming the gas atmosphere are supplied to a region adjacent to the substrate (9) and an excitation energy is applied to those gases preferably with a glow discharge being generated. At least when the gas atmosphere additionally contains a gas reacting with the silane or the germane respectively the pressure of the reactive gases is kept below 0.133 mbar. … The films (10) formed consist of silicon or germanium respectively, or of compounds or alloys of these elements with oxygen, nitrogen, carbon and boron depending on the nature of the additionally available reactive gases. The films (10) preferably hydrated are useful in semiconducting devices.

公开(公告)号：DE2352368A1

公开(公告)日：1974-05-09

申请号：DE2352368

申请日：1973-10-18

Applicant: IBM

Inventor： GREEN DENNIS CLINTON ,  YOUNG WILLIAM ROBERT

IPC: C07C37/00 ,  C07C49/825 ,  C09K19/20 ,  G02F1/13 ,  C07C69/90 ,  G02F1/16

公开(公告)号：DE3684504D1

公开(公告)日：1992-04-30

申请号：DE3684504

申请日：1986-04-11

Applicant: IBM

Inventor： GRECO STEPHEN EDWARD ,  GREEN DENNIS CLINTON

IPC: C08F12/00 ,  C08F12/34 ,  G03F7/023 ,  G03F7/028 ,  G03F7/038 ,  H01L21/027 ,  G03F7/021

Abstract: A film forming, radiation sensitive resist composition having improved thermal stability and a reduced dissolution rate in developer solutions, comprised of a sensitizer and a polyalkenyl phenol such as a polyvinyl phenol cross-linked, prior to irradiation, with a polyfunctional cross-linking agent such as dimethylol p-cresol or hexamethylene tetramine and a process for the production of a resist image using said composition is described.

公开(公告)号：DE2961095D1

公开(公告)日：1982-01-07

申请号：DE2961095

申请日：1979-03-16

Applicant: IBM

Inventor： BERKENBLIT MELVIN ,  GREEN DENNIS CLINTON ,  KAUFMAN FRANK BENJAMIN ,  REISMAN ARNOLD

IPC: C23F1/10 ,  H01L21/306 ,  H01L21/308 ,  C09K13/00

公开(公告)号：DE2739584A1

公开(公告)日：1978-06-08

申请号：DE2739584

申请日：1977-09-02

Applicant: IBM

Inventor： GREEN DENNIS CLINTON

IPC: C09K3/16 ,  C07D339/06 ,  C07D345/00 ,  H01B1/12 ,  H01G9/02 ,  H01G9/028 ,  H01M6/18 ,  C07D409/04 ,  C07D421/04