公开(公告)号：JPH05217950A

公开(公告)日：1993-08-27

申请号：JP22608692

申请日：1992-08-25

Applicant: IBM

Inventor： MAIKERU SUKOTSUTO BAANZU ,  DENISU KIISU KUURUTASU ,  JIYON KAATO FUOOSUTAA ,  JIYON HAWAADO KERAA ,  JIEEMUZU ANSONII ONIIRU

IPC: C23C14/00 ,  C23F4/00 ,  H01J37/32 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31

Abstract: PURPOSE: To provide an equipment and method for plasma treatment, including the gettering of particles of a high charge/mass ratio from a semiconductor wafer. CONSTITUTION: In a first mode, magnetic fields 27, 29 which cross an electric field E are generated using magnets 15, 17 to extract negative particles from a wafer 1, and thereby a sheath which could trap particles is prevented from being formed. In a second case, a power supply is connected to a wafer electrode to keep negative charges on the wafer, and thereby negative particles are prevented from being attracted to the surface of the wafer, when plasma is turned off. In another case, using a source of low density plasma, a large plasma sheath for allowing particles to cross a chamber and be gettered is generated. With low density plasma discharging and a high density pulse that follows the low density plasma, a negative effect of an insulating layer between the wafer and the wafer electrode is eliminated.

公开(公告)号：JPH07302759A

公开(公告)日：1995-11-14

申请号：JP3195295

申请日：1995-02-21

Applicant: IBM

Inventor： JIYONASAN DANIERU CHIYATSUPURU ,  RICHIYAADO ANSONII KONCHI ,  JIEEMUZU ANSONII ONIIRU ,  NARAYAANA BUII SARUMA ,  DONARUDO RESURII UIRUSON ,  JIYASUTEIN WAI CHIYOU UON

IPC: H01L21/205 ,  C23C16/40 ,  C23C16/44 ,  C23C16/448 ,  C23C16/52

Abstract: PURPOSE: To adjust a vapor send-out system, by bringing out a control signal for sending aluminum triisopropoxide(ATI) to a reactor or an exhaust pipe, by using a Fourier transform infrared(FTIR) spectrometer, in response to presence of contaminants and decomposition products in vapor stream. CONSTITUTION: When an FTIR spectrometer 5 analyzes reaction product vapor flowing in an IR cell 14, an information which shows whether contaminates or decomposition products exist is give to a process controller. Depending upon the composition of reaction product vapor which is harmful to a reactor or a workpiece in the reactor, the controller operates a valve 7, and stream of the reaction product vapor is changed so as to make it flow from a pipe 12 to a pump 13. When composition of the reaction product vapor is proper, the valve 7 is operated, and the reception product vapor is sent from a pipe 10 to a CVD reactor 11 to be fraught into reaction with the workpiece 15. Thereby, the reactor and the workpiece can be protected from the contaminants.

公开(公告)号：JPH07188932A

公开(公告)日：1995-07-25

申请号：JP25699394

申请日：1994-10-21

Applicant: IBM

Inventor： JIEEMUZU ANSONII ONIIRU ,  MAIKERU REEN PATSUSOU ,  TEINA JIEEN KOTORAA ,  JIYONASAN DANIERU CHIYATSUPURU ,  RICHIYAADO ANSONII KONTEI ,  JIYOISHI SHIN

IPC: G01N21/33 ,  C23C16/44 ,  C23C16/455 ,  C23C16/52 ,  C23F4/00 ,  G01N21/35 ,  H01L21/205 ,  H01L21/302 ,  H01L21/31 ,  H01L31/00 ,  H01L21/3065