公开(公告)号：JPH05232707A

公开(公告)日：1993-09-10

申请号：JP30589892

申请日：1992-10-21

Applicant: IBM

Inventor： NIKORASU JIEFURIIZU KUREKAKU ,  UIRAADO AARU KONREE ,  RANII WAIIRIN KUUON ,  RIIOU RORENSU RAINHAN ,  SUKOTSUTO AASAA MAKUDONARUDO ,  HAABANZU SHINGU SAKUDEBU ,  FUUBERUTO SHIYUROOSAA ,  KAARUTON GURANTO UIRUSON

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE: To form a positive resist image on a substrate by using an arom. polymer resin, a crosslinking agent having the function of an acid catalyst and an acid generating agent. CONSTITUTION: A substrate is coated with a compsn. contg. a film forming arom. polymer resin having functional groups which activate the resin to electrophilic arom. substitution, a crosslinking agent having the function of an acid catalyst and forming carbonium ions at the time of reaction with an acid and a radiation-degradable acid generating agent which absorbs radiation for forming an image. The resultant film is imagewise exposed with medium or deep UV and the resin in the exposed part of the film is made dense. The film is then brought into contact with an org. metallic reagent, an org. metallizing agent is absorbed in the unexposed region having higher permeability and the film is etched with reactive ions to form a positive resist pattern.

公开(公告)号：JPH07134399A

公开(公告)日：1995-05-23

申请号：JP28245593

申请日：1993-11-11

Applicant: IBM

Inventor： JIEEMUZU FUIIRUDO KIYAMERON ,  JIIN EMU JIEI FURESHIE ,  RUN MAN KITSUTO ,  KURAUSU PEETAA NIIZEATO ,  SUKOTSUTO AASAA MAKUDONARUDO ,  KAARUTON GURANTO UIRUSON

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PURPOSE: To obtain an improved photoresist for lithography useful for the production of an integrated circuit. CONSTITUTION: This photoresist compsn. contains a photosensitive base generating body such as benzyl carbamate, a polymer such as polycyanocarboxyalkylstyrene and a compd. having a substituent releasable by a base, e.g. a carboxyl group. It is excellent in sensitivity and contrast.

公开(公告)号：JPS6356919A

公开(公告)日：1988-03-11

申请号：JP12610687

申请日：1987-05-25

Applicant: IBM

Inventor： HIROYUKI HIRAOKA ,  JIEFUREI UIRIAMU RABADEII ,  JIEEMUZU SHII TANGU RII ,  SUKOTSUTO AASAA MAKUDONARUDO ,  KAARUTON GURANTO UIRUSON

IPC: H01L21/302 ,  G03F7/40 ,  H01L21/027 ,  H01L21/3065

公开(公告)号：JPS60241225A

公开(公告)日：1985-11-30

申请号：JP2214285

申请日：1985-02-08

Applicant: IBM

Inventor： HIROSHI ITOU ,  SUKOTSUTO AASAA MAKUDONARUDO ,  ROBAATO DENISU MIRAA ,  KAARUTON GURANTO UIRUSON

IPC: G03F7/30 ,  G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027

公开(公告)号：JPH07312331A

公开(公告)日：1995-11-28

申请号：JP27595393

申请日：1993-10-08

Applicant: IBM

Inventor： GUREGORII BUREITA ,  NIKORASU JIEFURIIZU KUREKATSUK ,  UIRIAMU DAINAN HINSUBAAGU SAAD ,  DONARUDO KURIFUOODO HOUFUAA ,  HIROSHI ITOU ,  SUKOTSUTO AASAA MAKUDONARUDO ,  RATSUTOMAN SURIJIYAKUMARAN

IPC: G03F1/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/16 ,  G03F7/38 ,  H01L21/027 ,  H01L21/47

Abstract: PURPOSE: To improve the lithographic image developing process for manufacturing an integrated circuit and obtain a process for protecting a photoresist film from chemical contaminants in air. CONSTITUTION: The process for forming a photoresist image on a substrate comprises coating the substrate with a polymer film composed of a vinyl polymer, photosensitive acid producer and acid unstable group, heating the film at a temp. higher about 20 deg.C than the glass transition temp. of the polymer and lower than the tearing temp. of the acid unstable group, exposing the film to a radiation, heating the film over 110 deg.C and develop the image. Combination of the heating steps before and after exposure protects the film from the chemical contaminants in air during the resist image producing process, thereby obtaining a high-resolution and high-contrast developed image.

公开(公告)号：JPS6371843A

公开(公告)日：1988-04-01

申请号：JP11915587

申请日：1987-05-18

Applicant: IBM

Inventor： ROBAATO DEEBITSUDO AREN ,  KAORIN ENU CHION ,  MIN FUIA CHIYOU ,  SUKOTSUTO AASAA MAKUDONARUDO ,  JIYAA MIN YAN ,  KAARUTON GURANTO UIRUSON

IPC: H01L21/027 ,  G03F7/038 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38

公开(公告)号：JPS62165650A

公开(公告)日：1987-07-22

申请号：JP27310186

申请日：1986-11-18

Applicant: IBM

Inventor： JIYAN EMU JIEI FUREISHIE ,  HIROSHI ITOO ,  SUKOTSUTO AASAA MAKUDONARUDO ,  KAARUTON GURANTO UIRUSON

IPC: G03C5/00 ,  G03F7/039 ,  G03F7/26 ,  G03F7/30 ,  G03F7/36 ,  G03F7/38 ,  H01L21/027

公开(公告)号：JPH0636353A

公开(公告)日：1994-02-10

申请号：JP8733193

申请日：1993-04-14

Applicant: IBM

Inventor： JIYON CHIYANNCHIYAN CHIEN ,  UIRIAMU DEINAN HINSUBERUGU SAA ,  ROBAATO TOOMASU RINCHI JIYUNIA ,  SUKOTSUTO AASAA MAKUDONARUDO ,  RESUTAA AARIN PEDERUSON ,  JIEIMUSU SUTEFUAN UON

IPC: G11B7/24 ,  G11B7/26

Abstract: PURPOSE: To improved the capacity and the reliability of a double depth optical data storage device. CONSTITUTION: The optical data storage device having a substrate 8 is provided with plural guidance ridges 10 or inverse groups formed on the substrate in a concentric circle or a spiral form. The ridges 10 are arranged in a plane on a side in parallel to and apart from a substrate face. The storage device has pits 7 formed on the substrate at an almost middle part of the ridges 10. The pits haven their bottoms below the substrate face. The address pits and the guide ridges are provided.

公开(公告)号：JPS61218133A

公开(公告)日：1986-09-27

申请号：JP28320785

申请日：1985-12-18

Applicant: IBM

Inventor： JIYOOJI JIYOSEFU HEFURON ,  HIROSHI ITOO ,  SUKOTSUTO AASAA MAKUDONARUDO ,  KAARUTON GURANTO UIRUSON

IPC: H01L21/302 ,  G03F7/40 ,  H01L21/027 ,  H01L21/30 ,  H01L21/3065

公开(公告)号：JPS61189639A

公开(公告)日：1986-08-23

申请号：JP29341585

申请日：1985-12-27

Applicant: IBM

Inventor： ANDERUSU HARUTO ,  HIROSHI ITOU ,  SUKOTSUTO AASAA MAKUDONARUDO ,  KAARUTON GURANTO UIRUSON

IPC: H01L21/30 ,  G03F7/20 ,  G03F7/26 ,  G03F7/38 ,  H01L21/027 ,  H01L21/302 ,  H01L21/3065