公开(公告)号：JP2004012551A

公开(公告)日：2004-01-15

申请号：JP2002162110

申请日：2002-06-03

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  NISHIMURA ISAO ,  ITO HIROSHI ,  TOMAS I WOROU ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  C08F220/10 ,  C08F232/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation, excellent in basic properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape and suitable for use as a chemically amplified resist. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin which contains a repeating unit derived from α-perfluoroalkylacrylic esters typified by t-butyl α-trifluoromethylacrylate and a repeating unit derived from a norbornene compound typified by 5-ä2-hydroxy-2, 2-di(trifluoromethyl)ethyl}bicyclo[2.2.1]hept-2-ene or a compound of formula 7 as essential units and becomes alkali-soluble by the action of an acid and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2004029089A

公开(公告)日：2004-01-29

申请号：JP2002181130

申请日：2002-06-21

Applicant: Internatl Business Mach Corp ,  Jsr Corp ,  Jsr株式会社 ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NISHIMURA YUKIO ,  NISHIMURA ISAO ,  SAITO AKIO ,  KOBAYASHI HIDEKAZU ,  TOMAS I WOROU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation and suitable for use as a chemically sensitized resist excellent in basic properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape. SOLUTION: The radiation-sensitive resin composition comprises (A) an acid-dissociating group-containing resin containing a (meth)acrylic ester repeating unit typified by a unit derived from 2-ethyladamantan-2-yl ester or 1-methylcyclopentyl ester of (meth)acrylic acid and a repeating unit having a norbornane skeleton in the backbone typified by a unit derived from 1-methylcyclopentyl ester or (2-ethyladamantan-2-yl) ester of a bicyclo[2,2,1]hept-2-ene-5-carboxylic acid and not containing a repeating unit derived from maleic anhydride and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003255539A

公开(公告)日：2003-09-10

申请号：JP2002056522

申请日：2002-03-01

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KOBAYASHI HIDEKAZU ,  TOMAS I WOROU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation and suitable for use as a chemically amplified resist excellent in basic performances as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape. SOLUTION: The radiation-sensitive resin composition comprises (A) an alkali-insoluble or slightly alkali-soluble resin which has a repeating unit represented by formula (1-1) (where R 1 is H or methyl) and a (meth)acrylic repeating unit typified by 2-ethyl-2-adamantyl (meth)acrylate, 2-norbornyl-2-(meth) acryloyloxypropane or 1-methylcyclopentyl (meth)acrylate as essential units and becomes alkali-soluble under the action of an acid and (B) a radiation- sensitive acid generator. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2003248313A

公开(公告)日：2003-09-05

申请号：JP2002046974

申请日：2002-02-22

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  TOMAS I WOROU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  C08F222/06 ,  C08F232/08 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation-sensitive resin composition having high transparency to a radiation, excellent in basic physical properties as a resist, such as sensitivity, resolution, pattern shape and adhesion to a substrate, causing no development defect in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation-sensitive resin composition comprises (A) an acid-dissociable group-containing resin having a repeating unit represented by formula (I) and a repeating unit represented by formula (II) and (B) a radiation-sensitive acid generator. In the formula (I), X is methylene or carbonyl; R 1 and R 2 are each H, a 1-4C alkyl, a monovalent O-containing polar group or a monovalent N-containing polar group; R 3 is H, a 1-6C alkyl, a 1-6C alkoxyl or a 2-7C alkoxycarbonyl; and n is an integer of 0-2. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2000298350A

公开(公告)日：2000-10-24

申请号：JP2000065165

申请日：2000-03-09

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  ALLEN ROBERT D ,  TOMAS I WOROU ,  JULIAN OPITZ ,  DEPIETRO RICHARD A ,  MARGARET C LAWSON ,  ANN MARIE MYUUHAATAA ,  JOSEPH F MANISCALCO ,  MAHAMUUDO EMU HOJISUTE ,  JORDHAMO GEORGE M ,  ITO HIROSHI

IPC: C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a photoresist composition using an acid as a catalyst, capable of forming an image with radiation of 193 nm and capable of forming a photoresist structure having high resolution and high etching resistance by development. SOLUTION: The photoresist composition comprises a combination of a cyclic olefin polymer, a photosensitive acid-generating agent and a substantially transparent bulky hydrophobic additive. The cyclic olefin polymer contains a cyclic olefin unit having a polar functional group which promotes dissolution in an aqueous alkali solution and the cyclic olefin unit having an acid-labile group which inhibits the dissolution in the aqueous alkali solution. The hydrophobic additive is selected from the group comprising a saturated steroid compound, a non-steroid cycloaliphatic compound and a non-steroid polycycloaliphatic compound having an acid-labile bond.