公开(公告)号：JPH1062994A

公开(公告)日：1998-03-06

申请号：JP16565097

申请日：1997-06-23

Applicant: IBM

Inventor： GREGORY BUREITA ,  WILLIAM R BURUNSUBUORUDO ,  WILLIAM E KONRII JR ,  KATHLEEN M KOONETSUTO ,  MAHAMUUDO EMU HOJISUTE

IPC: G03F7/004 ,  G03F7/038 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a negative resist fit for a wide concn. range of a developer and capable of forming a sharp image under various processing conditions by protecting part of hydroxyl group units on the arom. rings of a resin based on polyhydroxystyrene(PHS) with inert groups having relatively low reactivity with a strong acid. SOLUTION: This negative resist is based on a polymer resin contg. PHS having -OH sites converted into acid-stable -OR groups (R is prim. or sec. alkyl or -CO2 Y and Y is prim. or sec. alkyl not activated so as to generate a carbonium ion) in such a ratio as to effectively ensure the stability of a resist film under severe development conditions. When about 5-20% of all -OH sites are converted into -OR groups, the resultant resist is made fit for a developer used in an i-line producer at present, that is 0.263N TMAH (tetramethylammonium hydroxide).

公开(公告)号：JP2000298350A

公开(公告)日：2000-10-24

申请号：JP2000065165

申请日：2000-03-09

Applicant: IBM

Inventor： VARANASI PUSHKARA RAO ,  ALLEN ROBERT D ,  TOMAS I WOROU ,  JULIAN OPITZ ,  DEPIETRO RICHARD A ,  MARGARET C LAWSON ,  ANN MARIE MYUUHAATAA ,  JOSEPH F MANISCALCO ,  MAHAMUUDO EMU HOJISUTE ,  JORDHAMO GEORGE M ,  ITO HIROSHI

IPC: C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a photoresist composition using an acid as a catalyst, capable of forming an image with radiation of 193 nm and capable of forming a photoresist structure having high resolution and high etching resistance by development. SOLUTION: The photoresist composition comprises a combination of a cyclic olefin polymer, a photosensitive acid-generating agent and a substantially transparent bulky hydrophobic additive. The cyclic olefin polymer contains a cyclic olefin unit having a polar functional group which promotes dissolution in an aqueous alkali solution and the cyclic olefin unit having an acid-labile group which inhibits the dissolution in the aqueous alkali solution. The hydrophobic additive is selected from the group comprising a saturated steroid compound, a non-steroid cycloaliphatic compound and a non-steroid polycycloaliphatic compound having an acid-labile bond.