Abstract:
The invention relates to an arrangement of contact surfaces (1) and testing surfaces (2) on a structured semiconductor chip (3). The contact surfaces (1) and testing surfaces (2) are electrically connected to one another via a conducting web (4). While the contact surfaces (1) are arranged in a first area (5) that does not contain any components of an integrated circuit, the testing surfaces (2) are located in a second area (7) of the upper side of the semiconductor chip (3) that contains components (6) of an integrated circuit.
Abstract:
A semiconductor circuit containing a pad for electrical bonding of the semiconductor circuit and a metal arrangement disposed beneath the pad. The metal arrangement is in a metal layer of the semiconductor circuit located closest to the pad and is electrically insulated from the pad and from a strip conductor located beneath the metal arrangement. More than one metal layer can contain a metal arrangement. Each metal arrangement is a full-area plate that overlaps all edges of the pad or has a regular structure of small square plates. If adjacent metal arrangements are constructed from small plates, the plates in one metal arrangement overlap to cover gaps in the other metal arrangement.
Abstract:
A semiconductor wafer having many chips has electrically connected contact (1) and test (2) surfaces with the contacts being in a passive region (5) of the upper chip (1) where there are no IC components. The test surfaces are in a second, active, region (7) which comprise active components. An Independent claim is also included for an after treatment process for the wafer above.
Abstract:
The calibration wafer (W) has adhered polymer balls (P) which are fixed via a heat treatment process. This is effected in a temperature at which the polymer balls start to soften. The heat treatment process for fixing the polymer balls may be effected within a temperature range between 80 and 95 degrees C.
Abstract:
A semiconductor wafer having many chips has electrically connected contact (1) and test (2) surfaces with the contacts being in a passive region (5) of the upper chip (1) where there are no IC components. The test surfaces are in a second, active, region (7) which comprise active components. An Independent claim is also included for an after treatment process for the wafer above.