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    DEVICE FOR MECHANICALLY REGULATING AN ELECTRICAL CAPACITANCE, AND METHOD FOR MAKING SAME
    1.
    发明申请
    DEVICE FOR MECHANICALLY REGULATING AN ELECTRICAL CAPACITANCE, AND METHOD FOR MAKING SAME 审中-公开
    机械装置用于控制生产同样的电容量和方法

    公开(公告)号：WO03025958A3

    公开(公告)日：2003-09-18

    申请号：PCT/EP0208090

    申请日：2002-07-19

    Applicant: INFINEON TECHNOLOGIES AG ,  KAPELS HERGEN ,  OPPERMANN KLAUS-GUENTER

    Inventor： KAPELS HERGEN ,  OPPERMANN KLAUS-GUENTER

    IPC: H01G5/16

    CPC classification number: H01G5/16

    Abstract: The invention concerns a device for mechanically regulating an electrical capacitance. Said device comprises a first electrode structure (10) including first (16) and second (24) surfaces, the first surface (16) having at least a projecting portion (18a 18d). The device also comprises a second electrode structure (12), spaced apart from the first electrode structure (10) and including at least a recess (20a 20d) arranged in such a way that the projecting portion(s) (18a 18d) of the first electrode structure (10) project(s) into said recess, an electrical capacitance being determined between the opposite surface zones of the first (10) and of the second (12) electrode structures. A third electrode structure (14) for regulating the electrical capacitance is arranged between the first (10) and the second (12) electrode structures . Said third electrode structure (14) is spaced apart from the first electrode structure (10) and located opposite said second surface (24). The first electrode structure (10) is configured to be freely mobile relative to the second (12) and third (14) electrode structures. Thus, when an electric voltage is applied between the first (10) and the third (14) electrode structures, the electrical capacitance can be regulated, by modifying the distance separating the first (10) and the second (12) electrode structures.

    Abstract translation: 本发明提供一种装置，用于机械地控制电气的电容，其包括具有第一（16）的第一电极结构（10）和第二（24）表面，所述第一表面（16）的至少一个突起（18A - 18D）具有 ， 该设备还包括所述第一电极结构（10）和具有至少一个凹部（20A - 20D）的第二电极结构（12） - 第一个电极结构中的哪一个布置成使得所述至少一个凸起（18D 18A） （10）突出到相同的，因而第一（10）相对的表面区域和第二（12）的电极结构之间的电容量是固定的。 第三电极结构（14）被设置用于控制所述电第一之间（10）和第二（12）的电极结构的电容，其中所述第三电极结构（14）到第一电极结构（10）间隔开并相对的第二表面（24） ， 所述第一电极结构（10）相对于所述第二（12）和第三（14）的电极结构自由地设计成可移动，以使得由所述第一之间的第一（10）和第三之间施加电压（14）的电极结构中，电电容（ 10）和（12）的电极结构是通过改变第一（10之间的距离控制的）和第二（12）的电极结构的第二。

    3.
    发明专利
    未知

    公开(公告)号：DE59910398D1

    公开(公告)日：2004-10-07

    申请号：DE59910398

    申请日：1999-05-04

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： AIGNER ROBERT ,  OPPERMANN KLAUS-GUENTER ,  KAPELS HERGEN

    IPC: B81C1/00 ,  G01L9/00 ,  G01P15/08 ,  H01L21/302 ,  H01L21/3065 ,  H01L29/84

    Abstract: Etching openings are provided in a membrane above an etched-out cavity, only at a distance of at most one tenth of the diameter of the member away from the edge of the cavity. For production, a poly layer is applied to a sacrificial layer composed of SiO2 and is provided with rows of etching holes, through which channels are etched out in the sacrificial layer. The poly layer is oxidized and is made smooth by means of a planarization layer. Etching holes are produced in the edge region of the membrane layer. The sacrificial layer is removed over the entire area of the cavity which is to be produced, with the etching medium propagating sufficiently quickly through the channels.

    4.
    发明专利
    未知

    公开(公告)号：DE10145721A1

    公开(公告)日：2003-04-10

    申请号：DE10145721

    申请日：2001-09-17

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： OPPERMANN KLAUS-GUENTER ,  KAPELS HERGEN

    IPC: H01G5/16 ,  B81B3/00 ,  B81C3/00

    Abstract: The invention concerns a device for mechanically regulating an electrical capacitance. Said device comprises a first electrode structure (10) including first (16) and second (24) surfaces, the first surface (16) having at least a projecting portion (18a 18d). The device also comprises a second electrode structure (12), spaced apart from the first electrode structure (10) and including at least a recess (20a 20d) arranged in such a way that the projecting portion(s) (18a 18d) of the first electrode structure (10) project(s) into said recess, an electrical capacitance being determined between the opposite surface zones of the first (10) and of the second (12) electrode structures. A third electrode structure (14) for regulating the electrical capacitance is arranged between the first (10) and the second (12) electrode structures . Said third electrode structure (14) is spaced apart from the first electrode structure (10) and located opposite said second surface (24). The first electrode structure (10) is configured to be freely mobile relative to the second (12) and third (14) electrode structures. Thus, when an electric voltage is applied between the first (10) and the third (14) electrode structures, the electrical capacitance can be regulated, by modifying the distance separating the first (10) and the second (12) electrode structures.

    10.
    发明专利
    未知

    公开(公告)号：DE19940581C2

    公开(公告)日：2001-07-26

    申请号：DE19940581

    申请日：1999-08-26

    Applicant: INFINEON TECHNOLOGIES AG

    Inventor： AIGNER ROBERT ,  KAPELS HERGEN ,  MECKES ANDREAS ,  OPPERMANN KLAUS-GUENTER

    IPC: B81B3/00 ,  B81B7/02 ,  H01L27/06 ,  H01L21/822 ,  H01L21/8232 ,  B81C1/00

    Abstract: The manufacturing method has at least one electronic component (7) formed in the surface of a semiconductor body (1), before forming a recess in the surface of the latter, by selective removal of semiconductor material and formation of a layer (10) in this recess, which is structured to provide the micromechanical sensor component. The electronic component can be covered by a protective layer (9) before formation of the recess, with the layer provided in the recess formed from poly-silicon.

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