公开(公告)号：EP1757990A4

公开(公告)日：2011-04-27

申请号：EP05743737

申请日：2005-05-24

Applicant: JSR CORP

Inventor： SAKAKIBARA HIROKAZU ,  ABE TAKAYOSHI ,  CHIBA TAKASHI ,  KIMURA TORU

IPC: G03F7/40 ,  H01L21/027

CPC classification number: G03F7/40 ,  H01L21/0274

公开(公告)号：EP1806370A4

公开(公告)日：2008-07-23

申请号：EP05787854

申请日：2005-09-28

Applicant: JSR CORP

Inventor： CHIBA TAKASHI ,  KIMURA TORU ,  UTAKA TOMOHIRO ,  NAKAGAWA HIROKI ,  SAKAKIBARA HIROKAZU ,  DOUGAUCHI HIROSHI

IPC: C08F220/10 ,  G03F7/11 ,  H01L21/027

CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

Abstract: Disclosed is an upper film-forming composition which enables to form a coating film on a photoresist without causing intermixing with the photoresist film and to maintain a stable coating film without dissolving into a medium used during immersion exposure. The upper film-forming composition is also capable to form an upper layer which enables to obtain a pattern shape that is not inferior to the one obtained by a process other than immersion exposure, namely a dry exposure and can be easily dissolved in an alkaline developer. Also disclosed is a copolymer containing a repeating unit having a group represented by the general formula (1) below, a repeating unit having a group represented by the general formula (2) below, at least one repeating unit (I) selected from repeating units having a carboxyl group, and a repeating unit (II) having a sulfo group, and having a weight average molecular weight of 2,000-100,000 determined by gel permeation chromatography. (1) (2) At least one of R

公开(公告)号：EP1708027A4

公开(公告)日：2008-12-03

申请号：EP05703585

申请日：2005-01-14

Applicant: JSR CORP

Inventor： KIMURA TORU ,  NISHIMURA YUKIO ,  UTAKA TOMOHIRO ,  NEMOTO HIROAKI ,  NAKAMURA ATSUSHI ,  CHIBA TAKASHI ,  NAKAGAWA HIROKI

IPC: G03F7/11 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

Abstract: An immersion upper layer film composition is provided which exhibits sufficient transparency for the exposure wavelength 248 nm(KrF) and 193 nm(ArF), can form a protective film on the photoresist film without being intermixed with the photoresist film, is not eluted into water used during immersion exposure to maintain a stable film, and can be easily dissolved in an alkaline developer. The composition applied to coat on the photoresist film when using an immersion exposure device which is irradiated through water provided between a lens and the photoresist film, the composition comprises a resin forming a water-stable film during irradiation and being dissolved in a subsequent developer, and a solvent containing a monovalent alcohol having 6 or less carbon atoms, and the resin contains a resin component having an alcoholic hydroxyl group on the side chain containing a fluoroalkyl group on at least the carbon atom of ±-position.

公开(公告)号：JP2012144734A

公开(公告)日：2012-08-02

申请号：JP2012055325

申请日：2012-03-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  KIMURA TORU ,  UTAKA TOMOHIRO ,  NAKAGAWA DAIKI ,  SAKAKIBARA HIROKAZU ,  DOKOCHI HIROSHI

IPC: C08F220/26 ,  C08F212/14 ,  C08F220/06 ,  C08F220/54 ,  C08F228/02 ,  G03F7/11

CPC classification number: G03F7/11 ,  C08F220/18 ,  C08F220/26 ,  C08F220/38 ,  C08F228/00 ,  G03F7/2041

Abstract: PROBLEM TO BE SOLVED: To provide a copolymer capable of forming a coating film on a photoresist without causing intermixing with the photoresist film, maintaining a stable coating film without dissolving in a medium used in immersion exposure, being free from pattern form deterioration even in the case of performing dry exposure which is not the immersion exposure, and forming an upper film which is easily soluble in an alkaline developer.SOLUTION: The copolymer includes at least one repeating unit (I) selected from a repeating unit (HO-C(R)(R)-) having 1-4C fluorinated alkyl and hydroxy-substituted alkyl, a repeating unit (R-SO-NH-) having a sulfonamide group with 1-4C fluorinated alkyl and a repeating unit having a carboxyl group, and a repeating unit (II) having a sulfo group, and has a weight-average molecular weight of 2,000-100,000 determined by gel permeation chromatography.

Abstract translation: 要解决的问题：为了提供能够在光致抗蚀剂上形成涂膜的共聚物，而不会与光致抗蚀剂膜混合，保持稳定的涂膜而不溶解在浸没曝光中使用的介质中，没有图案形式变质 即使进行不是浸渍曝光的干式曝光，也可以形成容易溶于碱性显影剂的上层膜。 共聚物包括至少一个选自重复单元（HO-C（R 1 ））（R

公开(公告)号：JP2001215736A

公开(公告)日：2001-08-10

申请号：JP2000028381

申请日：2000-02-04

Applicant: JSR CORP

Inventor： KIMURA TORU ,  ITO JUNJI ,  YOKOYAMA YASUAKI ,  IGARASHI KATSUTOSHI

IPC: H05K3/06 ,  G03F7/42

Abstract: PROBLEM TO BE SOLVED: To provide an excellent photoresist removing solution composition which brings no residue on removal and does not cause corrosion to a metallic thin film part, and to provide a removing method using the composition and a circuit board produced by the method. SOLUTION: The photoresist removing solution composition contains 60-95 wt.% water-soluble organic solvent, 0.05-10 wt.% at least one alkaline compound selected from the group comprising a tetraalkylammonium hydroxide and an organic amine, 0. 05-15 wt.% at least one compound selected from glycols each having a molecular weight of

公开(公告)号：JP2000039709A

公开(公告)日：2000-02-08

申请号：JP20923598

申请日：1998-07-24

Applicant: JSR CORP

Inventor： HIROSE KOICHI ,  MICHINO YOSHIYUKI ,  KIMURA TORU ,  ITAI SHINGO ,  OTA TOSHIYUKI ,  YOKOYAMA YASUAKI ,  SATO HOZUMI

IPC: G03F7/004 ,  C08F2/44 ,  C08F291/06 ,  G03F7/027 ,  G03F7/033 ,  H05K3/18

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin compsn. suitable for use as a material for forming a bump and for forming wiring. SOLUTION: The radiation sensitive resin compsn. contains (A) an alkali- soluble copolymer consisting of (a) constituent units derived from a radical polymerizable compd. having a carboxyl group, (b) constituent units derived from a radical polymerizable compd. having a phenolic hydroxyl group and (c) constituent units derived from other radical polymerizable compd., (B) a compd. having at least one ethylenically unsatd. double bond and (C) a radiation radical polymn. initiator.

公开(公告)号：JP2012093741A

公开(公告)日：2012-05-17

申请号：JP2011214135

申请日：2011-09-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KIMURA TORU ,  NAKAJIMA HIROMITSU ,  KIMURA REIKO ,  KASAHARA KAZUKI ,  HORI MASAFUMI ,  YOSHIDA MASASHI

IPC: G03F7/039 ,  C08F220/20

CPC classification number: G03F7/2041 ,  G03F7/0046 ,  G03F7/0397

Abstract: PROBLEM TO BE SOLVED: To form a resist film suppressing generation of defects due to development failure in liquid immersion exposure while the hydrophobicity of a film surface is increased and also being excellent in lithographic performance.SOLUTION: There is provided a radiation-sensitive resin composition characterized by comprising a polymer (A) having a repeating unit (a1) having a group represented by the following general formula (1) or (2) and having a fluorine atom, in an amount of 0.1 mass% or more and 20 mass% or less based on the total volume of a polymer.

Abstract translation: 要解决的问题：为了形成抗蚀剂膜，其抑制由于液面曝光时的显影失败而产生的缺陷，同时膜表面的疏水性增加并且还具有优异的光刻性能。 解决方案：提供一种辐射敏感性树脂组合物，其特征在于包含具有由以下通式（1）或（2）表示的基团的重复单元（a1）的聚合物（A），并具有氟原子 ，相对于聚合物的总体积为0.1质量％以上20质量％以下。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2010211226A

公开(公告)日：2010-09-24

申请号：JP2010101351

申请日：2010-04-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KIMURA TORU ,  NISHIMURA YUKIO ,  UKO TOMOHIRO ,  NEMOTO HIROAKI ,  NAKAMURA ATSUSHI ,  CHIBA TAKASHI ,  NAKAGAWA DAIKI

IPC: G03F7/11 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

CPC classification number: G03F7/2041 ,  C08F214/182 ,  C08F214/186 ,  C08F216/10 ,  C08F220/18 ,  C08F220/24 ,  G03F7/11 ,  C08F220/06 ,  C08F2222/1013

Abstract: PROBLEM TO BE SOLVED: To realize satisfactory transmittance for exposure light of 248 nm (KrF) and 193 nm (ArF) wavelength, to realize the formation of a film on a photoresist, without intermixing with a photoresist film, to maintain a stable film without dissolution in water during liquid immersion photoexposure, and to form an upper layer film which is readily soluble in an alkali developer.
SOLUTION: A composition to be coated on the photoresist film, when a liquid immersion photoexposure unit is used in which irradiation exposure is carried out, with water interposed between a lens and the photoresist film, comprises a resin which forms a stable film, without dissolution in water during irradiation exposure and is soluble in a subsequent developer using an alkaline aqueous solution; and a solvent containing a monohydric alcohol of a C6 or fewer. In particular, the resin contains a resin component having an alcoholic hydroxyl group on its side chain and containing a fluoroalkyl group on at least its α position.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了实现248nm（KrF）和193nm（ArF）波长的曝光光的令人满意的透射率，为了实现在光致抗蚀剂上形成膜而不与光致抗蚀剂膜混合，以保持 在液浸光曝光期间不溶于水的稳定膜，并形成易溶于碱显影剂的上层膜。 解决方案：当使用在透镜和光致抗蚀剂膜之间的水进行照射曝光的液浸光曝光单元时，要涂覆在光致抗蚀剂膜上的组合物包括形成稳定膜的树脂 ，在照射暴露时不溶于水，并且可溶于使用碱性水溶液的后续显影剂中; 和含有C6以下的一元醇的溶剂。 特别地，树脂在其侧链含有具有醇羟基的树脂成分，至少在其α位含有氟代烷基。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2003241372A

公开(公告)日：2003-08-27

申请号：JP2002040301

申请日：2002-02-18

Applicant: JSR CORP

Inventor： IWANAGA SHINICHIRO ,  IWAMOTO SATOSHI ,  KIMURA TORU ,  NISHIMURA YOKO ,  NISHIKAWA KOJI

IPC: G03F7/027 ,  C08F290/12 ,  G03F7/004 ,  G03F7/033 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition capable of forming a radiation-sensitive resin composition film thicker than plating and having high resolution. SOLUTION: The radiation-sensitive resin composition comprises (A) an unsaturated group-containing alkali-soluble resin obtained by reacting 100 pts.wt. copolymer consisting of 1-40 wt.% constitutional units derived from a radical- polymerizable compound (a) having a carboxyl group, 1-50 wt.% constitutional units having a phenolic hydroxyl group derived from a radical-polymerizable compound (b-1) having a phenolic hydroxyl group or a radical-polymerizable compound (b-2) having a functional group convertible to a phenolic hydroxyl group after synthesis of the copolymer and the balance constitutional units derived from another radical-polymerizable compound (c) with 0.1-20 pts.wt. radical-polymerizable compound (d) having an epoxy group, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation radical polymerization initiator. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2013228702A

公开(公告)日：2013-11-07

申请号：JP2013058928

申请日：2013-03-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TANAKA HIRONOBU ,  SUZUKI JUNYA ,  MOTONARI MASAYUKI ,  KIMURA TORU

IPC: G03F7/11 ,  G03F7/26 ,  H01L21/027

CPC classification number: G03F7/094 ,  G03F7/004 ,  G03F7/075 ,  G03F7/0752

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming a resist underlayer film, having excellent storage stability and high coating defect improving property capable of suppressing generation of coating defects, and to provide a pattern forming method using the composition.SOLUTION: The composition for forming a resist underlayer film comprises [A] a polysiloxane and [B] a solvent. The [B] solvent includes (B1) an organic solvent, which is a compound expressed by formula (1) or a carbonate compound and has a standard boiling point of 150.0°C or higher. The standard boiling point of the (B1) organic solvent is preferably 180°C or higher. The content percentage of the (B1) organic solvent in the [B] solvent is preferably 1 mass% or more and 50 mass% or less. The static surface tension of the (B1) organic solvent is preferably 20 mN/m or more and 50 mN/m or less.

Abstract translation: 要解决的问题：提供一种形成抗蚀剂下层膜的组合物，具有优异的储存稳定性和高涂层缺陷改善性能，能够抑制涂层缺陷的产生，并提供使用该组合物的图案形成方法。 形成抗蚀剂下层膜包括[A]聚硅氧烷和[B]溶剂。 [B]溶剂包括（B1）由式（1）表示的化合物或碳酸酯化合物的有机溶剂，其标准沸点为150.0℃以上。 （B1）有机溶剂的标准沸点优选为180℃以上。 （B1）有机溶剂在[B]溶剂中的含有率优选为1质量％以上至50质量％以下。 （B1）有机溶剂的静态表面张力优选为20mN / m以上至50mN / m以下。