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    RADIATION SENSITIVE RESIN COMPOSITION
    1.
    发明专利
    RADIATION SENSITIVE RESIN COMPOSITION 失效

    公开(公告)号：JP2002072484A

    公开(公告)日：2002-03-12

    申请号：JP2001108824

    申请日：2001-04-06

    Applicant: JSR CORP ,  IBM

    Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

    IPC: C08K5/00 ,  C08L33/06 ,  C08L35/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a new radiation sensitive resin composition having high transparency to radiation, having excellent basic properties as a resist, e.g. sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an acid dissociable group-containing resin having a structure of formula (1) (where R1 is H, a monovalent acid dissociable group, an alkyl having no acid dissociable group or an alkylcarbonyl having no acid dissociable group; X1 is a 1-4C linear or branched fluoroalkyl; and R2 is H, a linear or branched alkyl or a linear or branched fluoroalkyl) and (B) a radiation sensitive acid generating agent.

    RADIATION-SENSITIVE RESIN COMPOSITION
    4.
    发明专利
    RADIATION-SENSITIVE RESIN COMPOSITION 审中-公开

    公开(公告)号：JP2004012545A

    公开(公告)日：2004-01-15

    申请号：JP2002162080

    申请日：2002-06-03

    Applicant: JSR CORP ,  JSR MICRO INC ,  IBM

    Inventor： YAMAMOTO MASASHI ,  ISHII HIROYUKI ,  ISHIDA EIKO ,  NISHIMURA YUKIO ,  MARK SLEZAK ,  BRUNSVOLD WILLIAM R ,  CHEN KUANG-JUNG ,  VARANASI PUSHKARA RAO

    IPC: G03F7/039 ,  C08F20/28 ,  G03F7/004 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation, excellent in basic physical properties as a resist, such as sensitivity, resolution and pattern shape, and useful particularly as a chemically amplified resist excellent in focus latitude. SOLUTION: The radiation-sensitive resin composition comprises (A) a mixture of alkali-insoluble or slightly alkali-soluble resins having separate repeating units protected with acid-dissociating protective groups and typified by repeating units derived from 2-methyl-2-adamantyl (meth)acrylate, 1-ethylcyclohexyl (meth)acrylate, etc., wherein the acid-dissociating protective group of at least one of the resins is different from that of the other, and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO

    Radiation-sensitive resin composition
    5.
    发明专利
    Radiation-sensitive resin composition 审中-公开
    辐射敏感性树脂组合物

    公开(公告)号：JP2003345020A

    公开(公告)日：2003-12-03

    申请号：JP2002151225

    申请日：2002-05-24

    Applicant: Jsr Corp ,  Jsr株式会社

    Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  NISHIMURA ISAO ,  KOBAYASHI HIDEKAZU

    IPC: G03F7/039 ,  C08F32/08 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a composition having high transparency for radiation at short wavelengths, excellent solubility with a developer and excellent sensitivity, pattern profile and etching resistance. SOLUTION: The radiation-sensitive resin composition contains a resin having a functional group which increases solubility with an alkali by the effect of an acid, and a radiation-sensitive acid generating agent. The resin has a repeating unit expressed by formula (1). In formula (1), R independently represents a hydrogen atom, a 1-4C alkyl group or a 1-4C perfluoroalkyl group, R 1 represents a hydrocarbon group or an oxygen-containing hydrocarbon group, n is 0 or 1 and m is 1 or 2. COPYRIGHT: (C)2004,JPO

    Abstract translation: 要解决的问题：提供一种具有高透射度的组合物，其具有短波长的辐射，与显影剂的溶解性优异，并且具有优异的灵敏度，图案轮廓和耐蚀刻性。 解决方案：辐射敏感性树脂组合物含有具有官能团的树脂，该树脂具有通过酸的作用使碱对碱的溶解度增加和辐射敏感性酸产生剂。 树脂具有由式（1）表示的重复单元。 在式（1）中，R独立地表示氢原子，1-4C烷基或1-4C全氟烷基，R 表示烃基或含氧烃基，n是 0或1，m为1或2.版权所有（C）2004，JPO

    Acid-dissociating group-containing resin and radiation- sensitive resin composition
    6.
    发明专利
    Acid-dissociating group-containing resin and radiation- sensitive resin composition 审中-公开
    酸分解含树脂和辐射敏感性树脂组合物

    公开(公告)号：JP2003295440A

    公开(公告)日：2003-10-15

    申请号：JP2002093942

    申请日：2002-03-29

    Applicant: Jsr Corp ,  Jsr株式会社

    Inventor： NISHIMURA ISAO ,  SHIMOKAWA TSUTOMU ,  NISHIMURA YUKIO ,  YAMAMOTO MASASHI

    IPC: G03F7/039 ,  C08G63/66 ,  C08G65/04 ,  G03F7/032 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a new acid-dissociating group-containing resin and a radiation-sensitive resin composition having high transparency to a radiation, satisfying basic performances required by a resist, such as sensitivity, resolution, dry etching resistance and pattern shape, excellent in adhesiveness to a substrate, causing no development defect in microfabrication and capable of producing semiconductor devices in a high yield.
    SOLUTION: The acid-dissociating group-containing resin is alkali-insoluble or slightly alkali-soluble, becomes readily alkali-soluble by the action of an acid and contains a repeating unit containing an ether bond in the principal chain. The radiation-sensitive resin composition comprises the acid-dissociating group-containing resin and a radiation-sensitive acid generator.
    COPYRIGHT: (C)2004,JPO

    Abstract translation: 要解决的问题：提供一种新的含酸解离基团的树脂和对辐射具有高透明度的辐射敏感性树脂组合物，满足抗蚀剂所需的基本性能，例如灵敏度，分辨率，耐干蚀刻性 和图案形状，与基板的粘附性优异，在微细加工中不产生显影缺陷，并且能够以高产率制造半导体器件。 解决方案：含酸解离基团的树脂是碱不溶性或轻微碱溶性的，通过酸的作用变得容易碱溶，并含有在主链中含有醚键的重复单元。 辐射敏感性树脂组合物包含含酸解离基团的树脂和辐射敏感性酸发生剂。 版权所有（C）2004，JPO

    Radiation-sensitive resin composition
    7.
    发明专利
    Radiation-sensitive resin composition 有权
    辐射敏感性树脂组合物

    公开(公告)号：JP2009037258A

    公开(公告)日：2009-02-19

    申请号：JP2008270285

    申请日：2008-10-20

    Applicant: Jsr Corp ,  Jsr株式会社

    Inventor： SHIMA MOTOYUKI ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  MATSUDA DAIICHI ,  NAKAMURA ATSUSHI

    IPC: G03F7/039 ,  C08F220/18 ,  G03F7/004 ,  H01L21/027

    CPC classification number: G03F7/0397 ,  Y10S430/122

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition useful as a chemically amplified resist having high transmittance of radiation and excelling in sensitivity, resolution, dry etching resistance and pattern profile. SOLUTION: The radiation-sensitive resin composition comprises (A) resin having at least two recurring units selected out of recurring units derived from (meta) acrylic ester having a specific alicyclic hydrocarbon group, in the total amount of 5-70 mol% but each in the amount of 1-49 mol%, the resin being insoluble or scarcely soluble in alkali, but becoming easily soluble in alkali by the action of an acid, and (B) a photoacid generator. COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供可用作具有高辐射透射率和优异的灵敏度，分辨率，耐干蚀刻性和图案轮廓的化学放大抗蚀剂的辐射敏感性树脂组合物。 解决方案：辐射敏感性树脂组合物包含（A）具有至少两个从具有特定脂环族烃基的（甲基）丙烯酸酯衍生的重复单元中选出的重复单元的树脂，其总量为5-70mol ％，但各自为1-49mol％，树脂不溶或几乎不溶于碱，但通过酸作用容易溶于碱，（B）光酸产生剂。 版权所有（C）2009，JPO＆INPIT

    (meth)acrylic polymer and radiation-sensitive resin composition
    8.
    发明专利
    (meth)acrylic polymer and radiation-sensitive resin composition 审中-公开

    公开(公告)号：JP2004210910A

    公开(公告)日：2004-07-29

    申请号：JP2002380702

    申请日：2002-12-27

    Applicant: Jsr Corp ,  Jsr株式会社

    Inventor： NISHIMURA YUKIO ,  YAMAMOTO MASASHI ,  NISHIMURA ISAO

    IPC: G03F7/039 ,  C08F20/10 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a (meth)acrylic polymer high in transparency to radiation, excellent in basic properties as a resist such as sensitivity, resolution, dry etching resistance, pattern form, etc. especially excellent in the solubility to a resist solvent, and suitable for a radiation-sensitive resin compound which reduces the roughness on a pattern sidewall after developing. SOLUTION: This (meth)acrylic polymer contains a repeating unit represented by formula (1) wherein R represents hydrogen or a methyl group, X represents a single bond or a 1-3C divalent organic group, Y represents a mutually independent single bond or a 1-3C divalent organic group, and R 1 represents a mutually independent hydrogen atom, a hydroxy group, a cyano group, or a -COOR 3 group. COPYRIGHT: (C)2004,JPO&NCIPI

    RADIATION SENSITIVE RESIN COMPOSITION
    9.
    发明专利
    RADIATION SENSITIVE RESIN COMPOSITION 审中-公开

    公开(公告)号：JP2002182393A

    公开(公告)日：2002-06-26

    申请号：JP2001303791

    申请日：2001-09-28

    Applicant: JSR CORP

    Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  YAMAMOTO MASASHI ,  KAJITA TORU

    IPC: G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, having excellent sensitivity, resolution, dry etching resistance, pattern shape, etc., and having small temperature dependence in heating after exposure. SOLUTION: The radiation sensitive resin composition contains (A) a resin comprising a copolymer of (meth)acrylic esters having an acid dissociable group- containing alicyclic structure represented by 5-t-butoxycarbonylnorbornyl (meth) acrylate and 8-t-butoxycarbonyltetracyclododecane (meth)acrylate and (meth) acrylic esters having a lactone-containing heterocyclic structure typified by compounds of formula (1) and (B) a radiation sensitive acid generating agent represented by 1-(3,5-dimethyl-4-hydroxyphenyl)tetrahydrothiophenium perfluoro-n- octanesulfonate, 1-(4-n-butoxy-1-naphthyl)tetrahydrothiophenium nonafluoro-n- butanesulfonate or the like.

    RADIATION SENSITIVE RESIN COMPOSITION
    10.
    发明专利
    RADIATION SENSITIVE RESIN COMPOSITION 失效

    公开(公告)号：JP2002072477A

    公开(公告)日：2002-03-12

    申请号：JP2000177487

    申请日：2000-06-13

    Applicant: JSR CORP

    Inventor： KOBAYASHI HIDEKAZU ,  NUMATA ATSUSHI ,  YAMACHIKA MIKIO ,  YAMAMOTO MASASHI

    IPC: G03F7/039 ,  C08K5/00 ,  C08K5/17 ,  C08L101/10 ,  G03F7/004 ,  G03F7/075 ,  G03F7/26 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition being effectively responsive to various types of radiations, having excellent sensitivity and resolution, and also having excellent long-term shelf stability and useful as a positive type chemical amplification type multilayer resist. SOLUTION: The positive type radiation sensitive resin composition for the upper layer resist of a multilayer resist contains (A) a low molecular compound obtained by preparing a compound having at least one amino group with one or two hydrogen atoms combining with a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of the hydrogen atoms of the amino group, (B) a radiation sensitive acid generating agent and (C) an alkali- insoluble or slightly alkali-soluble silicon-containing resin protected with an acid dissociable group and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.

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