公开(公告)号：DE60143178D1

公开(公告)日：2010-11-18

申请号：DE60143178

申请日：2001-06-15

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASAFUMI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

IPC: G03F7/004 ,  C08K5/00 ,  C08L33/06 ,  C08L35/00 ,  C08L45/00 ,  G03F7/039 ,  H01L21/027

公开(公告)号：JP2011070209A

公开(公告)日：2011-04-07

申请号：JP2010246045

申请日：2010-11-02

Applicant: Internatl Business Mach Corp ,  Jsr Corp ,  Jsr株式会社 ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

IPC: G03F7/039 ,  C08F214/18 ,  C08F220/22 ,  C08F220/24 ,  C08F232/08 ,  C08G61/08 ,  C08K5/10 ,  C08L27/12 ,  C08L33/06 ,  C08L33/16 ,  C08L35/00 ,  C08L101/08 ,  G03F20060101 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a novel radiation sensitive resin composition having high transparency to radiation, excellent basic physical properties for a resist pattern such as in sensitivity, resolution, and pattern shapes, without causing development defects during fine machining, to manufacture semiconductor elements at a high yield.
SOLUTION: The radiation-sensitive resin compositions comprises (A) a resin containing an acid dissociable group obtained by the open ring polymerization of the norbornene derivative having a structure shown by the following general formula (1), and (B) a radiation-sensitive acid generator. In the general formula (1), R
1 represents a hydrogen atom and a univalent acid dissociation group, X
1 a low-grade fluorinated alkyl group, and R
2 a hydrogen atom, an alkyl group or a fluorinated alkyl group.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种对辐射具有高透明度的新颖的辐射敏感性树脂组合物，用于抗敏剂图案的极好的基本物理性能，例如灵敏度，分辨率和图案形状，而不会在精加工期间引起显影缺陷， 以高产率制造半导体元件。 解决方案：辐射敏感性树脂组合物包含（A）含有通过具有下列通式（1）所示结构的降冰片烯衍生物的开环聚合获得的酸解离基的树脂，（B） 辐射敏感酸发生器。 在通式（1）中，R 1 表示氢原子和一价酸解离基团，低级氟化烷基，X 1， 2个氢原子，烷基或氟化烷基。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2002072484A

公开(公告)日：2002-03-12

申请号：JP2001108824

申请日：2001-04-06

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  YAMAHARA NOBORU ,  YAMAMOTO MASASHI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU ,  ITO HIROSHI

IPC: C08K5/00 ,  C08L33/06 ,  C08L35/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a new radiation sensitive resin composition having high transparency to radiation, having excellent basic properties as a resist, e.g. sensitivity, resolution and pattern shape, not causing development defects in microfabrication and capable of producing semiconductor devices in a high yield. SOLUTION: The radiation sensitive resin composition contains (A) an acid dissociable group-containing resin having a structure of formula (1) (where R1 is H, a monovalent acid dissociable group, an alkyl having no acid dissociable group or an alkylcarbonyl having no acid dissociable group; X1 is a 1-4C linear or branched fluoroalkyl; and R2 is H, a linear or branched alkyl or a linear or branched fluoroalkyl) and (B) a radiation sensitive acid generating agent.

公开(公告)号：DE60018350D1

公开(公告)日：2005-04-07

申请号：DE60018350

申请日：2000-11-08

Applicant: JSR CORP

Inventor： WANG YONG ,  KOBAYASHI EIICHI ,  MIYAJI MASAAKI ,  NUMATA JUN ,  SHIMOKAWA TSUTOMU

IPC: G03F7/028 ,  C07D207/46 ,  C07D209/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07D209/48

Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X represents an organic group having an ester linkage, R represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m + n ≤ 11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.

公开(公告)号：AU8015701A

公开(公告)日：2002-03-13

申请号：AU8015701

申请日：2001-08-24

Applicant: JSR CORP

Inventor： NISHIMURA ISAO ,  BESSHO NOBUO ,  KUMANO ATSUSHI ,  SHIMOKAWA TSUTOMU ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F7/36 ,  C08L101/00 ,  G02B3/00 ,  G02B6/12 ,  G03H1/02

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

公开(公告)号：DE60018350T2

公开(公告)日：2006-07-06

申请号：DE60018350

申请日：2000-11-08

Applicant: JSR CORP

Inventor： WANG YONG ,  KOBAYASHI EIICHI ,  MIYAJI MASAAKI ,  NUMATA JUN ,  SHIMOKAWA TSUTOMU

IPC: C07D209/48 ,  G03F7/028 ,  C07D207/46 ,  C07D209/76 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X represents an organic group having an ester linkage, R represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m + n ≤ 11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.

公开(公告)号：DE60105523D1

公开(公告)日：2004-10-21

申请号：DE60105523

申请日：2001-11-13

Applicant: JSR CORP

Inventor： KAWAGUCHI KAZUO ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/09

Abstract: An anti-reflection coating-forming composition is provided. This composition includes a polymer and a solvent. The polymer has a structural unit represented by the formula (1): wherein R1 is a monovalent atom other than a hydrogen atom or a monovalent group, and n is an integer of 0-4, provided that when n is an integer of 2-4, a plural number of R1's are the same or different; R2 and R3 are each a monovalent atom or group; and X is a bivalent group. The anti-reflection coating formed from this composition has a high antireflective effect, does not generate intermixing with a resist film, and enables a good resist pattern profile excellent in resolution and precision in cooperation with a positive or negative resist.

公开(公告)号：CA2431358A1

公开(公告)日：2002-06-20

申请号：CA2431358

申请日：2001-12-06

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  NISHIMURA ISAO ,  YAMADA KENJI ,  BESSHO NOBUO ,  KUMANO ATSUSHI

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  C08L101/00 ,  G03F7/36 ,  G03F7/38

Abstract: A radiation-sensitive composition changing in refractive index which compris es (A) a decomposable compound, (B) a nondecomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation-sensiti ve decomposer, and (D) a stabilizer. When the composition is irradiated with a radiation through a pattern mask, the ingredients (C) and (A) in the irradiated areas decompose to cause a difference in refractive index between the irradiated areas and the unirradiated areas. Thus, a pattern having different refractive indexes is formed.

公开(公告)号：AT315245T

公开(公告)日：2006-02-15

申请号：AT00120000

申请日：2000-09-14

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MURATA KIYOSHI ,  ISHII HIROYUKI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/027 ,  G03F7/004 ,  G03F7/039

Abstract: A radiation-sensitive resin composition comprising (A) a resin containing an acid-dissociable group which is insoluble or scarcely soluble in alkali and becomes alkali soluble when the acid-dissociable group dissociates, comprising the following recurring unit (I), recurring unit (II), and at least one of the recurring units (III-1) and (III-2), and (B) a photoacid generator. The radiation-sensitive resin composition is suitable for use as a chemically-amplified resist showing sensitivity to active radiation such as deep ultraviolet rays represented by a KrF excimer laser or ArF excimer laser, exhibiting superior dry etching resistance without being affected by types of etching gas, having high radiation transmittance, exhibiting excellent basic characteristics as a resist such as sensitivity, resolution, and pattern shape, possessing excellent storage stability as a composition, and exhibiting sufficient adhesion to substrates.

公开(公告)号：AU2001280157B2

公开(公告)日：2005-08-11

申请号：AU2001280157

申请日：2001-08-24

Applicant: JSR CORP

Inventor： SHIMOKAWA TSUTOMU ,  KUMANO ATSUSHI ,  BESSHO NOBUO ,  NISHIMURA ISAO ,  YAMADA KENJI

IPC: C08L67/00 ,  C08L69/00 ,  C08L83/14 ,  G02B1/04 ,  G02B5/18 ,  G02B6/124 ,  G03F7/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  G03F007/004 ,  G03H001/02 ,  G02B006/12 ,  G02B005/18 ,  G02B003/00 ,  C08L101/00 ,  C08L083/14 ,  G03F007/36

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.