公开(公告)号：WO2011155985A3

公开(公告)日：2012-04-19

申请号：PCT/US2011001032

申请日：2011-06-08

Applicant: LAM RES CORP ,  WANG YEN-KUN VICTOR ,  CHOU SHANG-I ,  AUGUSTINO JASON

Inventor： WANG YEN-KUN VICTOR ,  CHOU SHANG-I ,  AUGUSTINO JASON

IPC: H01L21/02 ,  H01L21/205 ,  H01L21/3065

CPC classification number: H01L21/268 ,  C03B20/00 ,  H01L21/02041 ,  H01L21/67028 ,  H01L21/67115

Abstract: A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber.

Abstract translation: 具有内部增压室的石英窗口可通过向气室供应含臭氧的气体而在脱气室中作为快门或UV过滤器操作。 可以调节增压室中的压力以阻止UV光透射​​到脱气室中或调节通过窗口的UV光的透射率。 当集气室抽真空时，增压室允许最大限度地将UV光透射​​到脱气室中。

公开(公告)号：WO2010067284A2

公开(公告)日：2010-06-17

申请号：PCT/IB2009055503

申请日：2009-12-04

Applicant: LAM RES CORP ,  O'NEILL ROBERT GRIFFITH ,  LUQUE JORGE ,  CHOU SHANG-I ,  SINGH HARMEET

Inventor： O'NEILL ROBERT GRIFFITH ,  LUQUE JORGE ,  CHOU SHANG-I ,  SINGH HARMEET

IPC: H01L21/68 ,  H01L21/687

CPC classification number: H01L21/67748 ,  G01N21/9501 ,  G01N2021/8864 ,  H01L21/67259 ,  H01L21/68

Abstract: A wafer handling mechanism is operated to place a wafer on a chuck. A chucking force is then applied to the wafer, whereby wafer support features of the chuck transfer a defect pattern onto a surface of the wafer. The surface of the wafer is analyzed by a defect metrology tool to obtain a mapping of the defect pattern transferred onto the surface of the wafer. A center coordinate of the chuck within a coordinate system of the wafer is determined by analyzing the defect pattern as transferred to the surface of the wafer. A spatial offset between the center coordinate of the chuck and the center of the wafer is determined. The spatial offset is used to adjust the wafer handling mechanism so as to enable alignment of the center of the wafer to the center coordinate of the chuck.

Abstract translation: 操作晶片处理机构以将晶片放置在卡盘上。 然后将夹紧力施加到晶片，由此夹盘的晶片支撑特征将缺陷图案转移到晶片的表面上。 通过缺陷度量工具分析晶片的表面，以获得转移到晶片表面上的缺陷图案的映射。 通过分析传送到晶片表面的缺陷图案来确定晶片的坐标系内的卡盘的中心坐标。 确定卡盘的中心坐标和晶片的中心之间的空间偏移。 空间偏移用于调整晶片处理机构，以使晶片的中心能够对准卡盘的中心坐标。

公开(公告)号：WO2011056484A3

公开(公告)日：2011-08-04

申请号：PCT/US2010053858

申请日：2010-10-22

Applicant: LAM RES CORP ,  SINGH HARMEET ,  SANT SANKET ,  CHOU SHANG-I ,  VAHEDI VAHID ,  CASAES RAPHAEL ,  RAMACHANDRAN SEETHARAMAN

Inventor： SINGH HARMEET ,  SANT SANKET ,  CHOU SHANG-I ,  VAHEDI VAHID ,  CASAES RAPHAEL ,  RAMACHANDRAN SEETHARAMAN

IPC: H01L21/302 ,  H01L21/677

CPC classification number: H01L21/02057 ,  H01L21/67017 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/67201 ,  H01L21/67207

Abstract: A wafer is provided into an entrance load lock chamber. A vacuum is created in the entrance load lock chamber. The wafer is transported to a processing tool. The wafer is processed in a process chamber to provide a processed wafer, wherein the processing forms halogen residue. A degas step is provided in the process chamber after processing the wafer. The processed wafer is transferred into a degas chamber. The processed wafer is treated in the degas chamber with UV light and a flow of gas comprising at least one of ozone, oxygen, or H2O. The flow of gas is stopped. The UV light is stopped. The processed wafer is removed from the degas chamber.

Abstract translation: 将晶片设置在入口加载锁定室中。 在入口装载锁定室中产生真空。 晶片被输送到处理工具。 在处理室中处理晶片以提供经处理的晶片，其中处理形成卤素残余物。 在处理晶片之后，在处理室中提供脱气步骤。 将经处理的晶片转移到脱气室中。 处理的晶片在脱气室中用UV光和包含臭氧，氧气或H 2 O中的至少一种的气体流进行处理。 停止气体流动。 UV灯停止。 将经处理的晶片从脱气室中取出。

公开(公告)号：EP2377152A4

公开(公告)日：2012-11-21

申请号：EP09831551

申请日：2009-12-04

Applicant: LAM RES CORP

Inventor： O'NEILL ROBERT GRIFFITH ,  LUQUE JORGE ,  CHOU SHANG-I ,  SINGH HARMEET

IPC: H01L21/68 ,  H01L21/67

CPC classification number: H01L21/67748 ,  G01N21/9501 ,  G01N2021/8864 ,  H01L21/67259 ,  H01L21/68

公开(公告)号：SG185812A1

公开(公告)日：2012-12-28

申请号：SG2012088563

申请日：2011-06-08

Applicant: LAM RES CORP

Inventor： WANG YEN-KUN VICTOR ,  CHOU SHANG-I ,  AUGUSTINO JASON

Abstract: A quartz window with an interior plenum is operable as a shutter or UV filter in a degas chamber by supplying the plenum with an ozone-containing gas. Pressure in the plenum can be adjusted to block UV light transmission into the degas chamber or adjust transmittance of UV light through the window. When the plenum is evacuated, the plenum allows maximum transmission of UV light into the degas chamber.