公开(公告)号：WO2007078642A3

公开(公告)日：2007-12-27

申请号：PCT/US2006047119

申请日：2006-12-08

Applicant: LAM RES CORP ,  FREER ERIK M ,  DE LARIOS JOHN M ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

Inventor： FREER ERIK M ,  DE LARIOS JOHN M ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

IPC: B08B7/00

CPC classification number: H01L21/02057 ,  B05D3/10 ,  B08B7/02 ,  C11D1/04 ,  C11D3/042 ,  C11D3/044 ,  C11D3/18 ,  C11D3/2079 ,  C11D3/222 ,  C11D3/225 ,  C11D3/3765 ,  C11D9/00 ,  C11D9/02 ,  C11D9/267 ,  C11D11/0047 ,  C11D17/0004 ,  C11D17/0013 ,  C11D17/0017 ,  C11D17/003 ,  C11D17/041 ,  C23G1/00 ,  C23G1/18 ,  G03F7/42 ,  G03F7/423 ,  H01L21/02052 ,  H01L21/02096 ,  H01L21/31133 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6708 ,  H01L21/67086

Abstract: A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid components can be exerted by an immiscible component within the liquid medium. When the solid components are brought within sufficient proximity to the contaminants, an interaction is established between the solid components and the contaminants. Then, the solid components are moved away from the substrate such that the contaminants having interacted with the solid components are removed from the substrate.

Abstract translation: 清洁材料设置在基板上。 清洁材料包括分散在液体介质内的固体组分。 对液体介质内的固体组分施加力以使固体组分接近衬底上存在的污染物。 施加到固体组分上的力可以由液体介质内的不混溶组分施加。 当固体组分充分接近污染物时，在固体组分和污染物之间建立相互作用。 然后，将固体组分移离基底，使得从基底去除与固体组分相互作用的污染物。

公开(公告)号：JP2007208247A

公开(公告)日：2007-08-16

申请号：JP2006353540

申请日：2006-12-28

Applicant: Lam Res Corp ,  ラム リサーチ コーポレーションLam Research Corporation

Inventor： FREER ERIK M ,  DE LARIOS JOHN M ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

IPC: H01L21/304

CPC classification number: H01L21/67051 ,  B08B3/003 ,  B08B3/02

Abstract: PROBLEM TO BE SOLVED: To provide a cleaning apparatus and a method thereof which can remove particulate contamination substance of a sufficiently small size, even if the substance has a shape of a high aspect ratio.
SOLUTION: The apparatus for cleaning a substrate 116 is disclosed. The apparatus is provided with a first head unit 110 and a second head unit 112. The first head unit 110 is arranged proximate to the surface of the substrate and is provided with a first row of channels configured to supply a foam to the surface of the substrate. The second head unit 112 is arranged substantially adjacent to the first head unit and proximate to the surface of the substrate. The second head unit is provided with a second and a third row of channels. The second row of channels 112 is configured to supply a fluid to the surface of the substrate. The third row of channels 114 is configured to cause a vacuum to work on the surface of the substrate.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：即使该物质具有高纵横比的形状，也可提供能够去除足够小尺寸的微粒污染物质的清洁装置及其方法。 解决方案：公开了一种用于清洁衬底116的设备。 该设备设置有第一头单元110和第二头单元112.第一头单元110布置成靠近基底的表面，并且设置有第一排通道，其构造成将泡沫供应到 基质。 第二头单元112被布置成基本上与第一头单元相邻并且靠近衬底的表面。 第二头单元设置有第二和第三排通道。 第二排通道112构造成将流体供应到基板的表面。 第三排通道114构造成使真空在基板的表面上起作用。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：MY152543A

公开(公告)日：2014-10-31

申请号：MYPI20064619

申请日：2006-12-04

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

IPC: B08B3/00

Abstract: METHODS FOR CLEANING USING A TRI-STATE BODY (110) ARE DISCLOSED. A SUBSTRATE (112) HAVING A PARTICLE (102) DEPOSITED THEREON IS PROVIDED. A TRI-STATE BODY THAT HAS A SOLID PORTION (108), LIQUID PORTION (106) AND A GAS PORTION (104) IS GENERATED. A FORCE IS APPLIED OVER THE TRI-STATE BODY TO PROMULGATE AN INTERACTION BETWEEN THE SOLID PORTION AND THE PARTICLE. THE TRI-STATE BODY IS REMOVED ALONG WITH THE PARTICLE FROM THE SURFACE OF THE SUBSTRATE. THE INTERACTION BETWEEN THE SOLID PORTION AND THE PARTICLE CAUSING THE PARTICLE TO BE REMOVED ALONG WITH THE TRI-STATE BODY.

公开(公告)号：SG133543A1

公开(公告)日：2007-07-30

申请号：SG2006087423

申请日：2006-12-15

Applicant: LAM RES CORP

Inventor： FREER ERIK M ,  LARIOS JOHN M DE ,  MIKHAYLICHENKO KATRINA ,  RAVKIN MICHAEL ,  KOROLIK MIKHAIL ,  REDEKER FRED C ,  THOMAS CLINT ,  PARKS JOHN

Abstract: An apparatus for cleaning a substrate is disclosed. The apparatus having a first head unit and a second head unit. The first head unit is positioned proximate to the surface of the substrate and has a first row of channels defined within configured to supply a foam to the surface of the substrate. The second head unit is positioned substantially adjacent to the first head unit and proximate to the surface of the substrate. A second and a third row of channels are defined within the second head unit. The second row of channels is configured to supply a fluid to the surface of the substrate. The third row of channels is configured to apply a vacuum to the surface of the substrate.