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公开(公告)号:MY139592A
公开(公告)日:2009-10-30
申请号:MYPI20042487
申请日:2004-06-24
Applicant: LAM RES CORP
Inventor: HEMKER DAVID , REDEKER FRED C , BOYD JOHN , LARIOS JOHN M DE , RAVKIN MICHAEL , KOROLIK MIKHAIL
Abstract: A METHOD FOR PROCESSING A SUBSTRATE IS PROVIDED WHICH INCLUDES GENERATING A MENISCUS (112) ON THE SURFACE OF THE SUBSTRATE (108) AND APPLYING PHOTOLITHOGRAPHY LIGHT THROUGH THE MENISCUS (112) TO ENABLE PHOTOLITHOGRAPHY PROCESSING OF A SURFACE OF THE SUBSTRATE (108).
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公开(公告)号:MY137975A
公开(公告)日:2009-04-30
申请号:MYPI20051477
申请日:2005-04-01
Applicant: LAM RES CORP
Inventor: WOODS CARL , SMITH MICHAEL G R , PARKS JOHN , GARCIA JAMES P , LARIOS JOHN M DE
IPC: B05C9/02 , B05D1/00 , B05D3/12 , H01L21/00 , H01L21/02 , H01L21/027 , H01L21/304 , H01L21/306
Abstract: AN APPARATUS FOR PROCESSING A SUBSTRATE (108) IS PROVIDED WHICH INCLUDES A FIRST MANIFOLD MODULE (106) TO GENERATE A FLUID MENISCUS (140) ON A SUBSTRATE SURFACE. THE APPARATUS ALSO INCLUDES A SECOND MANIFOLD MODULE (102) TO CONNECT WITH THE FIRST MANIFOLD MODULE (106) AND ALSO TO MOVE THE FIRST MANIFOLD MODULE (106) INTO CLOSE PROXIMITY TO THE SUBSTRATE SURFACE TO GENERATE THE FLUID MENISCUS (140).
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公开(公告)号:SG136145A1
公开(公告)日:2007-10-29
申请号:SG2007088958
申请日:2005-03-23
Applicant: LAM RES CORP
Inventor: KOROLIK MIKHAIL , LARIOS JOHN M DE , RAVKIN MIKE , FARBER JEFFREY
IPC: H01L21/304 , B08B3/04 , H01L21/00
Abstract: A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.
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公开(公告)号:IL209736A
公开(公告)日:2011-12-29
申请号:IL20973610
申请日:2010-12-02
Applicant: LAM RES CORP , LARIOS JOHN M DE , GARCIA JAMES P , WOODS CARL A , RAVKIN MICHAEL , REDEKER FRED C
Inventor: LARIOS JOHN M DE , GARCIA JAMES P , WOODS CARL A , RAVKIN MICHAEL , REDEKER FRED C
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公开(公告)号:IL190454A
公开(公告)日:2011-12-29
申请号:IL19045408
申请日:2008-03-26
Applicant: LAM RES CORP , LARIOS JOHN M DE , GARCIA JAMES P , WOODS CARL A , RAVKIN MICHAEL , REDEKER FRITZ , BOYD JOHN , NICKHOU AFSHIN
Inventor: LARIOS JOHN M DE , GARCIA JAMES P , WOODS CARL A , RAVKIN MICHAEL , REDEKER FRITZ , BOYD JOHN , NICKHOU AFSHIN
Abstract: A manifold for use in preparing a surface of a substrate, comprising: the manifold defined by a head that includes, a first portion in the manifold having a plurality of conduits to deliver a first fluid onto the surface of the substrate and a plurality of conduits for removing the first fluid from the surface of the substrate to define a first process window in the first portion of the manifold, a first fluid meniscus configured to be maintained in the first process window of the manifold; and a second portion in the manifold having a plurality of conduits to deliver a second fluid onto the surface of the substrate and a plurality of conduits for removing the second fluid from the surface of the substrate to define a second process window in the second portion of the manifold, a second fluid meniscus configured to be maintained in the second process window of the manifold; wherein the head is operable to be placed in proximity to the surface of the substrate so as to orient the first process window and the second process window toward the surface of the substrate.
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公开(公告)号:SG133541A1
公开(公告)日:2007-07-30
申请号:SG2006087407
申请日:2006-12-15
Applicant: LAM RES CORP
Inventor: FREER ERIK M , LARIOS JOHN M DE , MIKHAYLICHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRED C
Abstract: Methods for cleaning using a tri-state body are disclosed. A substrate having a particle deposited thereon is provided. A tri-state body that has a solid portion, liquid portion, and a gas portion is generated. A force is applied over the tri-state body to promulgate an interaction between the solid portion and the particle. The tri-state body is removed along with the particle from the surface of the substrate. The interaction between the solid portion and the particle causing the particle to be removed along with the tri-state body.
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公开(公告)号:AU2003277212A1
公开(公告)日:2004-04-19
申请号:AU2003277212
申请日:2003-09-30
Applicant: LAM RES CORP
Inventor: WOODS CARL , RAVKIN MIKE , REDEKER FRITZ , BOYD JOHN , NICKHOU AFSHIN , LARIOS JOHN M DE , GARCIA JAMES P
IPC: H01L21/00
Abstract: One of many embodiments of a substrate preparation system is provided which includes a head having a head surface where the head surface is proximate to a surface of the substrate. The system also includes a first conduit for delivering a first fluid to the surface of the substrate through the head, and a second conduit for delivering a second fluid to the surface of the substrate through the head, where the second fluid is different than the first fluid. The system also includes a third conduit for removing each of the first fluid and the second fluid from the surface of the substrate where the first conduit, the second conduit and the third conduit act substantially simultaneously. In an alternative embodiment, a method for processing a substrate is provided that includes generating a fluid meniscus on a surface of the substrate and applying acoustic energy to the fluid meniscus. The method also includes moving the fluid meniscus over the surface the substrate to process the surface of the substrate.
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公开(公告)号:MY150857A
公开(公告)日:2014-03-14
申请号:MYPI20064607
申请日:2006-11-30
Applicant: LAM RES CORP
Inventor: FREER ERIK M , LARIOS JOHN M DE , MIKHAYLINCHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRED C
IPC: C11D11/00
Abstract: A METHOD IS PROVIDED FOR REMOVING CONTAMINATION FROM A SUBSTRATE. THE METHOD INCLUDES APPLYING A CLEANING SOLUTION HAVING A DISPERSED PHASE, A CONTINUOUS PHASE AND PARTICLES DISPERSED WITHIN THE CONTINUOUS PHASE TO A SURFACE OF THE SUBSTRATE. THE METHOD INCLUDES FORCING ONE OF THE PARTICLES DISPERSED WITHIN THE CONTINUOUS PHASE PROXIMATE TO ONE OF THE SURFACE CONTAMINANTS. THE FORCING IS SUFFICIENT TO OVERCOME ANY REPULSIVE FORCES BETWEEN THE PARTICLES AND THE SURFACE CONTAMINANTS SO THAT THE ONE OF THE PARTICLES AND THE ONE OF THE SURFACE CONTAMINANTS ARE ENGAGED. THE METHOD ALSO INCLUDES REMOVING THE ENGAGED PARTICLE AND SURFACE CONTAMINANT FROM THE SURFACE OF THE SUBSTRATE. A PROCESS TO MANUFACTURE THE CLEANING MATERIAL IS ALSO PROVIDED.
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公开(公告)号:IL161550A
公开(公告)日:2010-12-30
申请号:IL16155004
申请日:2004-04-21
Applicant: LAM RES CORP , LARIOS JOHN M DE , GARCIA JAMES P , WOODS CARL A , RAVKIN MICHAEL , REDEKER FRITZ , BOYD JOHN , NICKHOU AFSHIN
Inventor: LARIOS JOHN M DE , GARCIA JAMES P , WOODS CARL A , RAVKIN MICHAEL , REDEKER FRITZ , BOYD JOHN , NICKHOU AFSHIN
Abstract: A manifold for use in preparing a surface of a substrate, comprising: the manifold defined by a head that includes, a first portion in the manifold having a plurality of conduits to deliver a first fluid onto the surface of the substrate and a plurality of conduits for removing the first fluid from the surface of the substrate to define a first process window in the first portion of the manifold, a first fluid meniscus configured to be maintained in the first process window of the manifold; and a second portion in the manifold having a plurality of conduits to deliver a second fluid onto the surface of the substrate and a plurality of conduits for removing the second fluid from the surface of the substrate to define a second process window in the second portion of the manifold, a second fluid meniscus configured to be maintained in the second process window of the manifold; wherein the head is operable to be placed in proximity to the surface of the substrate so as to orient the first process window and the second process window toward the surface of the substrate.
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公开(公告)号:MY141193A
公开(公告)日:2010-03-31
申请号:MYPI20064606
申请日:2006-11-30
Applicant: LAM RES CORP
Inventor: FREER ERIK M , LARIOS JOHN M DE , MIKHAYLINCHENKO KATRINA , RAVKIN MICHAEL , KOROLIK MIKHAIL , REDEKER FRED C
IPC: B08B3/02
Abstract: A CLEANING COMPOUND IS PROVIDED. THE CLEANING COMPOUND INCLUDES ABOUT 0.1 WEIGHT PERCENT TO ABOUT 10 WEIGHT PERCENT OF A FATTY ACID DISPERSED IN WATER. THE CLEANING COMPOUND INCLUDES AN AMOUNT OF A BASE SUFFICIENT TO BRING A PH OF THE FATTY ACID WATER SOLUTION TO ABOUT A LEVEL WHERE ABOVE ABOUT 50% OF THE DISPERSED FATTY ACID IS IONIZED. A METHOD FOR CLEANING A SUBSTRATE, A SYSTEM FOR CLEANING A SUBSTRATE, AND A CLEANING SOLUTION PREPARED BY A PROCESS ARE ALSO PROVIDED.
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