公开(公告)号：SG196750A1

公开(公告)日：2014-02-13

申请号：SG2013056668

申请日：2013-07-17

Applicant: LAM RES CORP

Inventor： KUO MING-SHU ,  LI SIYI ,  TITUS MONICA ,  RAGHAVAN SRIKANTH ,  KIM TAE WON ,  KAMARTHY GOWRI

公开(公告)号：SG10201401112YA

公开(公告)日：2014-11-27

申请号：SG10201401112Y

申请日：2014-03-31

Applicant: LAM RES CORP

Inventor： SINGH HARMEET ,  LILL THORSTEN ,  VAHEDI VAHID ,  PATERSON ALEX ,  TITUS MONICA ,  KAMARTHY GOWRI

Abstract: The embodiments disclosed herein pertain to improved methods and apparatus for etching a semiconductor substrate. A plasma grid assembly is positioned in a reaction chamber to divide the chamber into upper and lower sub-chambers. The plasma grid assembly may include one or more plasma grids having slots of a particular aspect ratio, which allow certain species to pass through from the upper sub-chamber to the lower sub-chamber. Where multiple plasma grids are used, one or more of the grids may be movable, allowing for tenability of the plasma conditions in at least the lower sub-chamber. In some cases, an electron-ion plasma is generated in the upper sub-chamber. Electrons that make it through the grid to the lower sub-chamber are cooled as they pass through. In some cases, this results in an ion-ion plasma in the lower sub-chamber.

公开(公告)号：SG10201708419TA

公开(公告)日：2017-11-29

申请号：SG10201708419T

申请日：2014-04-04

Applicant: LAM RES CORP

Inventor： PATERSON ALEX ,  KIM DO YOUNG ,  KAMARTHY GOWRI ,  DEL PUPPO HELENE ,  YU JEN-KAN ,  TITUS MONICA ,  MANI RADHIKA ,  SUN NOEL YUI ,  GANI NICOLAS ,  KIMURA YOSHIE ,  CHUNG TING-YING