公开(公告)号：AU2002249829A1

公开(公告)日：2002-08-12

申请号：AU2002249829

申请日：2001-12-27

Applicant: MICROCOATING TECHNOLOGIES INC

Inventor： TOMOV TRIFON ,  LUTEN HENRY A III ,  OLJACA MIODRAG ,  NEUMULLER TRAVIS ,  DANIELSON DOUG ,  WITBROD FRANK ,  NEUMAN GEORGE A ,  HUNT ANDREW T ,  FORTUNATO FRED

IPC: C23C16/44 ,  C23C16/453 ,  C23C16/455 ,  B05B1/24

Abstract: Apparatus is described for rapidly coating a large area, or for rapidly producing a powder. In one embodiment, a liquid having a coating chemical is pumped from a liquid reservoir to a distribution manifold. From the distribution manifold, the liquid is carried under pressure to a geometric array, e.g., linear, of atomization nozzles. Flow equalization means are provided for equalizing the flow of the liquid delivered to each nozzle, and, preferably, means are provided for equalizing the temperature of the liquid delivered to each nozzle. The liquid, upon exiting the nozzles with the attendant pressure drop atomizes. The atomized liquid coats a substrate either in non-reacted or reacted form, or forms a powder. In a preferred embodiment, a solution of precursor chemical is reacted in a geometric array of flames produced at the nozzles, and a coating material produced in the flame coats the substrate, or a powder is formed. In another embodiment, vaporized precursor and vaporized are fed to a burner chamber having a linear exit slit. The vapor exiting the slit is burned, and material produced in a flame reaction are deposited on a substrate, or the powder formed is collected.

公开(公告)号：WO0112433A2

公开(公告)日：2001-02-22

申请号：PCT/US0022845

申请日：2000-08-17

Applicant: MICROCOATING TECHNOLOGIES INC ,  HUNT ANDREW TYE ,  LUTEN HENRY A III

Inventor： HUNT ANDREW TYE ,  LUTEN HENRY A III

IPC: C23C16/01 ,  C23C16/18 ,  C23C16/448 ,  C23C16/453 ,  H05K3/02 ,  H05K3/38 ,  B32B15/00

CPC classification number: C23C16/4486 ,  C23C16/01 ,  C23C16/18 ,  C23C16/453 ,  H05K3/025 ,  H05K3/382 ,  Y10S156/922 ,  Y10S428/901 ,  Y10S428/924 ,  Y10S428/926 ,  Y10S428/938 ,  Y10T156/11 ,  Y10T428/12438 ,  Y10T428/12556 ,  Y10T428/12583 ,  Y10T428/1259 ,  Y10T428/12611 ,  Y10T428/12639 ,  Y10T428/12646 ,  Y10T428/12667 ,  Y10T428/12708 ,  Y10T428/12715 ,  Y10T428/12722 ,  Y10T428/12743 ,  Y10T428/1275 ,  Y10T428/12778 ,  Y10T428/12792 ,  Y10T428/1284 ,  Y10T428/12868 ,  Y10T428/12875 ,  Y10T428/12882 ,  Y10T428/12889 ,  Y10T428/12896 ,  Y10T428/12903 ,  Y10T428/1291 ,  Y10T428/12944 ,  Y10T428/12993

Abstract: A thin film product having a nanostructured surface, a laminate product including the thin film and a temporary substrate opposite the nanostructured surface, a laminate product including the thin film and a final substrate attached to the nanostructured surface and a method of producing the thin film products. The thin film is particularly useful in the electronics industry for the production of integrated circuits, touch screen, flat panel display, printed circuit boards and EMF shielding. The nanostructured surface includes surface features that are mostly smaller than one micron, while the dense portion of the thin film is between 10-200mm. The thin film is produced by coating a temporary substrate (such as aluminum foil) with a coating material (such as copper) using any process. One such method is concentrated heat deposition or a combustion, chemical vapor deposition process. The resulting thin film provides a high level of adhesion to a final substrate, by embedding the nanostructures with the material of the final substrate (such as epoxy resin). The surface of the thin film adjacent the temporary substrate substantially conforms to the substrate surface and has a relatively low peel strength. In this manner, the temporary substrate is easily removed from the thin film after attaching the opposite nanostructured side of the thin film to the final substrate with a resulting, higher peel strength.

Abstract translation: 具有纳米结构表面的薄膜产品，包括薄膜和与纳米结构表面相对的临时基底的层压制品，包括薄膜和附着在纳米结构表面上的最终基底的层压制品以及制造薄膜产品的方法 。 薄膜在电子工业中特别适用于生产集成电路，触摸屏，平板显示器，印刷电路板和EMF屏蔽。 纳米结构表面包括大多小于1微米的表面特征，而薄膜的致密部分在10-200mm之间。 通过使用任何方法用涂覆材料（例如铜）涂覆临时基板（例如铝箔）来制造薄膜。 一种这样的方法是集中热沉积或燃烧，化学气相沉积工艺。 通过将纳米结构与最终基底（例如环氧树脂）的材料嵌入，所得薄膜提供了对最终基底的高水平粘附。 邻近临时衬底的薄膜的表面基本上符合衬底表面并且具有相对低的剥离强度。 以这种方式，在将薄膜的相对的纳米结构侧附着到最终基板上之后，可以容易地从薄膜上去除临时基板，从而获得更高的剥离强度。

公开(公告)号：AU8472401A

公开(公告)日：2002-02-18

申请号：AU8472401

申请日：2001-08-02

Applicant: MICROCOATING TECHNOLOGIES INC

Inventor： SCHMITT JEROME ,  CUI GEORGE GUANG-JI ,  LUTEN HENRY A III ,  YANG FANG ,  GLADDEN FE ALMA ,  FLANAGAN SCOTT ,  JIANG YONGDONG ,  HUNT ANDREW TYE

IPC: C23C16/40 ,  C30B25/02 ,  B32B9/00 ,  C30B29/32

Abstract: Epitaxial and reduced grain boundary materials are deposited on substrates for use in electronic and optical applications. A specific material disclosed is epitaxial barium strontium titanate ( 14 ) deposited on the C-plane of sapphire ( 12 ).

公开(公告)号：AU6790400A

公开(公告)日：2001-03-13

申请号：AU6790400

申请日：2000-08-17

Applicant: MICROCOATING TECHNOLOGIES INC

Inventor： HUNT ANDREW TYE ,  LUTEN HENRY A III

IPC: C23C16/01 ,  C23C16/18 ,  C23C16/448 ,  C23C16/453 ,  H05K3/02 ,  H05K3/38 ,  B32B15/00

公开(公告)号：WO02061163A2

公开(公告)日：2002-08-08

申请号：PCT/US0149559

申请日：2001-12-27

Applicant: MICROCOATING TECHNOLOGIES INC ,  OLJACA MIODRAG ,  TOMOV TRIFON ,  NEUMAN GEORGE A ,  DANIELSON DOUG ,  HUNT ANDREW T ,  NEUMULLER TRAVIS ,  FORTUNATO FRED ,  LUTEN HENRY A III ,  WITBROD FRANK

Inventor： OLJACA MIODRAG ,  TOMOV TRIFON ,  NEUMAN GEORGE A ,  DANIELSON DOUG ,  HUNT ANDREW T ,  NEUMULLER TRAVIS ,  FORTUNATO FRED ,  LUTEN HENRY A III ,  WITBROD FRANK

IPC: C23C16/44 ,  C23C16/453 ,  C23C16/455 ,  C23C

CPC classification number: C23C16/45595 ,  B05B1/14 ,  B05B7/066 ,  B05B7/201 ,  C23C16/453

Abstract: A combustion chemical vapor deposition apparatus (100) having a manifold (116) into which a liquid (211) is pumped into by pump (213) through flow equilization tubes (206). The liquid (211) is sprayed through an array of spray nozzles (104). Combustible gas is provided through nozzles (114) and oxygen is supplied through orifices (106). The manifold is heated by heating element (202).

Abstract translation: 一种燃烧化学气相沉积设备（100），具有歧管（116），液体（211）通过流动均衡管（206）被泵（213）泵入其中。 液体（211）通过一系列喷嘴（104）喷射。 通过喷嘴（114）提供可燃气体，并通过孔（106）供应氧气。 歧管由加热元件（202）加热。