Abstract:
THE PRESENT INVENTION RELATES TO A METHOD FOR FABRICATING A SEMICONDUCTOR DEVICE USING A LIFT-OFF METHOD. THE METHOD COMPRISES THE STEPS OF DEPOSITING AND PATTERNING A SACRIFICIAL LAYER (22) ONTO A SUBSTRATE (21), WHEREIN AT LEAST ONE PORTION OF THE SUBSTRATE SURFACE (21A) IS COVERED BY THE SACRIFICIAL LAYER (22) AND AT LEAST ONE PORTION OF THE SUBSTRATE SURFACE (21B) IS EXPOSED; DEPOSITING AND PATTERNING A CHEMICAL RESIST (23) ONTO THE SACRIFICIAL LAYER (22) AND THE EXPOSED SUBSTRATE SURFACE (21 B); REMOVING THE SACRIFICIAL LAYER (22); DEPOSITING A SEMICONDUCTOR FILM (24) ONTO THE SUBSTRATE (21) AND THE CHEMICAL RESIST (23); AND REMOVING THE CHEMICAL RESIST (23) AND THE SEMICONDUCTOR FILM (24) DEPOSITED ON THE CHEMICAL RESIST (23).
Abstract:
A REFERENCE ELECTRODE (130) FOR SENSING PH IS PROVIDED IN AN AMBIENT ELECTROLYTE SOLUTION IN AN ION SENSITIVE FIELD EFFECT TRANSISTOR (ISFET) (100) WHICH INCLUDES A SOURCE (160), A DRAIN (150) AND A GATE (140), CHARACTERIZED IN THAT, THE REFERENCE ELECTRODE (130) INCLUDES AN ALTERNATING CURRENT SOURCE, AN INSULATING MEMBRANE SEPARATING THE REFERENCE ELECTRODE (130) FROM THE AMBIENT ELECTROLYTE SOLUTION, A DIRECT CURRENT (DC) BIASING VOLTAGE (170) AT THE GATE (140) WHEREIN THE VOLTAGE IS A PREDETERMINED CONSTANT VOLTAGE, WHEREIN THE REFERENCE ELECTRODE (130) IS CONNECTABLE TO THE ALTERNATING CURRENT SOURCE (120) WHERE THE REFERENCE ELECTRODE (130) IS FURTHER INCLUDED IN THE GATE (140) AND THE REFERENCE ELECTRODE (130) IS CONSTRUCTED FROM COMPLEMENTARY METAL-OXIDE-SEMICONDUCTOR (CMOS) COMPATIBLE METAL.
Abstract:
THE PRESENT INVENTION RELATES TO AN APPARATUS AND A METHOD FOR CONTROLLING AND MONITORING NUTRIENT SOLUTION TO BE SUPPLIED TO A PLANT. IN OPERATION, ALL SENSORS OF THE PRESENT INVENTION ARE USED FOR MONITORING THE ENVIRONMENTAL PARAMETERS. THE ENVIRONMENTAL PARAMETERS WILL BE EXTRACTED AND SENT TO THE WORKSTATION THROUGH WIRES OR WIRELESS. AFTER THE ENVIRONMENTAL PARAMETERS EXTRACTION, A BUFFER SOLUTION SUCH AS DEIONIZED WATER IS PASSING THROUGH THE MICROCHANNEL TO RINSE MONITORING SENSOR OF THE PRESENT INVENTION FROM WASH BUFFER (138). BUFFER SOLUTIONS AFTER THE RINSING PROCESS WILL BE CHANNELED TO THE WASTE BUFFER (136).