Abstract:
One aspect of the present invention resides in a manufacturing method for a semiconductor package, including a covering step of forming a covering insulating layer that covers the surface of a semiconductor element, a film-forming step of forming a resin film on the surface of the covering insulating layer, a circuit pattern-forming step of forming a circuit pattern portion including recesses reaching the surfaces of electrodes of the semiconductor element and a circuit groove having a desired shape and a desired depth, a catalyst-depositing step of depositing a plating catalyst or a precursor thereof on the surface of the circuit pattern portion, a film-separating step of separating the resin film from the covering insulating layer, and a plating processing step of forming a circuit electrically connected to the electrodes, by applying electroless plating to the covering insulating layer, from which the resin film is separated.
Abstract:
The present invention relates to a circuit board comprising: a circuit groove having at least one land region for surface mounting of electronic parts and at least one circuit wiring region formed integrally with the land region, and a partial reinforcing structure formed in the land region of the circuit groove, wherein the partial reinforcing structure is at least one structure selected from a group consisting of: an irregular shape having a ten-point average roughness (Rz) of 0.1 to 20 µm formed on the groove surface in the land region, a groove shape having the groove depth in the land region larger than that of the circuit wiring region to form a plated film having thickness in the land region thicker than that of the circuit wiring region, and a structure formed by forming at least one protrusion on the periphery of the groove in the land region.
Abstract:
One aspect of the present invention is a method of mounting a semiconductor chip having: a step of forming a resin coating 3 on a surface of a path connecting a bonding pad 2a on a surface of a semiconductor chip 2 and an electrode pad 1a formed on a surface of an insulating base material 1; a step of forming, by laser beam machining, a wiring gutter 4 having a depth that is equal to or greater than a thickness of the resin coating 3 along the path for connecting the bonding pad 2a and the electrode pad 1 a; a step of depositing a plating catalyst 5 on a surface of the wiring gutter 4; a step of removing the resin coating 3; and a step of forming an electroless plating coating 6 only at a site where the plating catalyst 5 remains. Another aspect of the present invention is a three-dimensional structure in which a wiring is formed on a surface, wherein, on the surface of the three-dimensional structure, a recessed gutter for wiring is formed, extending between mutually intersecting adjacent faces of the three-dimensional structure, and wherein at least a part of a wiring conductor is embedded in the recessed gutter for wiring.
Abstract:
PROBLEM TO BE SOLVED: To provide a method of manufacturing an extremely reliable circuit board while reducing material loss by forming a resin film of a uniform thickness over an irregular surface of a structure by irradiating a resist formed over the surface of an insulation substrate with a laser beam to thereby form a circuit pattern.SOLUTION: A manufacturing method for a circuit board includes: a resist forming step to form a resin film over the surface of the insulation substrate; and a circuit forming step to form a circuit pattern by forming a concave portion of a depth larger than the thickness of the resin film with reference to the external surface of the resin film using a laser. The resin film is formed by means of electrostatic spray.
Abstract:
PROBLEM TO BE SOLVED: To provide a dry film having a patterning property and having both high transparency and plating adhesiveness, an optical waveguide and a photoelectricity composite wiring board using the same and a method of manufacturing the photoelectricity composite wiring board.SOLUTION: A dry film for an optical waveguide is formed by laminating a carrier film 2, a plating adhesion layer 4, an uncured clad layer 1 and a cover film 3 in this order, and solid fine particles are dispersed in a resin composition configuring the plating adhesion layer 4.
Abstract:
PROBLEM TO BE SOLVED: To provide a copper-clad laminate which has excellent rigidity by using a resin having good curability.SOLUTION: The copper-clad laminate is obtained by laminating on at least one surface of a resin layer formed by a liquid thermosetting resin composition (A) containing no component to be volatilized when the composition (A) is thermoset, a resin layer of a thermosetting resin composition (B) which has the component different from that of the liquid thermosetting resin composition (A), and a copper layer in this order. A cured material of the thermosetting resin composition (B) has preferably 4.90-29.42 GPa flexural modulus. The liquid thermosetting resin composition (A) preferably contains a radically-polymerizable compound (C) having at least one unsaturated double bond in one molecule thereof and a radical polymerization initiator (D) for initiating polymerization of the radically-polymerizable compound (C). As a result, the copper-clad laminate has a high modulus of elasticity and excellent rigidity since the resin having good curability is used.