MICROELECTRONIC INTERCONNECT ELEMENT WITH DECREASED CONDUCTOR SPACING
    8.
    发明申请
    MICROELECTRONIC INTERCONNECT ELEMENT WITH DECREASED CONDUCTOR SPACING 审中-公开
    具有减小的导体间距的微电子互连元件

    公开(公告)号:WO2010005592A2

    公开(公告)日:2010-01-14

    申请号:PCT/US2009004033

    申请日:2009-07-08

    Abstract: A microelectronic interconnect element can include a plurality of first metal lines (110) and plurality of second metal lines (110') interleaved with the first metal lines (110). Each of the first and second metal lines has a surface (122), (120') extending within the same reference plane. The first metal lines (110) have surfaces (120) above the reference plane and remote therefrom and the second metal lines (110') have surfaces (122') below the reference plane and remote therefrom. A dielectric layer (114A) can separate a metal line of the first metal lines from an adjacent metal line of the second metal lines.

    Abstract translation: 微电子互连元件可以包括与第一金属线(110)交错的多个第一金属线(110)和多个第二金属线(110')。 第一和第二金属线中的每一个具有在同一参考平面内延伸的表面(122),(120')。 第一金属线(110)具有位于参考平面之上并远离其的表面(120),并且第二金属线(110')具有在参考平面之下并远离其的表面(122')。 介电层(114A)可将第一金属线的金属线与第二金属线的相邻金属线分隔开。

Patent Agency Ranking