Field emission device
    3.
    发明授权
    Field emission device 有权
    场发射装置

    公开(公告)号:US09024544B2

    公开(公告)日:2015-05-05

    申请号:US13509537

    申请日:2010-11-10

    Abstract: In a field emission device, the fundamental cause of spherical aberration in an emitted electron beam trajectory is eliminated or mitigated. An aberration suppressor electrode 31 is provided at a lower vertical position than an extraction gate electrode 13 so its opening inner peripheral edge 31e faces a position near an emitter tip 11tp. The vertical position of the opening inner peripheral edge 31e of the aberration suppressor electrode 31 is made lower than the vertical position of the emitter tip 11tp. An aberration suppressing voltage Vsp is applied to the aberration suppressor electrode 31 that is a lower voltage than the potential of the emitter 11 and controls equipotential lines near the emitter tip 11tp to make them parallel.

    Abstract translation: 在场发射器件中,消除或减轻发射的电子束轨迹中球面像差的根本原因。 在比提取栅电极13低的垂直位置处设置像差抑制电极31,使得其开口内周边缘31e面向发射极尖端11tp附近的位置。 使像差抑制电极31的开口内周缘31e的垂直位置比发射极尖端11tp的垂直位置低。 像差抑制电压Vsp被施加到比发射极11的电位低的电压的像差抑制电极31,并且控制发射极尖端11tp附近的等电位线使其平行。

    FIELD EMISSION DEVICE
    6.
    发明申请
    FIELD EMISSION DEVICE 有权
    场发射装置

    公开(公告)号:US20120229051A1

    公开(公告)日:2012-09-13

    申请号:US13509537

    申请日:2010-11-10

    Abstract: In a field emission device, the fundamental cause of spherical aberration in an emitted electron beam trajectory is eliminated or mitigated. An aberration suppressor electrode 31 is provided at a lower vertical position than an extraction gate electrode 13 so its opening inner peripheral edge 31e faces a position near an emitter tip 11tp. The vertical position of the opening inner peripheral edge 31e of the aberration suppressor electrode 31 is made lower than the vertical position of the emitter tip 11tp. An aberration suppressing voltage Vsp is applied to the aberration suppressor electrode 31 that is a lower voltage than the potential of the emitter 11 and controls equipotential lines near the emitter tip 11tp to make them parallel.

    Abstract translation: 在场发射器件中,消除或减轻发射的电子束轨迹中球面像差的根本原因。 在比提取栅电极13低的垂直位置处设置像差抑制电极31,使得其开口内周边缘31e面向发射极尖端11tp附近的位置。 使像差抑制电极31的开口内周缘31e的垂直位置比发射极尖端11tp的垂直位置低。 像差抑制电压Vsp被施加到比发射极11的电位低的电压的像差抑制电极31,并且控制发射极尖端11tp附近的等电位线使其平行。

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