公开(公告)号：US11987521B2

公开(公告)日：2024-05-21

申请号：US17136642

申请日：2020-12-29

Applicant: Carl Zeiss SMT GmbH

Inventor： Eric Eva

IPC: C03C3/06 ,  G02B5/08 ,  G02B7/18 ,  C03C17/40

CPC classification number: C03C3/06 ,  G02B5/0891 ,  G02B7/181 ,  C03B2201/42 ,  C03C17/40 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42

Abstract: In order to reduce the degree of relaxation after an optical substrate has been compacted, in particular after a longer period, substrates (51) or reflective optical elements (50), in particular for EUV lithography, with substrates (51) of this type, are proposed. These substrates (51), which have a surface region (511) with a reflective coating (54), are characterised in that, at least near to the surface region (511), the titanium-doped quartz glass has a proportion of Si—O—O—Si bonds of at least 1*1016/cm3 and/or a proportion of Si—Si bonds of at least 1*1016/cm3 or, along a notional line (513) perpendicular to the surface region (511), over a length (517) of 500 nm or more, a hydrogen content of more than 5×1018 molecules/cm3.

公开(公告)号：US20180127296A1

公开(公告)日：2018-05-10

申请号：US15348136

申请日：2016-11-10

Applicant: Goodrich Corporation

Inventor： Bari M. Southard ,  Matthew J. East ,  Daniel E. Dunn ,  Kramer Harrison

IPC: C03B19/01 ,  B33Y10/00 ,  B33Y80/00 ,  C03C8/02 ,  G02B5/10

CPC classification number: C03B19/01 ,  B33Y10/00 ,  B33Y80/00 ,  C03B19/06 ,  C03B2201/42 ,  C03C8/02 ,  C03C17/04 ,  C03C17/3417 ,  C03C23/0025 ,  C03C2218/32 ,  C03C2218/35 ,  G02B5/10

Abstract: A method of forming an optical component includes depositing slurry that includes glass powder material onto a facesheet and fusing the glass powder material to a facesheet to form a first core material layer on the facesheet. The method also includes successively fusing glass powder material in a plurality of additional core material layers to build a core material structure on the facesheet. The method can include selectively depositing slurry including glass powder material over only a portion of at least one of the facesheet, the first core material layer, and/or the one of the additional core material layers. Depositing the slurry can include extruding the slurry from an extruder.

公开(公告)号：US09878943B2

公开(公告)日：2018-01-30

申请号：US15471344

申请日：2017-03-28

Applicant: Corning Incorporated

Inventor： Dana Craig Bookbinder ,  Robert Brett Desorcie ,  Hazel Benton Matthews, III ,  Pushkar Tandon

IPC: G02B6/036 ,  C03C25/66 ,  C03C25/10

CPC classification number: C03C25/66 ,  C03B37/01205 ,  C03B37/01446 ,  C03B37/0146 ,  C03B37/027 ,  C03B2201/10 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/22 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  C03B2203/23 ,  C03B2203/24 ,  C03C3/06 ,  C03C13/045 ,  C03C25/1061 ,  C03C25/1068 ,  C03C2201/11 ,  C03C2201/22 ,  C03C2201/31 ,  C03C2203/54 ,  G02B6/02 ,  G02B6/021 ,  G02B6/03627 ,  G02B6/0365 ,  Y02P40/57

Abstract: The present disclosure is directed to a method of making an optical fiber with improved bend performance, the optical fiber having a core and at least one cladding layer, and a chlorine content in the in the last layer of the at least one cladding layer that is greater than 500 ppm by weight. The fiber is prepared using a mixture of a carrier gas, a gaseous chlorine source material and a gaseous reducing agent during the sintering of the last or outermost layer of the at least one cladding layer. The inclusion of the reducing gas into a mixture of the carrier gas and gaseous chlorine material reduces oxygen-rich defects that results in at least a 20% reduction in TTP during hydrogen aging testing.

公开(公告)号：US20170240454A1

公开(公告)日：2017-08-24

申请号：US15050589

申请日：2016-02-23

Applicant: Douglas Llewellyn Butler ,  Matthew John Dejneka ,  Daniel Warren Hawtof ,  Dale Robert Powers ,  Pushkar Tandon

Inventor： Douglas Llewellyn Butler ,  Matthew John Dejneka ,  Daniel Warren Hawtof ,  Dale Robert Powers ,  Pushkar Tandon

IPC: C03B37/027 ,  G02B6/10 ,  C03B37/018 ,  H01S3/063

CPC classification number: G02B6/10 ,  C03B19/1453 ,  C03B19/1469 ,  C03B19/1492 ,  C03B23/037 ,  C03B23/047 ,  C03B2201/31 ,  C03B2201/32 ,  C03B2201/34 ,  C03B2201/42 ,  H01S3/0632 ,  H01S3/17

Abstract: Layered glass structures and fabrication methods are described. The methods include depositing soot on a dense glass substrate to form a composite structure and sintering the composite structure to form a layered glass structure. The dense glass substrate may be derived from an optical fiber preform that has been modified to include a planar surface. The composite structure may include one or more soot layers. The layered glass structure may be formed by combining multiple composite structures to form a stack, followed by sintering and fusing the stack. The layered glass structure may further be heated to softening and drawn to control linear dimensions. The layered glass structure or drawn layered glass structure may be configured as a planar waveguide.

公开(公告)号：US09612525B2

公开(公告)日：2017-04-04

申请号：US15137954

申请日：2016-04-25

Applicant: SHIN-ETSU CHEMICAL CO., LTD.

Inventor： Shigeru Maida ,  Hisatoshi Otsuka

IPC: G03F1/24 ,  C03B19/14 ,  C03C3/06 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/06 ,  C03B2207/12 ,  C03B2207/20 ,  C03B2207/81 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/42 ,  Y02P40/57

Abstract: Titania-doped quartz glass is manufactured by mixing a silicon-providing reactant gas and a titanium-providing reactant gas, preheating the reactant gas mixture at 200-400° C., and subjecting the mixture to oxidation or flame hydrolysis. A substrate of the glass is free of concave defects having a volume of at least 30,000 nm3 in an effective region of the EUV light-reflecting surface and is suited for use in the EUV lithography.

公开(公告)号：US09580350B2

公开(公告)日：2017-02-28

申请号：US14921487

申请日：2015-10-23

Applicant: Corning Incorporated

Inventor： Sezhian Annamalai ,  Carlos Alberto Duran ,  Kenneth Edward Hrdina

IPC: C03C3/06 ,  C03C3/076 ,  C03C10/00 ,  C03B19/14 ,  C03B19/06 ,  C03B19/12 ,  C03B32/00

CPC classification number: C03C3/06 ,  C03B19/06 ,  C03B19/12 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/10 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/32 ,  C03B2201/40 ,  C03B2201/42 ,  C03B2201/50 ,  C03B2201/54 ,  C03C3/076 ,  C03C10/0009 ,  C03C2201/10 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2201/50 ,  C03C2201/54 ,  C03C2201/58 ,  C03C2203/54

Abstract: Ultralow expansion titania-silica glass. The glass has high hydroxyl content and optionally include one or more dopants. Representative optional dopants include boron, alkali elements, alkaline earth elements or metals such as Nb, Ta, Al, Mn, Sn Cu and Sn. The glass is prepared by a process that includes steam consolidation to increase the hydroxyl content. The high hydroxyl content or combination of dopant(s) and high hydroxyl content lowers the fictive temperature of the glass to provide a glass having a very low coefficient of thermal expansion (CTE), low fictive temperature (Tf), and low expansivity slope.

Abstract translation: 超低膨胀二氧化钛 - 二氧化硅玻璃。 玻璃具有高羟基含量，并且任选地包括一种或多种掺杂剂。 代表性的可选掺杂剂包括硼，碱元素，碱土金属元素或诸如Nb，Ta，Al，Mn，Sn Cu和Sn的金属。 玻璃通过包括蒸汽固结以增加羟基含量的方法制备。 高羟基含量或掺杂剂和高羟基含量的组合降低了玻璃的假想温度，以提供具有非常低的热膨胀系数（CTE），低假想温度（Tf）和低膨胀斜率的玻璃。

公开(公告)号：US09416040B2

公开(公告)日：2016-08-16

申请号：US14569535

申请日：2014-12-12

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: C03B23/20 ,  C03B19/14 ,  C03B32/00 ,  C03C3/06 ,  G02B5/10 ,  G03F7/20

CPC classification number: C03B23/20 ,  C03B19/1453 ,  C03B32/00 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/42 ,  G02B5/10 ,  G03F7/708 ,  Y10T428/22 ,  Y10T428/24612

Abstract: On the basis of a known method for producing a blank of titanium-doped glass with a high silica content (glass) for a mirror substrate for use in EUV lithography which has a surface region that has an outer contour, is intended to be provided with a reflective coating and is specified as a highly loaded zone when the mirror substrate is used as intended, in order to provide a blank which can be produced at low cost and nevertheless meets high requirements with respect to homogeneity and freedom from blisters and striae, a procedure which comprises the following method steps is proposed: (a) producing a front body of titanium-doped high-quality glass with dimensions more than large enough to enclose the outer contour, (b) producing a cylindrical supporting body from titanium-doped glass, (c) bonding the front body and the supporting body to form a composite body, and (d) working the composite body to form the mirror substrate blank, wherein the step of producing the front body comprises a homogenizing process involving twisting a starting body obtained in the form of a strand by flame hydrolysis of a silicon-containing compound to form a front body blank, and the supporting body is formed as a monolithic glass block with less homogeneity than the front body.

公开(公告)号：US20160185645A1

公开(公告)日：2016-06-30

申请号：US14911506

申请日：2014-07-22

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stefan OCHS ,  Klaus BECKER ,  Stephan THOMAS

IPC: C03B19/14 ,  C03C4/00 ,  G03F1/52 ,  C03C3/00

CPC classification number: C03B19/1461 ,  C03B19/1453 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/00 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/46 ,  C03C2203/52 ,  C03C2204/00 ,  G03F1/52 ,  G03F1/60

Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色，导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基，并在玻璃化之前进行氧处理，这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法，其在羟基含量小于120ppm时，在400nm的波长范围内显示出至少70％的内部透射率（样品厚度10mm） 在玻璃化之前，将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例为Ti3 + / Ti4 +＆nlE; 5×10-4。

公开(公告)号：US20150218039A1

公开(公告)日：2015-08-06

申请号：US14604998

申请日：2015-01-26

Applicant: Corning Incorporated

Inventor： William R. Angell, IV ,  Sezhian Annamalai ,  Carlos Alberto Duran ,  John Edward Maxon

IPC: C03C3/076 ,  C03B19/09 ,  C03C3/06

CPC classification number: C03C3/076 ,  C03B19/09 ,  C03B19/1407 ,  C03B19/1415 ,  C03B2201/42 ,  C03B2207/50 ,  C03C3/06 ,  C03C3/062 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2203/40 ,  G03F1/24 ,  G03F1/60

Abstract: A glass article for use in Extreme Ultra-Violet Lithography (EUVL) is provided. The glass article includes a silica-titania glass having a compositional gradient through the glass article, the compositional gradient being defined by the functions: [TiO2]=(c+f(x,y,z)), and [SiO2]=(100−{c+f(x,y,z)}−δ(x,y,z)) wherein [TiO2] is the concentration of titania in wt. %, [SiO2] is the concentration of silica in wt. %, c is the titania concentration in wt. % for a predetermined zero crossover temperature (Tzc), f(x, y, z) is a function in three-dimensional space that defines the difference in average composition of a volume element centered at the coordinates (x, y, z) with respect to c, and δ(x, y, z) is a function in three-dimensional space that defines the sum of all other components of a volume element centered at the coordinates (x, y, z).

Abstract translation: 提供了一种用于极光紫外光刻（EUVL）的玻璃制品。 玻璃制品包括通过玻璃制品具有组成梯度的二氧化硅 - 二氧化钛玻璃，组成梯度由以下功能定义：[TiO 2] =（c + f（x，y，z））和[SiO 2] =（ 100- {c + f（x，y，z）}-δ（x，y，z））其中[TiO 2]是二氧化钛的重量浓度。 ％，[SiO2]是二氧化硅的重量浓度。 ％，c是以重量计的二氧化钛浓度。 对于预定的零交叉温度（Tzc），f（x，y，z）是三维空间中的函数，其定义以坐标（x，y，z）为中心的体积元素的平均成分的差异与 对于c而言，δ（x，y，z）是定义以坐标（x，y，z）为中心的体元素的所有其他分量的和的三维空间中的函数。

公开(公告)号：US20150183677A1

公开(公告)日：2015-07-02

申请号：US14660561

申请日：2015-03-17

Applicant: NIKON CORPORATION

Inventor： Toshio YOSHINARI

IPC: C03B19/14 ,  C03B11/08 ,  C03C3/06

CPC classification number: C03B19/1415 ,  C03B11/08 ,  C03B19/1469 ,  C03B23/0493 ,  C03B32/005 ,  C03B2201/42 ,  C03B2207/70 ,  C03B2207/80 ,  C03B2215/44 ,  C03C3/06 ,  C03C2201/42 ,  C03C2203/44 ,  G03F1/60

Abstract: A method for manufacturing an SiO2—TiO2 based glass upon a target by a direct method, includes: an ingot growing step of growing an SiO2—TiO2 based glass ingot having a predetermined length on the target by flame hydrolysis by feeding a silicon compound and a titanium compound into an oxyhydrogen flame, wherein the ingot growing step includes: a first step of increasing a ratio of a feed rate of the titanium compound to a feed rate of the silicon compound as the SiO2—TiO2 based glass ingot grows until the ratio reaches a predetermined value; and a second step of gradually growing the SiO2—TiO2 based glass ingot after the ratio has reached the predetermined value in the first stage with keeping the ratio within a predetermined range.

Abstract translation: 通过直接法在靶材上制造SiO 2 -TiO 2基玻璃的方法包括：通过将硅化合物进料火焰水解生长具有预定长度的SiO 2 -TiO 2基玻璃锭的锭生长步骤， 钛化合物变成氢氧焰，其中所述锭生长步骤包括：第一步骤，当所述SiO 2 -TiO 2基玻璃锭生长直到所述比率达到时，增加所述钛化合物的进料速率与所述硅化合物的进料速率的比率 预定值 以及在比率达到规定值的情况下在第一阶段中将SiO 2 -TiO 2基玻璃锭逐渐生长的第二步骤，并将比例保持在预定范围内。