公开(公告)号：US20090220794A1

公开(公告)日：2009-09-03

申请号：US11913855

申请日：2006-05-10

Applicant: Liam O'Neill ,  Frederic Gubbels ,  Stuart Leadley ,  Nick Shephard

Inventor： Liam O'Neill ,  Frederic Gubbels ,  Stuart Leadley ,  Nick Shephard

IPC: B32B27/38 ,  B32B37/02 ,  B32B9/04 ,  B32B9/00

CPC classification number: C09J5/02 ,  B05D1/62 ,  C23C4/02 ,  C23C4/18 ,  Y10T428/31504 ,  Y10T428/31515 ,  Y10T428/31551 ,  Y10T428/31663

Abstract: A method of bonding an adherent to a substrate, wherein a primer is applied to the substrate by plasma deposition and the adherent is bonded to the primer treated surface of the substrate, and the primer contains functional groups which chemically bond to functional groups in the adherent.

Abstract translation: 将粘附剂粘合到基材上的方法，其中通过等离子体沉积将底漆施加到基底上，并将粘附剂结合到底物的引物处理表面，并且引物含有与粘附的官能团化学键合的官能团 。

公开(公告)号：US20090202739A1

公开(公告)日：2009-08-13

申请号：US11577914

申请日：2005-10-12

Applicant: Liam O'Neill ,  Lesley Ann O'Hare ,  Andrew James Goodwin

Inventor： Liam O'Neill ,  Lesley Ann O'Hare ,  Andrew James Goodwin

IPC: B05D3/14

CPC classification number: D06M14/18 ,  B05D1/02 ,  B05D1/62 ,  B05D3/142 ,  B05D3/144 ,  D06M10/025

Abstract: A method for forming a polymeric coating on a substrate surface, by plasma treating a mixture comprising a free-radical initiated polymerisable monomer having one or more free-radical polymerisable groups in the presence of a free radical initiator, wherein said plasma treatment is a soft ionisation plasma process (a process wherein precursor molecules are not fragmented during the plasma process and as a consequence, the resulting polymeric coating has the physical properties of the precursor or bulk polymer) aid depositing the resulting polymeric coating material onto a substrate surface.

Abstract translation: 通过在自由基引发剂的存在下，通过等离子体处理含有具有一个或多个自由基可聚合基团的自由基引发的可聚合单体的混合物在基材表面上形成聚合物涂层的方法，其中所述等离子体处理是软的 电离等离子体工艺（其中前体分子在等离子体工艺期间不分裂的过程，因此所得聚合物涂层具有前体或本体聚合物的物理性质）有助于将所得聚合物涂层材料沉积到基底表面上。

公开(公告)号：US07557019B2

公开(公告)日：2009-07-07

申请号：US11633995

申请日：2006-12-05

Applicant: Michael G. Mikhael ,  Angelo Yializis ,  Richard E. Ellwanger

Inventor： Michael G. Mikhael ,  Angelo Yializis ,  Richard E. Ellwanger

IPC: H01L21/20

CPC classification number: B05D1/62 ,  B05D1/60 ,  B05D3/0254 ,  B05D3/0263 ,  B05D3/06 ,  B05D3/067 ,  B05D3/068 ,  B05D3/142 ,  B05D3/147 ,  B05D5/083 ,  B05D7/04 ,  B05D2252/02 ,  C23C16/30 ,  C23C16/509 ,  D06M10/025 ,  D06M10/08 ,  D06M10/10 ,  D06M14/18 ,  D21H21/16 ,  D21H23/50 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32532 ,  H01J37/32724 ,  H01J37/32825 ,  H01L21/312 ,  H05H1/2406 ,  H05H2001/2412

Abstract: A plasma is produced in a treatment space (58) by diffusing a plasma gas at atmospheric pressure and subjecting it to an electric field created by two metallic electrodes (54,56) separated by a dielectric material (64), and a precursor material is introduced into the treatment space to coat a substrate film or web (14) by vapor deposition or atomized spraying at atmospheric pressure. The deposited precursor exposed to an electromagnetic field (AC, DC, or plasma) and then it is cured by electron-beam, infrared-light, visible-light, or ultraviolet-light radiation, as most appropriate for the particular material being deposited. Additional plasma post-treatment may be used to enhance the properties of the resulting coated products.

Abstract translation: 在处理空间（58）中产生等离子体，通过在大气压下扩散等离子体气体并使其受到由电介质材料（64）分开的两个金属电极（54,56）产生的电场，前体材料是 通过在大气压下气相沉积或雾化喷雾而引入处理空间以涂覆基底膜或网（14）。 暴露于电磁场（AC，DC或等离子体）中的沉积的前驱物，然后通过电子束，红外光，可见光或紫外光辐射固化，最适合于沉积的特定材料。 可以使用额外的等离子体后处理来增强所得涂覆产品的性能。

公开(公告)号：US20090169770A1

公开(公告)日：2009-07-02

申请号：US12400431

申请日：2009-03-09

Applicant: Raghunath Padiyath ,  Moses M. David

Inventor： Raghunath Padiyath ,  Moses M. David

IPC: C23C16/513

CPC classification number: C08J7/045 ,  B05D1/62 ,  B05D7/546 ,  B05D7/58 ,  C08J7/123 ,  C23C16/26 ,  C23C16/545 ,  H01L51/448 ,  H01L51/5243 ,  H01L51/5256 ,  Y10T428/26 ,  Y10T428/265 ,  Y10T428/30 ,  Y10T428/31504 ,  Y10T428/31935

Abstract: A barrier assembly having a flexible or rigid substrate overcoated with an all polymer multilayer stack. A multilayer on the substrate includes alternating diamond-like glass or carbon layers with polymer layers. Another multilayer includes alternating polymer layers using different types of polymers. The barrier layers can be used to mount, cover, encapsulate or form composite assemblies for protection of moisture or oxygen sensitive articles

公开(公告)号：US20090126404A1

公开(公告)日：2009-05-21

申请号：US12354950

申请日：2009-01-16

Applicant: Vinay G. Sakhrani ,  Charles Tomasino

Inventor： Vinay G. Sakhrani ,  Charles Tomasino

IPC: C03C17/245

CPC classification number: C03C17/3405 ,  A61M5/178 ,  B05D1/62 ,  B05D5/083 ,  B05D2203/35 ,  B05D2259/00 ,  C03C2217/75 ,  C03C2218/32 ,  C10M177/00 ,  C10M2229/0415 ,  C10N2240/66 ,  C10N2270/00

Abstract: One embodiment comprises a method for increasing the hydrophobic characteristics of a surface. A coupling agent is applied to the surface, and the surface is subsequently exposed to a first ionizing gas plasma at about atmospheric pressure for a predetermined period of time. The ionizing gas plasma may be formed from a mixture of a carrier gas and a reactive gas. The reactive gas may be comprised of one or more hydrocarbon compound such as an alkane, an alkene, and an alkyne. Alternatively, the reactive gas may be a fluorocarbon or organometallic compound. A lubricant may then be applied to the surface, followed by exposure to second ionizing gas plasma.

Abstract translation: 一个实施方案包括增加表面的疏水特性的方法。 将偶联剂施加到表面上，然后将表面暴露于约大气压下的第一电离气体等离子体预定的时间。 电离气体等离子体可以由载气和反应性气体的混合物形成。 反应气体可以由一种或多种烃化合物如烷烃，烯烃和炔烃组成。 或者，反应性气体可以是氟碳化合物或有机金属化合物。 然后将润滑剂施加到表面，随后暴露于第二电离气体等离子体。

公开(公告)号：US20090123664A1

公开(公告)日：2009-05-14

申请号：US12353544

申请日：2009-01-14

Applicant: Nobou AOI

Inventor： Nobou AOI

IPC: B01J19/08

CPC classification number: H01L21/31633 ,  B05D1/62 ,  C23C16/401 ,  C23C16/509 ,  H01L21/02126 ,  H01L21/02211 ,  H01L21/02216 ,  H01L21/02274 ,  H01L21/76829 ,  H01L23/5329 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An interlayer insulating film formation method for forming an interlayer insulating film on a substrate includes the step of forming the interlayer insulating film through plasma CVD by using an organic silicon compound including no oxygen atom and an organic silicon compound including an oxygen atom as materials.

Abstract translation: 在衬底上形成层间绝缘膜的层间绝缘膜形成方法包括通过使用不含氧原子的有机硅化合物和包含氧原子的有机硅化合物作为材料，通过等离子体CVD形成层间绝缘膜的步骤。

公开(公告)号：US20090068852A1

公开(公告)日：2009-03-12

申请号：US11853273

申请日：2007-09-11

Applicant: Yoshinori MORISADA ,  Nobuo MATSUKI ,  Kamal Kishore GOUNDAR

Inventor： Yoshinori MORISADA ,  Nobuo MATSUKI ,  Kamal Kishore GOUNDAR

IPC: H01L21/31

CPC classification number: H01L21/0337 ,  B05D1/62 ,  H01L21/02118 ,  H01L21/02205 ,  H01L21/02274 ,  H01L21/0332 ,  H01L21/3146

Abstract: A method forms a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (CαHβXγ, wherein α and β are natural numbers of 5 or more; γ is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C.; introducing the vaporized gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas. The liquid monomer is unsaturated and has no benzene structure.

Abstract translation: 一种方法通过电容耦合等离子体CVD装置在半导体衬底上形成含烃聚合物膜。 该方法包括以下步骤：使沸点为约1的含烃液体单体（其中α和β为5或更多的天然数;γ为包括零的整数; X为O，N或F）的烃类液体单体 20℃至约350℃。 将蒸发的气体引入其中放置基板的CVD反应室中; 并通过气体的等离子体聚合在基板上形成含烃聚合物膜。 液体单体是不饱和的，没有苯结构。

公开(公告)号：US20090068375A1

公开(公告)日：2009-03-12

申请号：US12206005

申请日：2008-09-08

Applicant: Peter DOBBYN ,  Liam O'Neill

Inventor： Peter DOBBYN ,  Liam O'Neill

IPC: C08J7/18 ,  H05H1/24

CPC classification number: H05H1/46 ,  B05D1/62 ,  B05D5/08 ,  B05D5/083 ,  B05D2202/00 ,  B05D2202/10 ,  C23C4/134 ,  H05H1/2406 ,  H05H2001/2412 ,  H05H2001/245 ,  H05H2001/4692

Abstract: A process for plasma coating a surface in which an atomized surface treatment agent is incorporated in a non-equilibrium atmospheric pressure plasma generated in a noble process gas and the surface to be treated is placed in contact with the atmospheric pressure plasma containing the atomized surface treatment agent, characterized in that particle content of the coating formed on the surface is reduced by incorporating a minor proportion of nitrogen in the process gas.

Abstract translation: 将在惰性处理气体和被处理表面中产生的非平衡大气压等离子体中并入雾化表面处理剂的表面等离子体涂覆的处理与包含雾化表面处理的大气压等离子体接触 其特征在于，通过在工艺气体中加入少量氮气来减少在表面上形成的涂层的颗粒含量。

公开(公告)号：US20090053526A1

公开(公告)日：2009-02-26

申请号：US11574048

申请日：2005-08-30

Applicant: Hiroaki Arita ,  Toshio Tsuji ,  Chikao Mamiya ,  Kazuhiro Fukuda

Inventor： Hiroaki Arita ,  Toshio Tsuji ,  Chikao Mamiya ,  Kazuhiro Fukuda

IPC: B32B27/00 ,  C23C16/513

CPC classification number: C23C16/505 ,  B05D1/62 ,  B05D7/58 ,  B05D2201/02 ,  B05D2252/02 ,  B05D2701/30 ,  B32B27/00 ,  Y10T428/31504 ,  Y10T428/31667

Abstract: A gas barrier laminate comprising a substrate having thereon at least a gas barrier layer and a polymer layer, wherein at least one polymer layer is provided adjacent to at least one gas barrier layer; and an average carbon content of the polymer layer at a contact interface between the gas barrier layer is lower than an average carbon content in the polymer layer.

Abstract translation: 一种阻气性层压体，包括其上至少具有阻气层和聚合物层的基底，其中至少一个聚合物层邻近至少一个阻气层设置; 并且在阻气层之间的接触界面处的聚合物层的平均碳含量低于聚合物层中的平均碳含量。

公开(公告)号：US07470633B2

公开(公告)日：2008-12-30

申请号：US11524037

申请日：2006-09-20

Applicant: Nobuo Matsuki ,  Yoshinori Morisada ,  Seijiro Umemoto ,  Jea Sik Lee

Inventor： Nobuo Matsuki ,  Yoshinori Morisada ,  Seijiro Umemoto ,  Jea Sik Lee

IPC: H01L21/31

CPC classification number: H01L21/02118 ,  B05D1/62 ,  G03F7/167 ,  H01L21/02274 ,  H01L21/0332 ,  H01L21/3127 ,  H01L21/3146

Abstract: A method forms a hydrocarbon-containing polymer film on a semiconductor substrate by a capacitively-coupled plasma CVD apparatus. The method includes the steps of: vaporizing a hydrocarbon-containing liquid monomer (CαHβXγ, wherein α and β are natural numbers of 5 or more; γ is an integer including zero; X is O, N or F) having a boiling point of about 20° C. to about 350° C.; introducing the vaporized gas into a CVD reaction chamber inside which a substrate is placed; and forming a hydrocarbon-containing polymer film on the substrate by plasma polymerization of the gas.

Abstract translation: 一种方法通过电容耦合等离子体CVD装置在半导体衬底上形成含烃聚合物膜。 该方法包括以下步骤：使沸点为约1的含烃液体单体（其中α和β为5或更多的天然数;γ为包括零的整数; X为O，N或F）的烃类液体单体 20℃至约350℃。 将蒸发的气体引入其中放置基板的CVD反应室中; 并通过气体的等离子体聚合在基板上形成含烃聚合物膜。