Abstract:
In order to provide a quartz glass crucible distinguished by high purity, high opacity and/or low transmissibility in the IR spectrum, it is proposed on the basis of a known quartz glass crucible of opaque quartz glass with a crucible body symmetrical in relation to a rotational axis, an outer zone (3) of opaque quartz glass transitioning radially toward the inside into an inner zone (2) of transparent quartz glass and with a density of at least 2.15 g/cm3, that according to the invention, the crucible body (1) be made of a synthetic SiO2 granulate with a specific BET surface ranging from 0.5 m2/g to 40 m2/g, a tamped volume of at least 0.8 g/cm3 and produced from at least partially porous agglomerates of SiO2 primary particles. A process for producing a quartz glass crucible of this kind is distinguished according to the invention in that for the production of the crucible a SiO2 granulate is used which was formed from at least partially porous agglomerates of synthetically manufactured SiO2 primary particles and that it has a specific BET surface ranging from 0.5 m2/g to 40 m2/g and a tamped volume of at least 0.8 g/cm3, the heating effected in such a way that a vitrification front advances from the inside outward while an inner zone (4) of transparent quartz glass is being formed.
Abstract translation:为了提供在IR光谱中具有高纯度,高不透明性和/或低透射率的石英玻璃坩埚,提出了在已知的不透明石英玻璃的石英玻璃坩埚的基础上,坩埚体相对于 旋转轴线,不透明石英玻璃的外部区域(3),径向朝向内部转变成透明石英玻璃的内部区域(2),密度为至少2.15g / cm 3,根据本发明,坩埚体 (1)由具有0.5m 2 / g至40m 2 / g的比BET表面的合成SiO 2颗粒制成,捣实体积至少为0.8g / cm 3并由SiO 2一次颗粒的至少部分多孔的附聚物制成。 根据本发明,制造这种石英玻璃坩埚的方法的不同之处在于,对于坩埚的制造,使用由至少部分多孔的合成SiO 2原生颗粒的聚集体形成的SiO 2颗粒,并且其具有 比表面积为0.5m2 / g〜40m2 / g,捣实体积为0.8g / cm 3以上,使玻璃化前沿从内侧向前方前进,同时将内部区域(4) 正在形成透明的石英玻璃。
Abstract:
An improved sol-gel process is disclosed for producing a synthetic silica glass article, in which a sol is formed having a silica loading as high as 34 to 40%. This high loading is achieved by introducing an aqueous colloidal silica suspension into a silicon alkoxide solution and slowly stirring the mixture together, during which time the mixture hydrolyzes and the colloidal suspension is broken down by chemical reaction. This produces a hydrolyzed sol incorporating a suspension of very fine aggregates of colloidal particles, having particle sizes less than about 10 microns. The need for a stabilizing agent and/or continuous ultra-sonicating or violently stirring the sol is eliminated.
Abstract:
In a known process for the production of opaque quartz glass a blank is formed from synthetic SiO2 granulate and is heated at a vitrification temperature to form a body of opaque quartz glass. In order to provide on this basis a process for the production of pure opaque quartz glass with a homogenous pore distribution, high density, high viscosity and a low tendency to devitrify, it is proposed according to the invention that the SiO2 granulate to be used is a SiO2 granulate (21; 31) composed of at least partially porous agglomerates of SiO2 primary particles, with a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.8 g/cm3. A SiO2 granulate (21; 31) suitable for the implementation of the process is distinguished in that it is formed from at least partially porous agglomerates of SiO2 primary particles and in that it has a specific BET surface ranging from 1.5 m2/g to 40 m2/g and an apparent density of at least 0.6 g/cm3.
Abstract:
Fused silica stepper lens for photolithographic application are disclosed which are resistant to laser-induced damage, specifically, compaction or densification which can lead to an increase in the optical path length of the lens. The figure compares the phase front distortions of a standard fused silica with the phase front distortions observed in two inventive stepper lens fused silica.
Abstract:
A method for producing a high purity synthetic quartz powder, characterized by using a tetramethoxysilane having a trimethoxymethylsilane content of at most 0.3 wt %, and converting it to a synthetic quartz by a sol-gel method.
Abstract:
A method of producing a fused silica glass by thermally converting a polymethylsiloxane precursor, the lens transmitting ultraviolet radiation at wavelengths below 300 nm. without undergoing a marked absorption transition, the lens so produced, and a microlithography system employing a lens of such glass.
Abstract:
Cristobalite-containing silica glass is provided wherein .alpha.-cristobalite in the shape of a small sphere or a small, round-edged or sharp-edged, three-dimensional region is dispersed in the silica glass matrix. The diameter of each .alpha.-cristobalite sphere or region is, in the range of 0.1 um to 1000 um, and the content of the .alpha.-cristobalite is at least 10 wt. %. The cristobalite-containing silica glass is produced by heating a mixture of two kinds or more of crystalline silicon dioxide powder with melting points different from each other by 20.degree. C. or more. The mixture contains silicon dioxide having the highest melting point in the range of 10 wt. % to 80 Wt. % and is heated at temperatures ranging from the lowest melting point to a temperature lower than the highest melting point.
Abstract:
A process for producing opaque silica glass in which a quartz raw material grain having a particle size of 10 to 350 .mu.m is filled into a heat resistant mold, the quartz raw material grain is heated in a non-oxidizing atmosphere from a room temperature up to a temperature lower by 50.degree. to 150.degree. C. than a temperature at which the above raw material grain is melted at a temperature-increase speed not exceeding 50.degree. C./minute, then, slowly heated up to a temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted at the speed of 10.degree. C./minute or less, and the heated quartz raw material grain is further maintained at the temperature higher by 10.degree. to 80.degree. C. than the temperature at which the quartz raw material grain is melted, followed by cooling down to the room temperature. Especially, in the case of producing a large scale opaque silica glass block, a quartz raw material grain filled into a heat-resistant mold is heated by a belt-like heating source located perpendicularly to a trunk of a filling layer of the quartz raw material grain so as to form a moving heating zone in the filling layer and the heating zone is successively moved either upwardly starting at the lower end portion of the filling layer or downwardly starting at the upper end portion thereof in a non-oxidizing atomosphere.
Abstract:
An improved sol-gel process for fabricating large, crack-free gel monoliths (e.g., of silica) is described in which a specially-tailored gel microstructure is provided by adjusting the relative concentrations of an alcohol diluent (e.g., ethanol) and/or one or more catalysts (e.g., HCl and HF). Controlled variations in the gel's average pore radius, bulk density, rupture modulus, and elastic modulus over a wide range can be tailored in this fashion. This enables the process to be optimized for the particular application involved.
Abstract:
A process for making non-porous, dense, silica partices having a diameter of about 3 to 1000 microns, a nitrogen B.E.T. surface area less than about 1 m.sup.2 /g, a total impurity content of less than about 50 ppm and a metal impurity content content of less than about 15 ppm from an aqueous dispersion of fumed silica. The particles are converted into porous particles and sintered in an atmosphere having a water partial pressure of from about 0.2 to about 0.8 atmosphere for temperatures below about 1200.degree. C.