公开(公告)号：US20160245748A1

公开(公告)日：2016-08-25

申请号：US14630489

申请日：2015-02-24

Applicant: Tokitae LLC

Inventor： David Gasperino ,  Matthew P. Horning ,  Kevin Paul Flood Nichols ,  Phil Rutschman ,  Benjamin K. Wilson ,  Ozgur Emek Yildirim

IPC: G01N21/63 ,  G01N33/543

CPC classification number: G01N21/63 ,  G01N21/171 ,  G01N33/54373 ,  G01N2021/1714 ,  G01N2201/0697

Abstract: Embodiments disclosed herein are directed to photothermal spectroscopy apparatuses and systems for offset synchronous testing of flow assays. Methods of using and operating such photothermal spectroscopy systems are also disclosed.

Abstract translation: 本文公开的实施例涉及用于流动测定的偏移同步测试的光热分析装置和系统。 还公开了使用和操作这种光热光谱系统的方法。

公开(公告)号：US20160223470A1

公开(公告)日：2016-08-04

申请号：US15093130

申请日：2016-04-07

Applicant: Rudolph Technologies, Inc.

Inventor： Jeffrey L. O'Dell ,  Thomas Verburgt ,  Mark Harless ,  Cory Watkins

IPC: G01N21/95 ,  G06T7/00 ,  H04N5/225 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/8803 ,  G01N21/8806 ,  G01N2021/8838 ,  G01N2201/06113 ,  G01N2201/0696 ,  G01N2201/0697 ,  G01N2201/12 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L21/67242 ,  H01L21/67271 ,  H01L21/67288 ,  H01L22/12 ,  H01L2924/0002 ,  H04N5/2256 ,  H01L2924/00

Abstract: An automated defect inspection system has been invented and is used on patterned wafers, whole wafers, broken wafers, partial wafers, sawn wafers such as on film frames, JEDEC trays, Auer boats, die in gel or waffle packs, MCMs, etc., and is specifically intended and designed for second optical wafer inspection for such defects as metalization defects (such as scratches, voids, corrosion, and bridging), diffusion defects, passivation layer defects, scribing defects, glassivation defects, chips and cracks from sawing, solder bump defects, and bond pad area defects.

Abstract translation: 已经发明了一种自动化缺陷检查系统，并且用于图案化晶片，整个晶片，破碎的晶片，部分晶片，锯状晶片，例如胶片框架，JEDEC托盘，Auer船，凝胶或华夫饼包，MCM等中， 并且专门用于第二光学晶片检查，例如金属化缺陷（例如划痕，空隙，腐蚀和桥接），扩散缺陷，钝化层缺陷，划线缺陷，玻璃化缺陷，切屑和锯切裂纹等缺陷 凸起缺陷和焊盘区域缺陷。

公开(公告)号：US20160223462A1

公开(公告)日：2016-08-04

申请号：US14917452

申请日：2014-09-10

Applicant: KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD.)

Inventor： Kazushi HAYASHI ,  Tomoya KISHI

IPC: G01N21/64 ,  G01N22/00

CPC classification number: G01N21/6489 ,  G01N22/00 ,  G01N2201/06113 ,  G01N2201/0697 ,  H01L22/12

Abstract: An evaluation device for an oxide semiconductor thin film includes a first excitation light irradiation unit configured to irradiate a measurement region of a sample with first excitation light and to generate an electron-hole pair, an electromagnetic wave irradiation unit configured to irradiate with electromagnetic wave, a reflecting electromagnetic wave intensity detection unit configured to detect intensity of a reflected electromagnetic wave, a second excitation light irradiation unit configured to irradiate the sample with second excitation light and to generate photoluminescence light, an emission intensity measurement unit configured to measure emission intensity of the photoluminescence light, and an evaluation unit configured to evaluate mobility and stress stability. The first excitation light irradiation unit and the second excitation light irradiation unit are the same or different excitation light radiation units.

Abstract translation: 用于氧化物半导体薄膜的评估装置包括：第一激发光照射单元，被配置为用第一激发光照射样品的测量区域并产生电子 - 空穴对;电磁波照射单元，被配置为用电磁波照射， 反射电磁波强度检测单元，被配置为检测反射电磁波的强度;第二激发光照射单元，被配置为用第二激发光照射样品并产生光致发光;发射强度测量单元，被配置为测量 光致发光灯和评估单元，其被配置为评估移动性和应力稳定性。 第一激发光照射单元和第二激发光照射单元是相同或不同的激发光辐射单元。

公开(公告)号：US20160209388A1

公开(公告)日：2016-07-21

申请号：US15001238

申请日：2016-01-20

Applicant: The Texas A&M University System

Inventor： Vladislav Victorovich Yakovlev ,  Edward S. Fry ,  John David Mason ,  Joel Nathan Bixler ,  Michael Thomas Cone ,  Brett Harrison Hokr

IPC: G01N33/18 ,  G01N21/64 ,  G01N21/65 ,  G01N21/47

CPC classification number: G01N33/1826 ,  G01N21/39 ,  G01N21/645 ,  G01N2021/6469 ,  G01N2201/065 ,  G01N2201/0697

Abstract: Disclosed is a high reflectivity integrating cavity and device to amplify and detect luminescent emissions produced by small concentrations of materials to be analyzed. Femto or nano molar concentrations of a material can be placed within the high reflectivity integrating cavity. At least the interior surface of the high reflectivity integrating cavity can comprise a coating that, at a designated wavelength of electromagnetic radiation, is transparent and non-absorbing to such designated wavelengths of electromagnetic radiation. In addition to the isotropic field induced by the interior surface of the high reflectivity integrating cavity, the high reflectivity of the interior surface of the high reflectivity integrating cavity leads to very large effective optical path lengths within the interior of the high reflectivity integrating cavity, thereby amplifying the luminescent emissions produced by the sample.

Abstract translation: 公开了集成腔和器件的高反射率，以放大和检测由待分析的小量材料产生的发光发射。 毫微米或毫摩尔浓度的材料可以放置在高反射率积分腔内。 至少高反射率积分腔的内表面可以包括在电磁辐射的指定波长处是透明的并且不吸收到这种指定波长的电磁辐射的涂层。 除了由高反射率积分腔的内表面引起的各向同性场外，高反射率积分腔的内表面的高反射率导致在高反射率积分腔的内部内的非常大的有效光程长度，从而 放大样品产生的发光发射。

公开(公告)号：US09377358B2

公开(公告)日：2016-06-28

申请号：US14792252

申请日：2015-07-06

Applicant: EMX International, Inc.

Inventor： Daniel Lee Graybeal ,  Alan Carey Rogers ,  Andrey Muraviev

IPC: G01J5/02 ,  G01J3/10 ,  G01J3/42 ,  G01J3/02 ,  G01N21/3504 ,  G01N21/39

CPC classification number: G01J3/10 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0218 ,  G01J3/0245 ,  G01J3/108 ,  G01J3/42 ,  G01N21/3504 ,  G01N21/39 ,  G01N2021/399 ,  G01N2201/06113 ,  G01N2201/0612 ,  G01N2201/0691 ,  G01N2201/0697 ,  G01N2201/08 ,  H01S5/3401

Abstract: An intracavity laser absorption infrared spectroscopy system for detecting trace analytes in vapor samples. The system uses a spectrometer in communications with control electronics, wherein the control electronics contain an analyte database that contains absorption profiles for each analyte the system is used to detect. The system can not only detect the presence of specific analytes, but identify them as well. The spectrometer uses a hollow cavity waveguide that creates a continuous loop inside of the device, thus creating a large path length and eliminating the need to mechanically adjust the path length to achieve a high Q-factor. In a preferred embodiment, the laser source may serve as the detector, thus eliminating the need for a separate detector.

公开(公告)号：US20160161400A1

公开(公告)日：2016-06-09

申请号：US14961872

申请日：2015-12-07

Applicant: EMX International, LLC

Inventor： Daniel Lee Graybeal ,  Alan Carey Rogers ,  Andrey Muraview

IPC: G01N21/3504 ,  H01S5/34 ,  G01N21/39

CPC classification number: G01J3/10 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/0218 ,  G01J3/0245 ,  G01J3/108 ,  G01J3/42 ,  G01N21/3504 ,  G01N21/39 ,  G01N2021/399 ,  G01N2201/06113 ,  G01N2201/0612 ,  G01N2201/0691 ,  G01N2201/0697 ,  G01N2201/08 ,  H01S5/3401

Abstract: An intracavity laser absorption infrared spectroscopy system for detecting trace analytes in vapor samples. The system uses a spectrometer in communications with control electronics, wherein the control electronics contain an analyte database that contains absorption profiles for each analyte the system is used to detect. The system can not only detect the presence of specific analytes, but identify them as well. The spectrometer uses a hollow cavity waveguide that creates a continuous loop inside of the device, thus creating a large path length and eliminating the need to mechanically adjust the path length to achieve a high Q-factor. In a preferred embodiment, the laser source may serve as the detector, thus eliminating the need for a separate detector.

公开(公告)号：US09337071B2

公开(公告)日：2016-05-10

申请号：US12789829

申请日：2010-05-28

Applicant: Jeffrey L. O'Dell ,  Thomas Verburgt ,  Mark Harless ,  Cory Watkins

Inventor： Jeffrey L. O'Dell ,  Thomas Verburgt ,  Mark Harless ,  Cory Watkins

IPC: G06K9/00 ,  H01L21/67 ,  G01N21/95 ,  H01L21/66

CPC classification number: G01N21/9501 ,  G01N21/8803 ,  G01N21/8806 ,  G01N2021/8838 ,  G01N2201/06113 ,  G01N2201/0696 ,  G01N2201/0697 ,  G01N2201/12 ,  G06T7/0004 ,  G06T2207/30148 ,  H01L21/67242 ,  H01L21/67271 ,  H01L21/67288 ,  H01L22/12 ,  H01L2924/0002 ,  H04N5/2256 ,  H01L2924/00

Abstract: An automated defect inspection system has been invented and is used on patterned wafers, whole wafers, broken wafers, partial wafers, sawn wafers such as on film frames, JEDEC trays, Auer boats, die in gel or waffle packs, MCMs, etc., and is specifically intended and designed for second optical wafer inspection for such defects as metalization defects (such as scratches, voids, corrosion, and bridging), diffusion defects, passivation layer defects, scribing defects, glassivation defects, chips and cracks from sawing, solder bump defects, and bond pad area defects.

公开(公告)号：US09243603B2

公开(公告)日：2016-01-26

申请号：US14152851

申请日：2014-01-10

Applicant: Ford Global Technologies, LLC

Inventor： Douglas Raymond Martin ,  Kenneth James Miller

IPC: G01N21/00 ,  F02P23/04 ,  G01M15/06 ,  G01S17/06 ,  G01S17/10 ,  G01S17/88 ,  F02D41/00 ,  F02D41/22 ,  F02D35/02 ,  G01S7/497

CPC classification number: F02P23/04 ,  F02D35/022 ,  F02D41/009 ,  F02D41/22 ,  F02P17/00 ,  G01M15/06 ,  G01N2201/06113 ,  G01N2201/0697 ,  G01S7/497 ,  G01S17/06 ,  G01S17/10 ,  G01S17/88 ,  Y02T10/40

Abstract: Methods and systems are provided for using an engine laser ignition system to perform a visual inspection of an engine and diagnose various cylinder components and conditions based on engine positional measurements. Laser pulses may be emitted at a lower power level during an intake and/or exhaust stroke to illuminate a cylinder interior while a photodetector captures images of the cylinder interior. Additionally, laser pulses may be emitted at a higher power level to initiate cylinder combustion while the photodetector captures images of the cylinder interior using the light generated during cylinder combustion.

公开(公告)号：US20150343443A1

公开(公告)日：2015-12-03

申请号：US14803594

申请日：2015-07-20

Applicant: OPKO Diagnostics, LLC

Inventor： Vincent Linder ,  David Steinmiller

IPC: B01L3/00 ,  G01N21/59

CPC classification number: B01L3/502746 ,  B01L3/5027 ,  B01L3/502715 ,  B01L3/50273 ,  B01L3/502738 ,  B01L7/52 ,  B01L2200/025 ,  B01L2200/026 ,  B01L2200/027 ,  B01L2200/028 ,  B01L2200/0673 ,  B01L2200/0684 ,  B01L2200/143 ,  B01L2200/146 ,  B01L2200/147 ,  B01L2300/021 ,  B01L2300/023 ,  B01L2300/027 ,  B01L2300/04 ,  B01L2300/0654 ,  B01L2300/0816 ,  B01L2300/0867 ,  B01L2300/12 ,  B01L2300/14 ,  B01L2300/16 ,  B01L2300/168 ,  B01L2300/1827 ,  B01L2300/1894 ,  B01L2400/0475 ,  B01L2400/049 ,  B01L2400/0666 ,  B01L2400/082 ,  G01N21/05 ,  G01N21/59 ,  G01N21/64 ,  G01N21/76 ,  G01N33/54313 ,  G01N33/54366 ,  G01N33/57434 ,  G01N2201/02 ,  G01N2201/0612 ,  G01N2201/062 ,  G01N2201/0621 ,  G01N2201/0697 ,  G01N2333/96433 ,  Y10T137/0324 ,  Y10T436/12

Abstract: Systems and methods for controlling fluids in microfluidic systems are generally described. In some embodiments, control of fluids involves the use of feedback from one or more processes or events taking place in the microfluidic system. For instance, a detector may detect one or more fluids at a measurement zone of a microfluidic system and one or more signals, or a pattern of signals, may be generated corresponding to the fluid(s). In some cases, the signal or pattern of signals may correspond to an intensity, a duration, a position in time relative to a second position in time or relative to another process, and/or an average time period between events. Using this data, a control system may determine whether to modulate subsequent fluid flow in the microfluidic system. In some embodiments, these and other methods can be used to conduct quality control to determine abnormalities in operation of the microfluidic system.

Abstract translation: 通常描述用于控制微流体系统中的流体的系统和方法。 在一些实施例中，流体的控制涉及使用来自在微流体系统中发生的一个或多个过程或事件的反馈。 例如，检测器可以在微流体系统的测量区域处检测一种或多种流体，并且可以对应于流体产生一个或多个信号或信号模式。 在某些情况下，信号的信号或图案可以对应于强度，持续时间，时间上相对于第二位置在时间上或相对于另一进程的时间位置，和/或事件之间的平均时间段。 使用该数据，控制系统可以确定是否调制微流体系统中随后的流体流动。 在一些实施方案中，这些和其它方法可用于进行质量控制以确定微流体系统的操作异常。

公开(公告)号：US09194795B2

公开(公告)日：2015-11-24

申请号：US14551230

申请日：2014-11-24

Applicant: Hitachi High-Technologies Corporation

Inventor： Kei Shimura

IPC: G01J1/42 ,  G01N21/33 ,  G01N21/95 ,  G01N21/956 ,  G01N21/94 ,  G01N21/47

CPC classification number: G01N21/33 ,  G01N21/47 ,  G01N21/94 ,  G01N21/95 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95684 ,  G01N2201/06113 ,  G01N2201/0697

Abstract: Method for realizing an inspection with short wavelength, high power light source and large numerical aperture, high performance optics to improve defect inspection sensitivity is disclosed. Short wavelength high power laser is realized by using a pulse oscillation type laser suitable for generation of high output power in a short-wavelength region. In addition, a spectral bandwidth of the laser is narrowed down so that amount of chromatic aberration of detection optics with single glass material (i.e. without compensation of chromatic aberration) is lowered to permissible level. Using highly workable glass material to construct the detection optics enables necessary surface accuracy or profile irregularity conditions to be met, even if the number of lenses is increased for large NA or the lens doesn't have a rotationally symmetrical aperture.

Abstract translation: 公开了实现短波长，高功率光源和大数值孔径检测的方法，提高了高性能光学元件的缺陷检测灵敏度。 通过使用适合于在短波长区域中产生高输出功率的脉冲振荡型激光器来实现短波长大功率激光器。 此外，激光器的光谱带宽变窄，使得具有单一玻璃材料的检测光学器件（即，没有色差的补偿）的色差量降低到允许的水平。 使用高度可加工的玻璃材料来构造检测光学元件，即使对于大NA而言镜片的数量增加或透镜不具有旋转对称的孔径，也能够实现所需的表面精度或轮廓不规则条件。