公开(公告)号：US20160049291A1

公开(公告)日：2016-02-18

申请号：US14459644

申请日：2014-08-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sam Hyung Sam KIM ,  Andrei Teodor IANCU ,  Friedrich B. PRINZ ,  Michael C. LANGSTON ,  Peter SCHINDLER ,  Ki-Hyun KIM ,  Stephen P. WALCH ,  Takane USUI

IPC: H01L21/02

CPC classification number: H01J37/00 ,  C23C16/45536 ,  H01J37/321 ,  H01J37/32183 ,  H01J37/32339 ,  H01J37/32357 ,  H01L21/02274 ,  H01L21/02277 ,  H01L21/0228 ,  H01L21/76224 ,  H01L21/76831 ,  H01L21/76898

Abstract: Provided is a method of forming a thin film of a semiconductor device. The method includes forming a precursor layer on a surface of a substrate by supplying a precursor gas into a chamber, discharging the precursor gas remaining in the chamber to an outside of the chamber by supplying a purge gas into the chamber, supplying a reactant gas into the chamber, generating plasma based on the reactant gas, forming a thin film by a chemical reaction between plasma and the precursor layer and radiating extreme ultraviolet (EUV) light into the chamber, and discharging the reactant gas and the plasma remaining in the chamber by supplying a purge gas into the chamber.

Abstract translation: 提供了形成半导体器件的薄膜的方法。 该方法包括通过将前体气体供应到室中在基板的表面上形成前体层，通过向室内供给吹扫气体将残留在室中的前体气体排出到室中，将反应气体供应到 该腔室基于反应气体产生等离子体，通过等离子体和前体层之间的化学反应形成薄膜，并将极紫外（EUV）光放射到室中，并通过以下步骤排出反应气体和留在腔室中的等离子体 将净化气体供应到室中。

公开(公告)号：US20150368580A1

公开(公告)日：2015-12-24

申请号：US14831630

申请日：2015-08-20

Applicant: Jackson Thornton ,  Vinay G. Sakhrani ,  Charles Tomasino ,  Robert A. Mineo

Inventor： Jackson Thornton ,  Vinay G. Sakhrani ,  Charles Tomasino ,  Robert A. Mineo

IPC: C10M107/50 ,  C10M107/38

CPC classification number: C10M107/50 ,  A61M5/3129 ,  A61M5/31513 ,  A61M2005/3131 ,  C10M107/38 ,  C10M147/04 ,  C10M155/02 ,  C10M177/00 ,  C10M2213/0606 ,  C10M2229/0405 ,  C10M2229/0415 ,  C10N2230/06 ,  C10N2240/66 ,  C10N2280/00 ,  H01J37/00 ,  H01J37/321 ,  H01J37/32192 ,  H05H2001/466 ,  H05H2001/4667

Abstract: The present application is directed to methods and devices for altering material properties of lubricants and other cross-linkable compounds comprising organic or organometallic materials through exposure to energized gaseous species. The energized gaseous species may create reactive sites among lubricant molecules that may alter their material properties by cross-linking at least a portion of the lubricant molecules. The cross-linked lubricant may reduce the ability of the lubricant to migrate away when force is applied between lubricated sliding friction surfaces.

Abstract translation: 本申请涉及用于通过暴露于通电的气态物质来改变润滑剂和包括有机或有机金属材料的其它可交联化合物的材料性质的方法和装置。 激发的气态物质可以在润滑剂分子之间产生可能通过交联至少一部分润滑剂分子来改变其材料性质的反应性位点。 当在润滑的滑动摩擦表面之间施加力时，交联润滑剂可以降低润滑剂迁移的能力。

公开(公告)号：US09147377B2

公开(公告)日：2015-09-29

申请号：US13956267

申请日：2013-07-31

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Cheng-Hung Chen ,  Shy-Jay Shin ,  Jaw-Jung Shin ,  Burn Jeng Lin

IPC: G09G5/02

CPC classification number: G09G5/02 ,  G03F7/70383 ,  G03F7/70558 ,  G06F7/70 ,  H01J37/00 ,  H01J37/3174 ,  H01J37/3178

Abstract: The present disclosure provides a method for image dithering. The method includes providing a polygon related to an integrated circuit (IC) layout design in a graphic database system (GDS) grid; converting the polygon to an intensity map in the GDS grid, the intensity map including a group of partial pixels and a group of full pixels; performing a first quantization process to a partial pixel to determine a first error; applying the first error to one or more full pixels; performing a second quantization process to a full pixel to determine a second error; and distributing the second error to one or more full pixels. The partial pixels correspond to pixels partially covered by the polygon, and the full pixels correspond to pixels fully covered by the polygon.

Abstract translation: 本公开提供了一种用于图像抖动的方法。 该方法包括在图形数据库系统（GDS）网格中提供与集成电路（IC）布局设计有关的多边形; 将所述多边形转换成所述GDS网格中的强度图，所述强度图包括一组部分像素和一组全像素; 对部分像素执行第一量化处理以确定第一误差; 将第一误差应用于一个或多个完整像素; 对全像素执行第二量化处理以确定第二误差; 并将第二个错误分配给一个或多个完整像素。 部分像素对应于由多边形部分地覆盖的像素，并且全像素对应于由多边形完全覆盖的像素。

公开(公告)号：US09064674B2

公开(公告)日：2015-06-23

申请号：US14277191

申请日：2014-05-14

Applicant: Purdue Research Foundation

Inventor： Zheng Ouyang ,  Jason David Harper ,  Nicholas Alan Charipar ,  Robert Graham Cooks

IPC: H01J49/26 ,  H01J37/32 ,  H01J37/00 ,  H05H1/24 ,  H05H1/30 ,  H01J49/10 ,  H01J49/14 ,  H01J27/02 ,  H01J49/02

CPC classification number: H01J37/32009 ,  H01J27/022 ,  H01J37/00 ,  H01J37/32348 ,  H01J49/02 ,  H01J49/105 ,  H01J49/142 ,  H01J2237/0044 ,  H05H1/24 ,  H05H1/2406 ,  H05H1/30 ,  H05H2001/2412 ,  H05H2001/2443 ,  H05H2240/10 ,  H05H2240/20 ,  Y10T436/145555 ,  Y10T436/147777 ,  Y10T436/173076 ,  Y10T436/203332 ,  Y10T436/24

Abstract: The present invention generally relates to a low temperature plasma probe for desorbing and ionizing at least one analyte in a sample material and methods of use thereof. In one embodiment, the invention generally relates to a low temperature plasma probe including: a housing having a discharge gas inlet port, a probe tip, two electrodes, and a dielectric barrier, in which the two electrodes are separated by the dielectric barrier, in which application of voltage from a power supply generates a low temperature plasma, and in which the low temperature plasma is propelled out of the discharge region by the electric field and/or the discharge gas flow.

Abstract translation: 本发明一般涉及用于解吸和电离样品中至少一种分析物的低温等离子体探针及其使用方法。 在一个实施方案中，本发明一般涉及一种低温等离子体探针，其包括：壳体，其具有放电气体入口端口，探针尖端，两个电极和介电屏障，其中两个电极由电介质屏障隔开， 来自电源的电压的施加产生低温等离子体，其中通过电场和/或放电气体流将低温等离子体推出排出区域。

公开(公告)号：US09001308B2

公开(公告)日：2015-04-07

申请号：US13757477

申请日：2013-02-01

Applicant: Chen-Hua Yu ,  Tien-I Bao ,  Chih Wei Lu ,  Jaw-Jung Shin ,  Shy-Jay Lin ,  Burn Jeng Lin

Inventor： Chen-Hua Yu ,  Tien-I Bao ,  Chih Wei Lu ,  Jaw-Jung Shin ,  Shy-Jay Lin ,  Burn Jeng Lin

IPC: G03F7/20

CPC classification number: G03F7/702 ,  H01J37/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/31789

Abstract: A pattern generator includes a minor array plate having a mirror, at least one electrode plate disposed over the minor array plate, a lens let disposed over the minor, and at least one insulator layer sandwiched between the mirror array plate and the electrode plate. The electrode plate includes a first conducting layer and a second conducting layer. The lens let has a non-straight sidewall formed in the electrode plate. The pattern generator further includes at least one insulator sandwiched between two electrode plates. The non-straight sidewall can be a U-shaped sidewall or an L-shaped sidewall.

Abstract translation: 图案发生器包括具有反射镜的次阵列板，设置在次阵列板上的至少一个电极板，设置在副镜上的透镜，以及夹在反射镜阵列板和电极板之间的至少一个绝缘体层。 电极板包括第一导电层和第二导电层。 透镜让具有形成在电极板中的非直的侧壁。 图案发生器还包括夹在两个电极板之间的至少一个绝缘体。 非直的侧壁可以是U形侧壁或L形侧壁。

公开(公告)号：US20140375299A1

公开(公告)日：2014-12-25

申请号：US14283159

申请日：2014-05-20

Applicant: Sergey G. Belostotskiy ,  Chinh Dinh ,  Andrew Nguyen ,  Michael G. Chafin

Inventor： Sergey G. Belostotskiy ,  Chinh Dinh ,  Andrew Nguyen ,  Michael G. Chafin

IPC: G01R19/00 ,  H01L21/683

CPC classification number: H01J37/00 ,  H01J37/32715 ,  H01J37/32935 ,  H01L21/6833

Abstract: A direct (DC) voltage is applied to an electrode at a voltage value to clamp a workpiece to an electrostatic chuck in a processing chamber. The electrode is embedded into the electrostatic chuck. An electrostatic chuck current through the electrode at the DC voltage is measured. A DC self bias induced on the workpiece by a plasma is determined based on the electrostatic chuck current and the applied voltage.

Abstract translation: 将直流（DC）电压以电压值施加到电极，以将工件夹紧到处理室中的静电卡盘。 电极嵌入静电卡盘。 测量在直流电压下通过电极的静电卡盘电流。 基于静电卡盘电流和施加的电压来确定通过等离子体在工件上感应的DC自偏压。

公开(公告)号：US20140338076A1

公开(公告)日：2014-11-13

申请号：US14445392

申请日：2014-07-29

Applicant: Mehdi M. Yazdanpanah

Inventor： Mehdi M. Yazdanpanah ,  Romaneh Jalilian ,  Brian Miller ,  David A. Mudd

IPC: G01Q80/00 ,  G01N1/02

CPC classification number: G01N1/02 ,  B82Y30/00 ,  G01N1/32 ,  H01J37/00 ,  H01J2237/208 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749 ,  H01L21/76838 ,  H05K3/222 ,  H05K2201/0248

Abstract: Embodiments of the present invention provide apparatus of restoring probes attached to the manipulator in a control environment (e.g. vacuum chamber of an focus ion beam) without a need to open the vacuum chamber. Another embodiment of the present invention teaches construction and application of various shapes of nanoforks from a nanoneedles array inside a FIB vacuum chamber. In another embodiment, the present invention teaches edition and correction of completed and oxide-coated circuit boards by re-nano-wiring using nanoneedles of a nanoneedles array (as nanowire supply), contained in the same controlled space. In this embodiment, individual nanoneedles in a nanoneedle array are manipulated by a manipulator and placed in such a way to make electrical contact between the desired points.

Abstract translation: 本发明的实施例提供了在控制环境（例如聚焦离子束的真空室）中恢复附接到操纵器的探针的装置，而不需要打开真空室。 本发明的另一个实施方案教导了在FIB真空室内的纳米针阵列中构造和应用各种形状的纳摩耳。 在另一个实施例中，本发明通过使用包含在相同受控空间中的纳米针阵列（作为纳米线供应）的纳米针通过再纳米布线来教导完成的和氧化物涂覆的电路板的编辑和校正。 在该实施例中，纳米针阵列中的单个纳米针由操纵器操纵并且以这样的方式放置以在期望的点之间进行电接触。

公开(公告)号：US07177020B2

公开(公告)日：2007-02-13

申请号：US11128352

申请日：2005-05-13

Applicant: Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01J3/00

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

Abstract: An apparatus and method for detecting defects on a specimen includes an illumination optical unit which obliquely projects a laser onto a region which is longer in one direction on a surface of a specimen than in a transverse direction, a table unit which mounts the specimen and which is movable, a detection optical unit which detects light from the specimen illuminated by the laser with an image sensor while the table is moving, and a signal processor. The signal processor processes a signal outputted from the image sensor of the detection optical unit and converted to a digital signal and extracts defects of the specimen by comparing the converted digital signal with a reference digital signal. A display unit displays information of defects extracted by the signal processor.

Abstract translation: 用于检测试样缺陷的装置和方法包括照射光学单元，其将激光倾斜地突出到在一个方向上在一个方向上比在横向方向上更长的区域，安装样本的台单元， 可移动的检测光学单元，检测光学单元，其在桌子移动时利用图像传感器检测由激光照射的样本的光，以及信号处理器。 信号处理器处理从检测光学单元的图像传感器输出的信号并转换为数字信号，并通过将转换的数字信号与参考数字信号进行比较来提取样本的缺陷。 显示单元显示由信号处理器提取的缺陷的信息。

公开(公告)号：US07037735B2

公开(公告)日：2006-05-02

申请号：US10170378

申请日：2002-06-14

Applicant: Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

Inventor： Minori Noguchi ,  Yoshimasa Ohshima ,  Hidetoshi Nishiyama ,  Shunichi Matsumoto ,  Yukio Kembo ,  Ryouji Matsunaga ,  Keiji Sakai ,  Takanori Ninomiya ,  Tetsuya Watanabe ,  Hisato Nakamura ,  Takahiro Jingu ,  Yoshio Morishige ,  Shuichi Chikamatsu

IPC: H01L21/66 ,  G01R31/26

CPC classification number: B82Y15/00 ,  G01N21/94 ,  G01N21/95623 ,  G01N21/95684 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/681 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection method includes radiating an illumination slit-shaped beam having lights substantially parallel to a longitudinal direction to a substrate having circuit patterns in a direction inclined at a predetermined gradient relative to the direction of a line normal to the substrate and inclined at a predetermined gradient on a surface with respect to a group of main straight lines of the circuit patterns with its longitudinal direction oriented almost perpendicularly to a direction of a movement of the substrate. Scattered light reflected by a defect such as a foreign particle existing on the illuminated substrate is received and converted into a detection signal by using an image sensor, and defect judging is effected of an extracted a signal indicating a defect such as a foreign particle on the basis of the detection signal output.

公开(公告)号：US20010021015A1

公开(公告)日：2001-09-13

申请号：US09805188

申请日：2001-03-14

Inventor： Hiroshi Morioka ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Yukio Kembo ,  Hidetoshi Nishiyama ,  Kazuhiko Matsuoka ,  Yoshiharu Shigyo

IPC: G01N021/00

CPC classification number: H01L21/681 ,  B82Y15/00 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8822 ,  G01R31/308 ,  H01J37/00 ,  H01J2237/022 ,  H01J2237/0225 ,  H01L21/67253 ,  H01L21/67288 ,  H01L22/12

Abstract: A processing method for semiconductor devices in a semiconductor fabrication line includes processing a substrate in a first processing apparatus, transferring the substrate processed in the first processing apparatus to a detecting apparatus without removal of the substrate from the semiconductor fabrication line while continuing fabrication of the semiconductor devices, detecting foreign particle defects on the substrate transferred to the detecting apparatus, and determining a foreign particle generation condition of the processing apparatus based on a data from the detecting.

Abstract translation: 半导体制造线中的半导体器件的处理方法包括在第一处理设备中处理衬底，将在第一处理设备中处理的衬底转移到检测设备，而不从半导体制造线移除衬底，同时继续制造半导体 检测转移到检测装置的基板上的异物缺陷，以及根据来自检测的数据确定处理装置的异物生成条件。