公开(公告)号：US20090078868A1

公开(公告)日：2009-03-26

申请号：US11860760

申请日：2007-09-25

Applicant: Niels de Jonge

Inventor： Niels de Jonge

IPC: G01N23/04

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/045 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01J2237/21 ,  H01J2237/226 ,  H01J2237/24455 ,  H01J2237/262 ,  H01J2237/2802 ,  H01J2237/2803

Abstract: A confocal scanning transmission electron microscope which includes an electron illumination device providing an incident electron beam propagating in a direction defining a propagation axis, and a precision specimen scanning stage positioned along the propagation axis and movable in at least one direction transverse to the propagation axis. The precision specimen scanning stage is configured for positioning a specimen relative to the incident electron beam. A projector lens receives a transmitted electron beam transmitted through at least part of the specimen and focuses this transmitted beam onto an image plane, where the transmitted beam results from the specimen being illuminated by the incident electron beam. A detection system is placed approximately in the image plane.

Abstract translation: 一种共焦扫描透射电子显微镜，其包括提供沿着限定传播轴的方向传播的入射电子束的电子照明装置，以及沿着传播轴定位并且能够沿至少一个横向于传播轴的方向移动的精密样本扫描台。 精密样本扫描台被配置为相对于入射电子束定位样本。 投影透镜接收通过至少部分样本的透射电子束，并将该透射光束聚焦在图像平面上，其中透射光束由样品被入射电子束照射。 检测系统大致放置在图像平面中。

公开(公告)号：US07372051B2

公开(公告)日：2008-05-13

申请号：US11189897

申请日：2005-07-27

Applicant: Ruriko Tsuneta ,  Hiromi Inada ,  Masanari Koguchi ,  Takahito Hashimoto

Inventor： Ruriko Tsuneta ,  Hiromi Inada ,  Masanari Koguchi ,  Takahito Hashimoto

IPC: G21K7/00 ,  H01J37/26

CPC classification number: H01J37/265 ,  G01N23/22 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/223 ,  H01J2237/24592 ,  H01J2237/2823 ,  H01J2237/2826

Abstract: Magnification errors are reduced in the required range of magnification in electric charged particle beam application apparatuses and critical dimension measurement instruments. To achieve this, a first image, whose magnification for the specimen is actually measured, is recorded, a second image, whose magnification for the specimen is unknown, is recorded, and the magnification of the second image for the first image is analyzed by using image analysis. Thereby, the magnification of the second image for the specimen is actually measured. Then, magnification is actually measured in the whole range of magnification by repeating the magnification analysis described above by taking the second image as the first image. Actually measuring the magnification of images for the specimen in the whole range of magnification and calibrating the same permits a reduction of magnification errors by a digit.

Abstract translation: 在带电粒子束施加装置和关键尺寸测量仪器中，放大误差在所需的放大倍率范围内减小。 为了实现这一点，记录实际测量样本的放大倍数的第一图像，记录其样本的放大倍数未知的第二图像，并且通过使用第一图像来分析第一图像的第二图像的放大率 图像分析。 由此，实际测定第2图像的放大率。 然后，通过将第二图像作为第一图像重复上述的倍率分析，实际上在整个放大倍数中进行倍率测量。 实际上，在整个放大倍率范围内测量样本的图像的放大倍率，可以通过数字缩小倍数误差。

公开(公告)号：US20080067373A1

公开(公告)日：2008-03-20

申请号：US11461068

申请日：2006-07-31

Applicant: Lin Zhou ,  Eric P. Solecky

Inventor： Lin Zhou ,  Eric P. Solecky

IPC: G21K7/00

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/256 ,  H01J37/263 ,  H01J2237/24542 ,  H01J2237/24564 ,  H01J2237/2816 ,  H01J2237/2817 ,  H01J2237/2823 ,  H01J2237/30477

Abstract: A method for accurately measuring feature sizes and quantifying the beam spot size in a CDSEM at real time is provided. The inventive method is based on a scanning microscope and it works on both conductive and non-conductive features. The measurement of conductive feature includes first providing a conductive feature on a surface of a substrate (the substrate maybe an insulator, a semiconductor or a material stack thereof). The conductive feature is then connected to ground and thereafter an electron beam probe raster scans the sample. When the electron beam probe hits the conductive feature the spot will have a negative potential. The potential difference between the spot and the ground will induce an electrical current flow. When the electrical beam is off the conductive feature, there will be no current flow. Therefore, by measuring the current response to the location of the beam spot, the dimension of the conductive feature can be derived.

Abstract translation: 提供了一种用于精确测量特征尺寸并实时量化CDSEM中的束斑大小的方法。 本发明的方法基于扫描显微镜，并且其工作在导电和非导电特征上。 导电特征的测量包括首先在衬底的表面上提供导电特征（衬底可以是绝缘体，半导体或其材料堆叠）。 然后将导电特征连接到地，然后电子束探测光栅扫描样品。 当电子束探针击中导电特征时，点将具有负电位。 点与地之间的电位差会引起电流流动。 当电束离开导电特征时，将不会有电流流动。 因此，通过测量电流对光斑位置的响应，可导出导电特征的尺寸。

公开(公告)号：US07335893B2

公开(公告)日：2008-02-26

申请号：US10492257

申请日：2002-10-04

Applicant: Asher Pearl

Inventor： Asher Pearl

IPC: H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, a defocusing is introduced and a signal calculated based on an image shift is applied to a deflection unit. Further, a method for correction of astigmatism is provided. Thereby, the sharpness is evaluated for a set of frames generated whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，引入散焦，并将基于图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正散光的方法。 因此，对于在将信号改变为标示符时产生的一组帧来评估清晰度。

公开(公告)号：US07253410B1

公开(公告)日：2007-08-07

申请号：US11225917

申请日：2005-09-13

Applicant: Kirk J. Bertsche ,  John Greene

Inventor： Kirk J. Bertsche ,  John Greene

IPC: H01J37/244

CPC classification number: H01J37/026 ,  H01J37/263 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: One embodiment described relates to a method of electron beam imaging of a target area of a substrate. An electron beam column is configured for charge-control pre-scanning using a primary electron beam. A pre-scan is performed over the target area. The electron beam column is re-configured for imaging using the primary electron beam. An imaging scan is then performed over the target area. Other embodiments are also described.

Abstract translation: 所描述的一个实施例涉及对基板的目标区域进行电子束成像的方法。 电子束列被配置为使用一次电子束进行电荷控制预扫描。 在目标区域上执行预扫描。 电子束列被重新配置成使用一次电子束成像。 然后在目标区域上执行成像扫描。 还描述了其它实施例。

公开(公告)号：US07236651B2

公开(公告)日：2007-06-26

申请号：US10219765

申请日：2002-08-16

Applicant: Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

Inventor： Tohru Ishitani ,  Mitsugu Sato ,  Hideo Todokoro ,  Tadashi Otaka ,  Takashi Iizumi ,  Atsushi Takane

IPC: G06K9/32 ,  G21K7/00 ,  G09G5/02

CPC classification number: H01J37/28 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/2823

Abstract: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

Abstract translation: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于，在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率，在图像的整个区域或图像的整个区域上进行平均化， 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象，因此可以获得高精度和良好重复性的图像分辨率评估值。

公开(公告)号：US07105815B2

公开(公告)日：2006-09-12

申请号：US11020255

申请日：2004-12-27

Applicant: Kenji Obara ,  Toshifumi Honda ,  Toshiro Kubo

Inventor： Kenji Obara ,  Toshifumi Honda ,  Toshiro Kubo

IPC: G01N23/00 ,  G21K7/00

CPC classification number: H01J37/28 ,  H01J37/241 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: To acquire defect images even when a defect exists below an optically transparent film, an electron optical system of an electron microscope is set to a first imaging condition. A defect position of a specimen is set so as to fall within the visual field of the electron microscope, using position data of a defect of the specimen. The position of the defect is imaged by the electron microscope set to the first imaging condition to obtain a first image corresponding to the defect position. The first image is processed to determine whether a defect exists. The electron optical system is then set to a second imaging condition on the basis of the result of determination. A point imaged under the first imaging condition is imaged by the electron microscope set to the second imaging condition to acquire a second image corresponding to a defect position.

Abstract translation: 为了获得缺陷图像，即使当缺陷存在于光学透明膜下方时，将电子显微镜的电子光学系统设置为第一成像条件。 使用试样的缺陷的位置数据，将试样的缺陷位置设定为落入电子显微镜的视野内。 通过设置为第一成像条件的电子显微镜对缺陷的位置成像，以获得对应于缺陷位置的第一图像。 处理第一个图像以确定是否存在缺陷。 然后基于确定的结果将电子光学系统设置为第二成像条件。 在第一成像条件下成像的点通过设置为第二成像条件的电子显微镜成像，以获得对应于缺陷位置的第二图像。

公开(公告)号：US20050247860A1

公开(公告)日：2005-11-10

申请号：US11119934

申请日：2005-05-03

Applicant: Chie Shishido ,  Ryo Nakagaki ,  Mayuka Oosaki ,  Hiroki Kawada

Inventor： Chie Shishido ,  Ryo Nakagaki ,  Mayuka Oosaki ,  Hiroki Kawada

IPC: G01B15/00 ,  G01N23/00 ,  G01N23/225 ,  G21K7/00 ,  H01J37/22 ,  H01J37/28 ,  H01J40/14 ,  H01L21/66

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/222 ,  H01J37/263 ,  H01J2237/24578 ,  H01J2237/2817 ,  H01J2237/2823

Abstract: The present invention relates to an electron microscope which reduces a difference in measured values that occur due to a difference in resolution that cannot be fully adjusted which exists among electron microscopes, or occurs as time elapses, and a method for measuring dimensions. An operator adapted to compensate for changes of an electron image to be generated due to a difference in probe diameter is obtained in advance from electron images of one reference sample created by electron microscopes having different resolution (probe diameter). Then a compensation-measurement electron image which is equivalent to an electron image created under the same probe diameter by applying the operator for compensation, and the compensation-measurement electron image is used for measuring the dimensions.

Abstract translation: 本发明涉及一种电子显微镜，其特征在于，减少由电子显微镜中存在的不能充分调整的分辨率的差异而发生的测量值的差异，或者随着时间的推移而发生的电子显微镜以及尺寸的测定方法。 从具有不同分辨率（探针直径）的电子显微镜产生的一个参考样品的电子图像预先获得适于补偿由于探针直径差引起的电子图像变化的操作者。 然后通过施加用于补偿的操作者，并且使用补偿测量电子图像来测量相当于在相同探针直径下产生的电子图像的补偿测量电子图像来测量尺寸。

公开(公告)号：US06924482B2

公开(公告)日：2005-08-02

申请号：US10395197

申请日：2003-03-25

Applicant: Mari Nozoe ,  Mitsuo Suga ,  Yoichiro Neo ,  Hidetoshi Nishiyama

Inventor： Mari Nozoe ,  Mitsuo Suga ,  Yoichiro Neo ,  Hidetoshi Nishiyama

IPC: G01R31/28 ,  G01Q10/00 ,  G01Q30/04 ,  G01R31/307 ,  H01L21/00 ,  H01L21/66 ,  G21K7/00

CPC classification number: H01J37/222 ,  G01R31/307 ,  H01J37/256 ,  H01J37/263 ,  H01J37/265 ,  H01J37/266 ,  H01J2237/043 ,  H01J2237/24564 ,  H01J2237/2594 ,  H01J2237/2813 ,  H01J2237/2817 ,  H01J2237/304

Abstract: Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

Abstract translation: 电子束在连接点成为向后偏置的状态下以预定间隔在步骤中照射到晶片，并且监视在向后偏置中减轻电荷的时间段的特性差。 结果，在比正常部分短的时间段内产生结漏电的位置处的电荷被减轻，因此在正常部分和失效部分之间产生电位差，并且在潜在对比图像中观察到电荷 作为亮度的差异。 通过连续重复获取图像的操作，实时执行图像处理并存储失败部分的位置和亮度，可以执行指定区域的自动检查。 故障部分的图像，亮度和分布信息在检查后自动保存并输出。

公开(公告)号：US20050012050A1

公开(公告)日：2005-01-20

申请号：US10492574

申请日：2002-10-04

Applicant: Dror Shemesh

Inventor： Dror Shemesh

IPC: H01J37/21 ,  A61N5/00 ,  G01N21/00 ,  G21G5/00 ,  H01J3/26 ,  H01J37/08 ,  H01J37/153 ,  H01J37/22 ,  H01J37/26

CPC classification number: H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

Abstract: The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

Abstract translation: 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。