Abstract:
A sample, in which a dielectric film having a dielectric constant equal to or larger than 50 (based on electrical measurement) is formed on a substrate, is measured by an ellipsometer while a model corresponding to the sample is formed based on effective medium approximation (EMA). A film corresponding to the dielectric film of the model includes void volume fraction between 60% and 90%. A calculated value based on the model is compared with a value measured by the ellipsometer and fitting is applied to decrease a difference between the compared values in order to specify the thickness and the optical constant of the sample.
Abstract:
A system and method are described herein for determining the quality of an optical material by measuring and analyzing birefringence (e.g., stress-induced birefringence, inherent birefringence) in the optical material (e.g., glass sheet). The method is a scanning technique in which a birefringence sensor is set to a first optical state and then moved in a direction at a constant velocity over a glass sheet while first power transmission measurements are made at a high data rate. At the end of this move, the birefringence sensor is set to a second optical state and then moved at the same velocity back over the glass sheet, while second power transmission measurements are made. This procedure is repeated the same number of times as there are optical states in the birefringence sensor. A computer then calculates birefringence values using profiles of the power transmission measurements so as to determine the quality of the glass sheet.
Abstract:
An apparatus for information extraction from electromagnetic energy via multi-characteristic spatial geometry processing to determine three-dimensional aspects of an object from which the electromagnetic energy is proceeding. The apparatus receives the electromagnetic energy. The received electromagnetic energy has a plurality of spatial phase characteristics. The apparatus separates the plurality of spatial phase characteristics of the received electromagnetic energy. The apparatus r identifies spatially segregated portions of each spatial phase characteristic, with each spatially segregated portion of each spatial phase characteristic corresponding to a spatially segregated portion of each of the other spatial phase characteristics in a group. The apparatus quantifies each segregated portion to provide a spatial phase metric of each segregated portion for providing a data map of the spatial phase metric of each separated spatial phase characteristic. The apparatus processes the spatial phase metrics to determine surface contour information for each segregated portion of the data map.
Abstract:
An ellipsometry system and method using spectral imaging are provided. The ellipsometry system includes a light source group for projecting a white light collimated to a multi-point region defined on the surface of a sample, a light analysis group for polarizing a reflected white light to analyze it, and a spectral imaging group for dispersing and imaging the polarized white light. The white light collimated to the multi-point region is input to the spectral imaging group and dispersed by a light dispersing means by wavelengths such that the dispersed lights are imaged on one axis of an imaging plane by the points forming the multi-point region and imaged on the other axis of the imaging plane by wavelengths, to obtain optical data having information about the physical property of the points and wavelengths. Accordingly, a large amount of data can be obtained by wavelengths and points to improve rapidity and reliability of measurement.
Abstract:
Method for real-time control of the fabrication of a thin-film structure comprising a substrate by ellipsometric measurement in which: variables directly linked to the ellipsometric ratio ρ=tanΨ exp(iΔ) are measured; and the said variables are compared with reference values. The comparison relates to the length of the path traveled at a time t in the plane of the variables with respect to an initial point at time t0, for each layer participating in the thin-film structure.
Abstract:
Methods and systems allow an in situ determination of the magnitude of PMD in an optical network and provide an estimate of the PMD impairment in the transmitted signal even when PMD is time dependent.
Abstract:
Remotely sensing a target may include generating a first beam of optical radiation that is modulated at a first frequency and polarized at a first polarization. A second beam of optical radiation that is modulated at a second frequency and polarized at a second polarization may also be generated. The first and second beams of optical radiation may be transmitted to the target. Radiation at the first polarization and radiation at the second polarization may be detected from the target using a phase sensitive technique and the first and second frequencies.
Abstract:
A surface inspection device irradiates a laser beam onto the surface of a sample, scans the surface two-dimensionally, and detects the intensities of the s-polarized light component and p-polarized light component of the reflected laser beam. RR (reflectance ratio), which is the ratio of the reflective intensities of the s- and p-polarized light components, is calculated for each position of the surface of the sample, and the two-dimensional distribution of RR on the surface of the sample is detected. The distribution width of this measured RR is compared with the natural width for a clean sample, and the surface of the sample is determined to be contaminated when, as the result of comparison, the RR distribution width diverges from the natural width. The absence or presence of contamination on the microscopically rough surface of a sample can therefore be quickly and easily determined based on the RR of the reflective intensities of the s- and p-polarized light components.
Abstract:
Dependency of the polarization state of a reflected infrared ray generated when an infrared ray in a fixed polarization state is incident on a sample thin film on incidence orientation is measured while rotating the sample thin film in a plane parallel to a surface thereof. Next, an optical anisotropy of the sample thin film is determined based on the dependency of the polarization state on the incidence orientation. Then, the state of molecular orientation in the sample thin film is determined based on the optical anisotropy.
Abstract:
An optical measurement system for evaluating the surface of a substrate or the thickness and optical characteristics of a thin film layer overlying the substrate includes an intensity stabilized light source configured to generate a stabilized light beam, a polarizing element for polarizing the light beam emanating from the light source, and a detection system for measuring the light reflected from the substrate The measurement system includes a polarizing beam-splitter for splitting the light reflected from the substrate into s-polarized light and p-polarized light. The measurement system further includes two optical sensors for separately measuring the amplitude of the s-polarized light and the intensity of the p-polarized light and a third detector for measuring either the phase difference between the s-polarized light and the p-polarized light or the reflection angle of the light reflected from the substrate. A control system analyzes the measured amplitude of the s-polarized light and the p-polarized and either the phase-difference or the reflection angle to determine changes in the topography of substrate or changes in the thickness or optical characteristics of the thin film layer.