Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith
    106.
    发明授权
    Method for producing titanium-doped silica glass for use in EUV lithography and blank produced in accordance therewith 有权
    用于EUV光刻中使用的掺杂钛的石英玻璃的方法和根据其生产的空白

    公开(公告)号:US09586850B2

    公开(公告)日:2017-03-07

    申请号:US14911506

    申请日:2014-07-22

    Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+≦5×10−4.

    Abstract translation: Ti掺杂的二氧化硅玻璃中存在的Ti3 +离子会引起玻璃的棕色染色,导致镜片检查变得更加困难。 在Ti掺杂的二氧化硅玻璃中减少Ti3 +离子有利于Ti4 +离子的已知方法包括足够高比例的OH基,并在玻璃化之前进行氧处理,这两者都有缺点。 为了提供一种Ti掺杂石英玻璃的成本有效的制造方法,其在羟基含量小于120ppm时,在400nm的波长范围内显示出至少70%的内部透射率(样品厚度10mm) 在玻璃化之前,将TiO 2 -SiO 2烟炱体用氮氧化物进行调理处理。 由Ti掺杂的石英玻璃制成的坯料的比例Ti3 + / Ti4 +≤5×10-4。

    METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT
    110.
    发明申请
    METHOD FOR PRODUCING A BLANK FROM TITANIUM- AND FLUORINE-DOPED GLASS HAVING A HIGH SILICIC-ACID CONTENT 审中-公开
    从具有高硅酸含量的钛和氟树脂玻璃生产空白的方法

    公开(公告)号:US20160264447A1

    公开(公告)日:2016-09-15

    申请号:US15035776

    申请日:2014-11-06

    Abstract: A method for producing a blank from titanium-doped, highly silicic-acidic glass having a specified fluorine content for use in EUV lithography is described, in which the thermal expansion coefficient over the operating temperature remains at zero as stably as possible. The course of the thermal expansion coefficient of Ti-doped silica glass depends on a plurality of influencing factors. In addition to the absolute titanium content, the distribution of the titanium is of significant importance, as is the ratio and distribution of additional doping elements, such as fluorine. In the method, fluorine-doped TiO2—SiO2 soot particles are generated and processed further via consolidation and vitrifying into the blank, and, by flame hydrolysis of input substances containing silicon and titanium, TiO2—SiO2-soot particles are formed, exposed to a reagent containing fluorine in a moving powder bed, and converted to the fluorine-doped TiO2—SiO2-soot particles.

    Abstract translation: 描述了在EUV光刻中使用具有指定氟含量的钛掺杂的高硅酸性玻璃制造坯料的方法,其中在工作温度下的热膨胀系数尽可能稳定地保持在零。 Ti掺杂石英玻璃的热膨胀系数取决于多个影响因素。 除了绝对的钛含量之外,钛的分布是重要的,附加的掺杂元素如氟的比例和分布也是重要的。 在该方法中,通过固化和玻璃化进一步生成氟掺杂的TiO 2 -SiO 2烟灰颗粒到坯料中,并且通过含硅和钛的输入物质的火焰水解,形成TiO 2 -SiO 2 - 烟灰颗粒,暴露于 在移动的粉末床中含有氟的试剂,并转化成掺杂氟的TiO 2 -SiO 2 - 烟灰颗粒。

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