公开(公告)号：US08635886B2

公开(公告)日：2014-01-28

申请号：US13558698

申请日：2012-07-26

Applicant: Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

Inventor： Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

IPC: C03B37/00 ,  C03B20/00

CPC classification number: C03B19/1438 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/40 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/085 ,  C03C4/12 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2203/44

Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Abstract translation: 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

公开(公告)号：US08539793B2

公开(公告)日：2013-09-24

申请号：US13567837

申请日：2012-08-06

Applicant: Masafumi Mizuguchi ,  Tetsuya Abe

Inventor： Masafumi Mizuguchi ,  Tetsuya Abe

IPC: C03C3/06 ,  C03B35/00 ,  C03B40/02

CPC classification number: G01N21/64 ,  C03B11/08 ,  C03B23/0013 ,  C03B40/02 ,  C03B2201/03 ,  C03C3/06 ,  C03C23/0075 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2203/52 ,  G01N21/6402 ,  Y02P40/57

Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method including: washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less; heating high purity carbon powders with a content of copper and aluminium; heating the mold at a temperature condition of 1700° C. to 1900° C.; applying the powders before accommodating the block in the mold; and molding the block in a predetermined form by pressing the block while heating within a hold temperature range of 1500° C. to 1700° C., after accommodating the washed block in the mold.

Abstract translation: 一种合成石英玻璃成型体的成型体，其通过将合成石英玻璃块容纳在具有按压部的模具中，并且在加热的同时加压块而成型，其特征在于，包括：洗涤合成石英玻璃块，使铜 存在于合成石英玻璃块的表面上的浓度为2ng / cm 2以下; 加热含有铜和铝的高纯度碳粉; 在1700℃至1900℃的温度条件下加热模具。 在将块容纳在模具中之前施加粉末; 并且在将洗涤的块体容纳在模具中之后，在1500℃至1700℃的保持温度范围内加热的同时通过压制块将模块成型为预定形式。

公开(公告)号：US20120297833A1

公开(公告)日：2012-11-29

申请号：US13567837

申请日：2012-08-06

Applicant: Masafumi MIZUGUCHI ,  Tetsuya Abe

Inventor： Masafumi MIZUGUCHI ,  Tetsuya Abe

IPC: C03B11/12

CPC classification number: G01N21/64 ,  C03B11/08 ,  C03B23/0013 ,  C03B40/02 ,  C03B2201/03 ,  C03C3/06 ,  C03C23/0075 ,  C03C2201/32 ,  C03C2201/40 ,  C03C2203/52 ,  G01N21/6402 ,  Y02P40/57

Abstract: A method of molding a synthetic silica glass molded body by accommodating a synthetic silica glass block in a mold provided with a pressing portion, and by pressing the block while heating, the method including: washing the synthetic silica glass block so that a concentration of copper which is present on the surface of the synthetic silica glass block is 2 ng/cm2 or less; heating high purity carbon powders with a content of copper and aluminium; heating the mold at a temperature condition of 1700° C. to 1900° C.; applying the powders before accommodating the block in the mold; and molding the block in a predetermined form by pressing the block while heating within a hold temperature range of 1500° C. to 1700° C., after accommodating the washed block in the mold.

Abstract translation: 一种合成石英玻璃成型体的成型体，其通过将合成石英玻璃块容纳在具有按压部的模具中，并且在加热的同时加压块而成型，其特征在于，包括：洗涤合成石英玻璃块，使铜 存在于合成石英玻璃块的表面上的浓度为2ng / cm 2以下; 加热含有铜和铝的高纯度碳粉; 在1700℃至1900℃的温度条件下加热模具。 在将块容纳在模具中之前施加粉末; 并且在将洗涤的块体容纳在模具中之后，在1500℃至1700℃的保持温度范围内加热的同时通过压制块将模块成型为预定形式。

公开(公告)号：US20080216513A1

公开(公告)日：2008-09-11

申请号：US11919457

申请日：2006-04-27

Applicant: Tatsuhiro Sato ,  Akira Fujinoki ,  Itsuo Araki

Inventor： Tatsuhiro Sato ,  Akira Fujinoki ,  Itsuo Araki

IPC: C03B19/00 ,  C03C3/06

CPC classification number: C03B32/00 ,  C03B23/20 ,  C03C3/06 ,  C03C23/007 ,  C03C23/0075 ,  C03C2201/34 ,  C03C2201/40 ,  C03C2201/54

Abstract: To provide a technique with which a quartz glass jig and a doped quartz glass jig are regenerated by completely removing the impurities which are attached to the surface and the impurities which have diffused into the interior from quartz glass jigs which have been used in semiconductor production processes and then carrying out working repair and removing the contamination from the working processes as well. After use, the impurities are removed from the aforementioned quartz glass jigs in the said purification treatment process which includes a purification treatment process in which the quartz glass jigs are subjected to a purification treatment in a gaseous atmosphere which includes a halogen element at a temperature within the region above a prescribed temperature.

Abstract translation: 为了提供通过完全去除已经用于半导体制造工艺中的石英玻璃夹具将附着在表面上的杂质和已经扩散到内部的杂质完全除去石英玻璃夹具和掺杂石英玻璃夹具的技术 然后进行工作维修和清除工作过程中的污染物。 使用后，在上述纯化处理工序中，从上述石英玻璃夹具中除去杂质，其中包括净化处理工艺，其中石英玻璃夹具在包含卤素元素的气氛中在温度范围内进行纯化处理 该区域高于规定温度。

公开(公告)号：US20080053150A1

公开(公告)日：2008-03-06

申请号：US11891984

申请日：2007-08-14

Applicant: Lisa Anne Moore ,  Charlene Marie Smith

Inventor： Lisa Anne Moore ,  Charlene Marie Smith

IPC: C03B19/00 ,  C03C3/04

CPC classification number: C03B19/1461 ,  C03B19/12 ,  C03B19/14 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/21 ,  C03B2201/23 ,  C03C3/061 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/22 ,  C03C2201/40 ,  C03C2201/50 ,  Y02P40/57

Abstract: An F-doped silica glass, a process for making the glass, an optical member comprising the glass, and an optical system comprising such optical member. The glass material comprises 0.1-5000 ppm by weight of fluorine. The glass material according to certain embodiments of the present invention has low polarization-induced birefringence, low LIWFD and low induced absorption at 193 nm.

Abstract translation: F掺杂石英玻璃，制造玻璃的方法，包括玻璃的光学构件和包括这种光学构件的光学系统。 玻璃材料包含0.1-5000ppm重量的氟。 根据本发明的某些实施方案的玻璃材料在193nm处具有低偏振诱发双折射，低LIWFD和低诱导吸收。

公开(公告)号：US20070184964A1

公开(公告)日：2007-08-09

申请号：US10589161

申请日：2004-12-28

Applicant: Ulrich Peuchert ,  Uwe Kolberg ,  Joern Besinger

Inventor： Ulrich Peuchert ,  Uwe Kolberg ,  Joern Besinger

IPC: C03C14/00 ,  C03C3/095 ,  C03B5/00

CPC classification number: C03C4/0007 ,  A61K6/0005 ,  A61K6/0008 ,  A61K6/0073 ,  A61K6/0215 ,  A61K6/024 ,  A61K6/0245 ,  A61K6/025 ,  A61K6/0255 ,  A61K6/0276 ,  C03C3/06 ,  C03C3/095 ,  C03C4/087 ,  C03C2201/3488 ,  C03C2201/40 ,  A61K6/087 ,  C08L63/00

Abstract: The invention relates to a x-ray opaque glass which belongs to a SiO2 and Yb2O3 system and can contain, when necessary, additives for adapting the properties thereof. A method for producing said glass and for using it, in particular in the form of a dental glass are also disclosed.

Abstract translation: 本发明涉及属于SiO 2和Y 2 O 3 O 3系统的x射线不透明玻璃，并且当需要时， 用于调整其性能的添加剂。 还公开了一种用于生产所述玻璃并用于其的方法，特别是牙科玻璃的形式。

公开(公告)号：US20060009536A1

公开(公告)日：2006-01-12

申请号：US10889306

申请日：2004-07-12

Applicant: Guang-Way Jang ,  Ya-Hui Lin ,  I-Chia Tsai ,  Pei Tien ,  Yuung-Ching Sheen

Inventor： Guang-Way Jang ,  Ya-Hui Lin ,  I-Chia Tsai ,  Pei Tien ,  Yuung-Ching Sheen

IPC: B01J13/00 ,  C08J3/02

CPC classification number: C04B35/624 ,  C03C1/006 ,  C03C1/008 ,  C03C2201/31 ,  C03C2201/3423 ,  C03C2201/40 ,  C03C2201/42 ,  C03C2203/26 ,  C03C2203/27 ,  C03C2203/28 ,  C04B2235/3229 ,  C04B2235/3232 ,  C04B2235/3244 ,  C04B2235/3287 ,  C04B2235/3293 ,  C04B2235/3418 ,  C04B2235/441

Abstract: A method of preparing a sol-gel material is described. A metal alkoxide and an organically modified Si-alkoxide having a predetermined functional group are dissolved in a first solvent and a second solvent to form a first solution and a second solution, respectively. The first solution and the second solution are then mixed and heated. As a result, the metal alkoxide reacts with the organically modified Si-alkoxide, and a functionalized sol-gel material is formed thereby. Furthermore, the solid content of the functionalized sol-gel material is increased by transferring the same into another solvent. Therefore, a thick sol-gel film is fabricated by means of the transferred functionalized sol-gel material.

Abstract translation: 描述了制备溶胶 - 凝胶材料的方法。 将金属醇盐和具有预定官能团的有机改性的Si-醇盐溶解在第一溶剂和第二溶剂中以分别形成第一溶液和第二溶液。 然后将第一溶液和第二溶液混合并加热。 结果，金属醇盐与有机改性的Si-醇盐反应，由此形成官能化的溶胶 - 凝胶材料。 此外，通过将官能化溶胶 - 凝胶材料的固体含量转移到另一种溶剂中而增加。 因此，通过转移的官能化溶胶 - 凝胶材料制造厚溶胶 - 凝胶膜。

公开(公告)号：US06924928B2

公开(公告)日：2005-08-02

申请号：US10261619

申请日：2002-10-02

Applicant: Michael Dennis ,  Brian Cole

Inventor： Michael Dennis ,  Brian Cole

IPC: C03C3/06 ,  C03C3/095 ,  C03C13/04 ,  H01S3/00 ,  H01S3/067 ,  H01S3/16 ,  H01S3/17

CPC classification number: H01S3/06716 ,  C03C3/06 ,  C03C3/095 ,  C03C13/046 ,  C03C2201/30 ,  C03C2201/3411 ,  C03C2201/347 ,  C03C2201/3482 ,  C03C2201/40 ,  H01S3/06754 ,  H01S3/06775 ,  H01S3/1603 ,  H01S3/161 ,  H01S3/1616 ,  H01S3/1698 ,  H01S3/17

Abstract: A device amplifies light at wavelengths in the vicinity of 1420-1530 nm, using thulium doped silica-based optical fiber. This wavelength band is of interest as it falls in the low-loss optical fiber telecommunications window, and is somewhat shorter in wavelength than the currently standard erbium doped silica fiber amplifier. The device thus extends the band of wavelengths which can be supported for long-distance telecommunications. The additional wavelength band allows the data transmission rate to be substantially increased via wavelength division multiplexing (WDM), with minimal modification to the standard equipment currently used for WDM systems. The host glass is directly compatible with standard silica-based telecommunications fiber. The invention also enables modified silicate based amplifiers and lasers on a variety of alternative transitions. Specifically, an S-band thulium doped fiber amplifier (TDFA) using a true silicate fiber host is described.

Abstract translation: 器件利用ium掺杂的二氧化硅基光纤放大1420-1530nm附近波长的光。 该波长带在低损耗光纤通信窗口中是有意义的，并且其波长比当前标准的掺铒二氧化硅光纤放大器稍短。 因此，该装置延长了可被长距离通信支持的波长带。 附加波长带允许通过波分复用（WDM）大幅增加数据传输速率，对目前用于WDM系统的标准设备进行最小修改。 主机玻璃与标准的二氧化硅电信光纤直接兼容。 本发明还使得能够在各种替代转变上改性硅酸盐基放大器和激光器。 具体来说，描述了使用真硅酸盐纤维主体的S波段ium掺杂光纤放大器（TDFA）。

公开(公告)号：US20030030892A1

公开(公告)日：2003-02-13

申请号：US10261619

申请日：2002-10-02

Inventor： Michael Dennis ,  Brian Cole

IPC: H01S003/067 ,  G02B006/26

CPC classification number: H01S3/06716 ,  C03C3/06 ,  C03C3/095 ,  C03C13/046 ,  C03C2201/30 ,  C03C2201/3411 ,  C03C2201/347 ,  C03C2201/3482 ,  C03C2201/40 ,  H01S3/06754 ,  H01S3/06775 ,  H01S3/1603 ,  H01S3/161 ,  H01S3/1616 ,  H01S3/1698 ,  H01S3/17

Abstract: A device amplifies light at wavelengths in the vicinity of 1420-1530 nm, using thulium doped silica-based optical fiber. This wavelength band is of interest as it falls in the low-loss optical fiber telecommunications window, and is somewhat shorter in wavelength than the currently standard erbium doped silica fiber amplifier. The device thus extends the band of wavelengths which can be supported for long-distance telecommunications. The additional wavelength band allows the data transmission rate to be substantially increased via wavelength division multiplexing (WDM), with minimal modification to the standard equipment currently used for WDM systems. The host glass is directly compatible with standard silica-based telecommunications fiber. The invention also enables modified silicate based amplifiers and lasers on a variety of alternative transitions. Specifically, an S-band thulium doped fiber amplifier (TDFA) using a true silicate fiber host is described.

Abstract translation: 器件利用ium掺杂的二氧化硅基光纤放大1420-1530nm附近波长的光。 该波长带在低损耗光纤通信窗口中是有意义的，并且其波长比当前标准的掺铒二氧化硅光纤放大器稍短。 因此，该装置延长了可被长距离通信支持的波长带。 附加波长带允许通过波分复用（WDM）大幅增加数据传输速率，对目前用于WDM系统的标准设备进行最小修改。 主机玻璃与标准的二氧化硅电信光纤直接兼容。 本发明还使得能够在各种替代转变上改性硅酸盐基放大器和激光器。 具体来说，描述了使用真硅酸盐纤维主体的S波段ium掺杂光纤放大器（TDFA）。

公开(公告)号：US20020072461A1

公开(公告)日：2002-06-13

申请号：US09986754

申请日：2001-11-09

Inventor： Yoshinobu Akimoto ,  Hiroaki Kinoshita

IPC: C03C003/076

CPC classification number: C03C1/006 ,  C03B19/12 ,  C03B2201/40 ,  C03B2201/50 ,  C03C3/06 ,  C03C3/078 ,  C03C4/082 ,  C03C13/046 ,  C03C2201/30 ,  C03C2201/40 ,  C03C2201/50 ,  C03C2203/20 ,  Y10S501/905

Abstract: The invention relates to a glass excellent in infrared absorption capability and corrosion resistance, and its fabrication process. A compound of divalent copper and a compound of a metal species for a network modifier oxide are introduced in a wet gel. Then, the wet gel is dipped in a dipping solution having a low solubility with respect to the compound of divalent copper and the compound of a metal species for a network modifier oxide for the precipitation in the wet gel of the divalent copper compound and the compound of a metal species for a network modifier oxide, followed by drying and firing. Thus, an infrared absorbing glass comprising 70 to 98 mol % of SiO2, 1 to 12 mol % of CuO and 1 to 18 mol % of a network modifier oxide other than CuO is fabricated.

Abstract translation: 本发明涉及一种红外吸收能力和耐腐蚀性优异的玻璃及其制造工艺。 将二价铜的化合物和用于网络改性剂氧化物的金属物质的化合物引入湿凝胶中。 然后，将湿凝胶浸入相对于二价铜化合物的低溶解度的浸渍溶液和用于网络改性剂氧化物的金属物质的化合物，用于在二价铜化合物和化合物的湿凝胶中沉淀 的金属物质用于网络改性剂氧化物，然后干燥和烧制。 因此，制造包含70〜98摩尔％的SiO 2，1〜12摩尔％的CuO和1〜18摩尔％的CuO以外的网络改性剂氧化物的红外线吸收玻璃。