公开(公告)号：US20140197325A1

公开(公告)日：2014-07-17

申请号：US14005078

申请日：2012-03-14

Applicant: Takahisa Kato ,  Yutaka Setomoto

Inventor： Takahisa Kato ,  Yutaka Setomoto

IPC: H01J37/12 ,  H01J3/18

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/18 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207

Abstract: An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are each larger than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

Abstract translation: 静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔 表面到第二表面。 当开口横截面被定义为沿着垂直于法线的平面截取的通孔的横截面，并且代表性直径被定义为通过对开口横截面进行回归分析而获得的圆的直径时，代表 在第一表面侧的第一区域中的开口横截面的直径和位于第二表面侧的第二区域中的开口横截面的代表性直径分别大于开口横截面的代表性直径 第三区域，其是设置在第一表面和第二表面之间的电极中的区域。

公开(公告)号：US20140190006A1

公开(公告)日：2014-07-10

申请号：US14005037

申请日：2012-03-14

Applicant: Yutaka Setomoto ,  Takahisa Kato

Inventor： Yutaka Setomoto ,  Takahisa Kato

IPC: H05K3/46

CPC classification number: H05K3/4679 ,  H01J37/12 ,  H01J2237/0437 ,  H01J2237/04924 ,  H01J2237/1205 ,  Y10T29/49165

Abstract: There is provided a method for manufacturing a charged particle beam lens having a bonded electrode obtained by bonding at least a first conductive substrate having a first through-hole and a second conductive substrate having a second through-hole. The above method includes: forming the first through-hole in the first conductive substrate; forming the second through-hole in the second conductive substrate; and bonding the first conductive substrate and the second conductive substrate so that the first through-hole and the second through-hole communicate with each other.

Abstract translation: 提供了一种制造带电粒子束透镜的方法，该方法具有通过将至少具有第一通孔的第一导电基板和具有第二通孔的第二导电基板结合而获得的接合电极。 上述方法包括：在第一导电衬底中形成第一通孔; 在第二导电衬底中形成第二通孔; 并且将第一导电基板和第二导电基板接合，使得第一通孔和第二通孔彼此连通。

公开(公告)号：US20130334437A1

公开(公告)日：2013-12-19

申请号：US13900947

申请日：2013-05-23

Applicant: CANON KABUSHIKI KAISHA

Inventor： Tadayuki Yoshitake ,  Yoichi Ando

IPC: H01J29/62 ,  H01J9/18

CPC classification number: H01J29/62 ,  B82Y10/00 ,  B82Y40/00 ,  H01J1/46 ,  H01J3/027 ,  H01J9/14 ,  H01J9/18 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  Y10T29/49082

Abstract: An electrostatic lens includes a first electrode and a second electrode that are arranged oppositely relative to each other with a gap separating them from each other and the first and second electrodes have respective through-holes for allowing a charged particle beam to pass through the through-hole, wherein at least either the first electrode or the second electrode comprises two or more regions; and the through-hole of the electrode with the two or more regions is arranged at least in one of the regions; while the regions are electrically connected to each other by way of a resistor.

Abstract translation: 静电透镜包括彼此相对布置的第一电极和第二电极，其间隔开彼此间隔开，并且第一和第二电极具有用于允许带电粒子束穿过通孔的通孔， 其中所述第一电极或所述第二电极中的至少一个包括两个或更多个区域; 并且具有两个或更多个区域的电极的通孔至少布置在其中一个区域中; 而这些区域通过电阻器彼此电连接。

公开(公告)号：US20130248731A1

公开(公告)日：2013-09-26

申请号：US13733955

申请日：2013-01-04

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Sayaka TANIMOTO ,  Hiroya OHTA ,  Makoto SAKAKIBARA ,  Momoyo ENYAMA ,  Kenji TANIMOTO

IPC: H01J37/10

CPC classification number: H01J37/10 ,  H01J37/153 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1534

Abstract: There is provided both an electron beam apparatus and a lens array, capable of correcting a curvature of field aberration under various optical conditions. The electron beam apparatus comprises the lens array having a plurality of electrodes, and multiple openings are formed in the respective electrodes. An opening diameter distribution with respect to the respective opening diameters of the plural openings formed in the respective electrodes are individually set, and voltages applied to the respective electrodes are independently controlled to thereby independently adjust an image forming position of a reference beam, and a curvature of the lens array image surface.

Abstract translation: 提供能够在各种光学条件下校正场像差曲率的电子束装置和透镜阵列。 电子束装置包括具有多个电极的透镜阵列，并且在各个电极中形成多个开口。 分别设置相对于形成在各个电极中的多个开口的开口直径的开口直径分布，并且独立地控制施加到各个电极的电压，从而独立地调整参考光束的图像形成位置和曲率 的透镜阵列图像表面。

公开(公告)号：US08362441B2

公开(公告)日：2013-01-29

申请号：US12901468

申请日：2010-10-08

Applicant: Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

Inventor： Johan Joost Koning ,  Stijn Willem Herman Steenbrink ,  Bart Schipper

IPC: H01J37/12

CPC classification number: H01J3/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  Y10T29/49002

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

公开(公告)号：US20120288799A1

公开(公告)日：2012-11-15

申请号：US13462013

申请日：2012-05-02

Applicant: Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

Inventor： Hiromitsu Takase ,  Ichiro Tanaka ,  Akira Miyake

IPC: G03F7/20 ,  G21K5/08

CPC classification number: H01J37/3177 ,  B08B5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70925 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/1205

Abstract: A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.

Abstract translation: 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。

公开(公告)号：US08188450B2

公开(公告)日：2012-05-29

申请号：US13050875

申请日：2011-03-17

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J3/14 ,  A61N5/00

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

公开(公告)号：US08089056B2

公开(公告)日：2012-01-03

申请号：US12393049

申请日：2009-02-26

Applicant: Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

Inventor： Marco Jan Jaco Wieland ,  Bert Jan Kampherbeek ,  Alexander Hendrik Van Veen ,  Pieter Kruit ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/12 ,  H01J37/30

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151

Abstract: A charged particle multi-beamlet system for exposing a target using a plurality of beamlets. The system comprises a first plate having a plurality of holes formed in it, with a plurality of electrostatic projection lens systems formed at the location of each hole so that each electron beamlet passes through a corresponding projection lens system. The holes have sufficiently uniform placement and dimensions to enable focusing of the beamlets onto the surface of the target using a common control voltage. Preferably the electrostatic projection lens systems are controlled by a common electrical signal to focus the electron beamlets on the surface without correction of the focus or path of individual electron beamlets.

Abstract translation: 一种用于使用多个子束曝光目标的带电粒子多子束系统。 该系统包括在其中形成有多个孔的第一板，形成在每个孔的位置处的多个静电投影透镜系统，使得每个电子束通过相应的投影透镜系统。 这些孔具有足够均匀的放置和尺寸以使得能够使用公共控制电压将子束聚焦到靶的表面上。 优选地，静电投影透镜系统由公共电信号控制，以将电子束聚焦在表面上，而无需校正各个电子束的聚焦或路径。

公开(公告)号：US20110124186A1

公开(公告)日：2011-05-26

申请号：US12947078

申请日：2010-11-16

Applicant: Anthony Renau ,  Ludovic Godet ,  Timothy J. Miller ,  Joseph C. Olson ,  Vikram Singh ,  James Buonodono ,  Frank Sinclair ,  Deepak A. Ramappa ,  Russell Low ,  Atul Gupta ,  Kevin M. Daniels

Inventor： Anthony Renau ,  Ludovic Godet ,  Timothy J. Miller ,  Joseph C. Olson ,  Vikram Singh ,  James Buonodono ,  Frank Sinclair ,  Deepak A. Ramappa ,  Russell Low ,  Atul Gupta ,  Kevin M. Daniels

IPC: H01L21/265 ,  G21K5/10

CPC classification number: B01J19/081 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32623 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01L21/2236 ,  H01L31/022425 ,  H01L31/068 ,  H01L31/08 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.

Abstract translation: 等离子体处理装置包括等离子体源，其被配置为在等离子体室中产生等离子体，使得等离子体包含用于注入工件的离子。 该装置还包括聚焦板装置，该聚焦板装置具有孔结构，其被配置为修改离开聚焦板附近的等离子体鞘的等离子体鞘的形状，使得离开孔结构的孔的离子限定聚焦离子。 该设备还包括处理室，其包含与聚焦板间隔开的工件，使得在工件处的聚焦离子的固定注入区域基本上比孔更窄。 该装置被配置为通过在离子注入期间扫描工件来在工件中产生多个图案化区域。

公开(公告)号：US20110079731A1

公开(公告)日：2011-04-07

申请号：US12994944

申请日：2009-05-27

Applicant: Ho Seob Kim

Inventor： Ho Seob Kim

IPC: H01J3/18

CPC classification number: H01J37/12 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/1536

Abstract: The present invention relates to an electron lens for use in an microcolumn, and more particularly to a multipole electron lens wherein the electron lens includes two or more electrode layers, each of the electrode layers has a slit aperture extending across a central optical axis along which an electron beam passes, and the two electrode layers are aligned on an electron optical axis such that the slit apertures are staggered with each other. Further, the present invention relates to a microcolumn using the multipole lens. The multipole lens according to the present invention can be manufactured and controlled in a simple fashion, reduces the defocusing of the microcolumn, and increases an active deflection area.

Abstract translation: 本发明涉及一种用于微柱的电子透镜，更具体地说，涉及一种多极电子透镜，其中电子透镜包括两个或更多个电极层，每个电极层具有沿中心光轴延伸的狭缝孔， 电子束通过，并且两个电极层在电子光轴上对齐，使得狭缝孔彼此交错。 此外，本发明涉及使用多极透镜的微柱。 根据本发明的多极镜头可以以简单的方式制造和控制，减少了微柱的散焦，并增加了主动偏转面积。