公开(公告)号：US6040582A

公开(公告)日：2000-03-21

申请号：US22794

申请日：1998-02-13

Applicant: Han-sung Kim

Inventor： Han-sung Kim

IPC: H01L21/265 ,  H01J37/05 ,  H01J37/30

CPC classification number: H01J37/05 ,  H01J2237/31701

Abstract: A focusing guide for focusing an ion beam passing through the chamber of an ion analyzer is provided. A controllable electric of magnetic field is generated around the focusing guide to direct selected ions through the chamber outlet without significantly reducing ion beam current intensity. The focused ion beam reduces collisions of ions with the chamber and also reduces secondary electron generation which can weaken ion beam intensity and increase ion implantation processing time.

Abstract translation: 提供了一种用于聚焦穿过离子分析器的室的离子束的聚焦引导件。 在聚焦引导件周围产生可控的磁场电场，以引导选定的离子通过腔室出口，而不会显着降低离子束电流强度。 聚焦离子束减少离子与室的碰撞，并且还减少二次电子产生，这可以削弱离子束强度并增加离子注入处理时间。

公开(公告)号：US6040576A

公开(公告)日：2000-03-21

申请号：US145397

申请日：1998-09-01

Applicant: Gerd Benner

Inventor： Gerd Benner

IPC: G01Q30/02 ,  H01J37/05 ,  H01J49/46 ,  H01J37/26

CPC classification number: H01J37/05 ,  H01J2237/28

Abstract: An energy filter, particularly for electron microscopes, in which the setting of different energy bandwidths takes place electron-optically. For this purpose, one or more deflecting systems and one or more transfer lenses are provided at the filter exit. A diaphragm arrangement is arranged in the dispersion plane and has an opening with a stepped edge region. Slit diaphragms with different slit lengths can be simulated by deflection of the electron beam. The deflection of the electron beam effected by the dispersion system(s) perpendicularly to the dispersive direction of the filter is compensated again by a succeeding transfer lens or a further deflecting system, so that an image displacement is also compensated. In a second embodiment, a respective slit edge is arranged in two mutually conjugate spectrum planes. A deflecting system preceding each slit edge, different spectrum portions are filtered out by the two slit edges, according to the excitation of the deflecting systems. The energy bandwidth can be varied continuously in this embodiment.

Abstract translation: 特别是用于电子显微镜的能量过滤器，其中不同能量带宽的设定以电子光学方式进行。 为此，在过滤器出口处设置一个或多个偏转系统和一个或多个传递透镜。 隔膜装置布置在分散平面中并且具有带有台阶边缘区域的开口。 可以通过电子束的偏转来模拟具有不同狭缝长度的狭缝膜片。 由分散系统垂直于滤色器的色散方向影响的电子束的偏转由后续的转印透镜或另外的偏转系统再次补偿，使得图像位移也被补偿。 在第二实施例中，相应的狭缝边缘被布置在两个相互共轭的光谱平面中。 根据偏转系统的激发，在每个狭缝边缘之前的偏转系统，不同的光谱部分被两个狭缝边缘滤出。 在本实施例中，能量带宽可以连续变化。

公开(公告)号：US5866909A

公开(公告)日：1999-02-02

申请号：US875822

申请日：1997-08-07

Applicant: James Harry Freeman

Inventor： James Harry Freeman

IPC: H01J27/08 ,  H01J27/20 ,  H01J37/05 ,  H01J37/08 ,  H01J37/317 ,  H01J49/10 ,  B01D59/44

CPC classification number: H01J49/10 ,  H01J27/20 ,  H01J37/05

Abstract: A mass-analysed ion beam generator in which the ion beam is in the form of a thin flat ribbon with its major transverse dimension aligned parallel with the direction of the mass-analysing magnetic field.

Abstract translation: PCT No.PCT / GB96 / 00359 Sec。 371日期1997年8月7日 102（e）日期1997年8月7日PCT 1996年2月16日PCT公布。 出版物WO96 / 26530 日期1996年8月29日一种质量分析离子束发生器，其中离子束是薄平坦带形式，其主横向尺寸与质量分析磁场的方向平行排列。

公开(公告)号：US5838004A

公开(公告)日：1998-11-17

申请号：US849205

申请日：1997-06-02

Applicant: Peter Christiaan Tiemeijer ,  J. Chmelik ,  Pieter Kruit

Inventor： Peter Christiaan Tiemeijer ,  J. Chmelik ,  Pieter Kruit

IPC: H01J37/05 ,  H01J37/09 ,  H01J37/04

CPC classification number: H01J37/05 ,  H01J2237/057

Abstract: An electron microscope comprises an energy-selective filter (10) which is arranged ahead of the high-voltage field in the electron gun (2). Because the filter carries high-voltage potential and is arranged within the gun space (14) which is filled with SF.sub.6 gas, problems arise regarding electrical and mechanical passages to the filter. Notably the centering of the filter is problematic. In order to enable suitable aperture adjustment of the filter nevertheless (for current limitation and for avoiding optical aberrations introduced into the beam by the filter), there is provided an entrance diaphragm (30) which is rigidly connected to the filter parts, notably to a pole face or to a field-defining closing piece (48a) of the filter.

Abstract translation: PCT No.PCT / IB96 / 01029 Sec。 371日期：1997年6月2日 102（e）日期1996年6月2日PCT提交1996年10月1日PCT公布。 公开号WO97 / 13268 日期1997年04月10日电子显微镜包括设置在电子枪（2）中的高压场前方的能量选择滤光器（10）。 因为过滤器承载高压电位并且被布置在填充有SF 6气体的枪空间（14）内，所以关于过滤器的电和机械通道出现问题。 值得注意的是过滤器的中心是有问题的。 为了使滤波器适当的孔径调节（为了限制电流并避免由滤波器引入到光束中的光学像差），提供了一个入口隔膜（30），其刚性地连接到过滤器部件，特别是一个 极面或过滤器的场界定闭合件（48a）。

公开(公告)号：US5396076A

公开(公告)日：1995-03-07

申请号：US61308

申请日：1993-05-14

Applicant: Hideki Kimura

Inventor： Hideki Kimura

IPC: H01J27/02 ,  H01J37/05 ,  H01J37/09 ,  H01J37/317 ,  H01J49/26 ,  H01L21/265 ,  H01J37/00

CPC classification number: H01J37/09 ,  H01J37/05 ,  H01J2237/0213 ,  H01J2237/31701

Abstract: An ion implantation system composed of an ion source to generate ion beam, a mass analyzing region to select ions having a predetermined mass from the ion beam, an acceleration region to accelerate the ion beam selected, scanning regions to respectively scan the ion beam toward the X and Y directions, and protecting means located along the exposed surface of the inner wall of the mass analyzing region. The protecting means may be formed of a thin silicon plate, and located to cover the inner wall of the mass analyzing region. Preferably, the silicon plate is located at an upper and a lower portion of an exposed surface of the inner wall of the mass analyzing region. The protecting means may be formed of plurality of silicon plates that can be disassembled.

Abstract translation: 由离子源构成的离子注入系统，用于产生离子束，从离子束选择具有规定质量的离子的质量分析区域，加速选择的离子束的加速区域，扫描区域，分别扫描离子束朝向 X方向和Y方向，以及沿着质量分析区域的内壁的暴露表面设置的保护装置。 保护装置可以由薄硅板形成，并且被定位成覆盖质量分析区域的内壁。 优选地，硅板位于质量分析区域的内壁的暴露表面的上部和下部。 保护装置可以由能够拆卸的多个硅板形成。

公开(公告)号：US5306920A

公开(公告)日：1994-04-26

申请号：US980062

申请日：1992-11-23

Applicant: Jerry S. King ,  Carl E. D'Acosta ,  Craig L. Jasper ,  Dan A. Banks

Inventor： Jerry S. King ,  Carl E. D'Acosta ,  Craig L. Jasper ,  Dan A. Banks

IPC: H01J37/05 ,  H01J37/09

CPC classification number: H01J37/09 ,  H01J37/05 ,  H01J2237/0455 ,  H01J2237/31701

Abstract: An ion implantation apparatus including a resolving aperture-shutter assembly (31) placed in the ion beam path (18). The resolving aperture-shutter assembly includes a movable shutter (34) and a shutter housing surrounding the movable shutter (34). Selected ions in an ion beam path (18) pass through a hole (44) in movable shutter (34) when the movable shutter (34) is in a first position, and are blocked by the solid surfaces when the movable shutter (34) is in a second position. The enclosure (32, 33, 39) completely surrounds the movable shutter (34). The enclosure (32, 33, 39) includes a first aperture (42) aligned with the ion beam path (18) for allowing the selected ions to enter the enclosure and a second aperture (41) aligned with the ion beam path (18) for allowing the selected ions to exit the enclosure after passing through the hole (44) in the movable shutter.

Abstract translation: 一种离子注入装置，包括放置在离子束路径（18）中的分辨孔径光阑组件（31）。 分辨孔径光阑组件包括活动快门（34）和围绕活动快门（34）的快门壳体。 当活动快门（34）处于第一位置时，离子束路径（18）中的选定离子通过活动快门（34）中的孔（44），并且当活动快门（34）被固定时被固体表面阻挡， 处于第二位置。 外壳（32,33,39）完全包围活动活门（34）。 外壳（32,33,39）包括与离子束路径（18）对准的用于允许所选择的离子进入外壳的第一孔（42）和与离子束路径（18）对准的第二孔（41） 用于允许所选择的离子在通过可移动快门中的孔（44）之后离开外壳。

公开(公告)号：US5300775A

公开(公告)日：1994-04-05

申请号：US15694

申请日：1993-02-09

Applicant: Karel D. Van der Mast

Inventor： Karel D. Van der Mast

IPC: G01Q30/06 ,  G01Q30/20 ,  H01J37/05 ,  H01J37/06 ,  H01J37/26 ,  H01J49/44

CPC classification number: H01J37/05

Abstract: A method and apparatus for selecting the spatial energy spread of an electron beam for producing an image of an object, as in an electron microscope. An energy-dispersive member is arranged in the vicinity of the electron beam source to widen the electron beam in a dispersion direction. Selection of an energy dispersion within the beam is achieved by selecting a number of pixels having such a local energy dispersion in the image plane of the object.

Abstract translation: 用于选择用于产生物体的图像的电子束的空间能量扩展的方法和装置，如在电子显微镜中。 在电子束源附近配置能量分散构件，以使分散方向的电子束变宽。 通过在对象的图像平面中选择具有这样的局部能量色散的像素的数量来实现光束内的能量色散的选择。

公开(公告)号：US5206516A

公开(公告)日：1993-04-27

申请号：US692589

申请日：1991-04-29

Applicant: John H. Keller ,  Dennis K. Coultas

Inventor： John H. Keller ,  Dennis K. Coultas

IPC: H01J37/141 ,  H01J37/05 ,  H01J37/317 ,  H01L21/265 ,  H01L21/268

CPC classification number: H01J37/05 ,  H01J37/3178 ,  H01J2237/0041 ,  H01J2237/055

Abstract: An ion beam deposition system in which ions of different masses and from different sources are independently steered into different parts of an analyzer magnet to be converged into a single wide beam which maintains a perpendicular relationship between the beam and the target. The beam is decelerated by a slit type deceleration lens to an energy suitable for deposition. The target is then scanned across the decelerated beam. The beam is maintained at high current and low pressure by confining electrons away from the magnet and/or adding energy to the low pressure atmosphere inside the analyzer magnet to produce a plasma of electrons and charged particles in order to provide adequate neutralizing of the space charge of the beam.

Abstract translation: 一种离子束沉积系统，其中不同质量和不同源的离子被独立地转导到分析器磁体的不同部分中，以被聚集成单个宽光束，其维持光束和目标之间的垂直关系。 光束通过狭缝式减速透镜减速到适于沉积的能量。 然后将目标扫描在减速梁上。 通过将电子限制在远离磁体的位置和/或向分析器磁体内部的低压气氛中增加能量，将光束保持在高电流和低压，以产生电子和带电粒子的等离子体，以便提供足够的中和空间电荷 的梁。

公开(公告)号：US5130552A

公开(公告)日：1992-07-14

申请号：US628795

申请日：1990-12-17

Applicant: Nicholas Bright ,  David R. Burgin ,  Timothy G. Morgan ,  Craig J. Lowrie ,  Hiroyuki Ito

Inventor： Nicholas Bright ,  David R. Burgin ,  Timothy G. Morgan ,  Craig J. Lowrie ,  Hiroyuki Ito

IPC: C23C14/48 ,  H01J37/05 ,  H01J37/09 ,  H01J37/317 ,  H01L21/265

CPC classification number: H01J37/05 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/31705

Abstract: An ion implantation system is modified to allow variation in the size of the aperture of the mass resolving system, thereby allowing more ions of one mass or ion of more than one mass, such as isotopes, to pass through said opening. Including all isotopes of the desired dopant ions to be collected increases beam current, and consequently the throughput of the implantation process, reduces contamination, and improves the dosage control.

公开(公告)号：US4789787A

公开(公告)日：1988-12-06

申请号：US55414

申请日：1987-05-27

Applicant: Norman W. Parker

Inventor： Norman W. Parker

IPC: H01J37/05 ,  H01J49/28 ,  H01J49/48 ,  H01J3/14 ,  B01D59/44 ,  G21K1/08

CPC classification number: H01J49/288 ,  H01J37/05

Abstract: A Wien filter for use in charged particle beam systems is disclosed, having two opposed resistive magnetic pole pieces separated from a set of excitation coils by an electrically insulating material. Two opposed electric pole pieces are positioned in orthogonal relationship to and in physical contact with the magnetic pole pieces to form a physical aperture through which the charged particles will pass. The resistivity of the magnetic pole pieces is such that sufficient current will flow through them between the electric pole pieces to establish a uniform electric field over the entire physical aperture.

Abstract translation: 公开了一种用于带电粒子束系统的维恩滤波器，其具有通过电绝缘材料与一组励磁线圈分离的两个相对的电阻磁极片。 两个相对的电极片与磁极片正交关系并与之物理接触，以形成带电粒子通过的物理孔径。 磁极片的电阻率使得足够的电流将在电极片之间流过它们，以在整个物理孔径上建立均匀的电场。