CIRCUIT BOARD AND FABRICATION METHOD THEREOF
    113.
    发明申请
    CIRCUIT BOARD AND FABRICATION METHOD THEREOF 审中-公开
    电路板及其制造方法

    公开(公告)号:US20130040071A1

    公开(公告)日:2013-02-14

    申请号:US13653423

    申请日:2012-10-17

    Abstract: A method for fabricating a circuit board is provided. A non-conductive material layer is provided on a core substrate, wherein the non-conductive material layer comprises a dielectric material and catalytic particles. A recessed circuit structure is then formed in the non-conductive material layer with a laser beam. Simultaneously, the catalytic particles in the recessed circuit structure are activated with aid of the laser. A buried conductive structure is then formed in the recessed circuit structure by chemical copper deposition methods.

    Abstract translation: 提供一种制造电路板的方法。 非导电材料层设置在芯基板上,其中非导电材料层包括电介质材料和催化颗粒。 然后在非导电材料层中用激光束形成凹陷的电路结构。 同时,凹陷电路结构中的催化颗粒借助于激光器被激活。 然后通过化学铜沉积方法在凹陷电路结构中形成掩埋导电结构。

    Fabricating process of structure with embedded circuit
    114.
    发明授权
    Fabricating process of structure with embedded circuit 有权
    嵌入式电路结构的制造工艺

    公开(公告)号:US08187478B2

    公开(公告)日:2012-05-29

    申请号:US12211637

    申请日:2008-09-16

    Applicant: Yi-Chun Liu

    Inventor: Yi-Chun Liu

    Abstract: A fabricating process of a structure with an embedded circuit is described as follows. Firstly, a substrate having an upper surface and a lower surface opposite to the upper surface is provided. Afterward, a dielectric layer is formed on the upper surface of the substrate. Next, a plating-resistant layer is formed on the dielectric layer. Then, the plating-resistant layer and the dielectric layer are patterned for forming an recess pattern on the dielectric layer. Subsequently, a conductive base layer is formed in the recess pattern by using a chemical method, and the plating-resistant layer is exposed by the conductive base layer. After that, the plating-resistant layer is removed.

    Abstract translation: 具有嵌入电路的结构的制造工艺描述如下。 首先,提供具有与上表面相对的上表面和下表面的基板。 之后,在基板的上表面形成电介质层。 接下来,在电介质层上形成耐电镀层。 然后,对电镀层和电介质层进行图案化以在电介质层上形成凹陷图案。 随后,通过使用化学方法在凹陷图案中形成导电性基底层,并且通过导电性基底层露出耐电镀层。 之后,除去耐电镀层。

    MULTILAYER THREE-DIMENSIONAL CIRCUIT STRUCTURE
    115.
    发明申请
    MULTILAYER THREE-DIMENSIONAL CIRCUIT STRUCTURE 审中-公开
    多层三维电路结构

    公开(公告)号:US20110253435A1

    公开(公告)日:2011-10-20

    申请号:US13166133

    申请日:2011-06-22

    Abstract: A multilayer three-dimensional circuit structure and a manufacturing method thereof are provided in the present invention. The manufacturing method includes following steps. First, a three-dimensional insulating structure is provided. A first three-dimensional circuit structure is then formed on a surface of the three-dimensional insulating structure. Next, an insulating layer covering the first three-dimensional circuit structure is formed. Thereafter, a second three-dimensional circuit structure is formed on the insulating layer. Subsequently, at least a conductive via penetrating the insulating layer is formed for electrically connecting the second three-dimensional circuit structure and the first three-dimensional circuit structure.

    Abstract translation: 本发明提供了一种多层三维电路结构及其制造方法。 制造方法包括以下步骤。 首先,提供三维绝缘结构。 然后在三维绝缘结构的表面上形成第一三维电路结构。 接下来,形成覆盖第一三维电路结构的绝缘层。 此后,在绝缘层上形成第二三维电路结构。 随后,至少形成了穿过绝缘层的导电通孔,用于电连接第二三维电路结构和第一三维电路结构。

    Multilayer three-dimensional circuit structure and manufacturing method thereof
    116.
    发明授权
    Multilayer three-dimensional circuit structure and manufacturing method thereof 有权
    多层三维电路结构及其制造方法

    公开(公告)号:US07987589B2

    公开(公告)日:2011-08-02

    申请号:US12333014

    申请日:2008-12-11

    Abstract: A multilayer three-dimensional circuit structure and a manufacturing method thereof are provided in the present invention. The manufacturing method includes following steps. First, a three-dimensional insulating structure is provided. A first three-dimensional circuit structure is then formed on a surface of the three-dimensional insulating structure. Next, an insulating layer covering the first three-dimensional circuit structure is formed. Thereafter, a second three-dimensional circuit structure is formed on the insulating layer. Subsequently, at least a conductive via penetrating the insulating layer is formed for electrically connecting the second three-dimensional circuit structure and the first three-dimensional circuit structure.

    Abstract translation: 本发明提供了一种多层三维电路结构及其制造方法。 制造方法包括以下步骤。 首先,提供三维绝缘结构。 然后在三维绝缘结构的表面上形成第一三维电路结构。 接下来,形成覆盖第一三维电路结构的绝缘层。 此后,在绝缘层上形成第二三维电路结构。 随后,至少形成了穿过绝缘层的导电通孔,用于电连接第二三维电路结构和第一三维电路结构。

    COMPOSITION WITH CATALYST PARTICLES
    117.
    发明申请
    COMPOSITION WITH CATALYST PARTICLES 审中-公开
    具有催化剂颗粒的组合物

    公开(公告)号:US20110143922A1

    公开(公告)日:2011-06-16

    申请号:US12854366

    申请日:2010-08-11

    Abstract: A composition with catalyst particles for making a circuit pattern is provided. The composition includes an insulation material and a plurality of catalyst particles. The catalyst particles are distributed in the insulation material and not made of metal. When the composition is bathed in a chemical plating solution, a redox reaction takes place between some of the catalyst particles and the chemical plating solution so as to deposit a conductive pattern on the composition.

    Abstract translation: 提供具有用于制造电路图案的催化剂颗粒的组合物。 该组合物包括绝缘材料和多个催化剂颗粒。 催化剂颗粒分布在绝缘材料中,不由金属制成。 当组合物浸在化学镀溶液中时,在一些催化剂颗粒和化学镀溶液之间发生氧化还原反应,以便在组合物上沉积导电图案。

    CIRCUIT BOARD AND FABRICATION METHOD THEREOF
    118.
    发明申请
    CIRCUIT BOARD AND FABRICATION METHOD THEREOF 审中-公开
    电路板及其制造方法

    公开(公告)号:US20110094778A1

    公开(公告)日:2011-04-28

    申请号:US12606192

    申请日:2009-10-27

    Abstract: A method for fabricating a circuit board is provided. A non-conductive material layer is provided on a core substrate, wherein the non-conductive material layer comprises a dielectric material and catalytic particles. A recessed circuit structure is then formed in the non-conductive material layer with a laser beam. Simultaneously, the catalytic particles in the recessed circuit structure are activated with aid of the laser. A buried conductive structure is then formed in the recessed circuit structure by chemical copper deposition methods.

    Abstract translation: 提供一种制造电路板的方法。 非导电材料层设置在芯基板上,其中非导电材料层包括电介质材料和催化颗粒。 然后在非导电材料层中用激光束形成凹陷的电路结构。 同时,凹陷电路结构中的催化颗粒借助于激光器被激活。 然后通过化学铜沉积方法在凹陷电路结构中形成掩埋导电结构。

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