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公开(公告)号：US20240004313A1
公开(公告)日：2024-01-04
申请号：US18039373
申请日：2021-11-16
Applicant: ASML Netherlands B.V.
IPC: G03F7/00 , G01B11/27 , G01N21/956 , G02B27/64
CPC classification number: G03F7/706851 , G03F7/70633 , G03F7/7065 , G01B11/272 , G01N21/956 , G02B27/646 , G01N2201/063
Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.
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公开(公告)号：US20240004308A1
公开(公告)日：2024-01-04
申请号：US18021905
申请日：2021-08-03
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Ali ALSAQQA , Aabid PATEL , Patrick Sebastian UEBEL , Amir ABDOLVAND , Paulus Antonius Andreas TEUNISSEN , Wisham F. KADHIM
CPC classification number: G03F7/70625 , G02F1/3523 , G03F7/70041 , G03F7/70558
Abstract: A radiation source arrangement including: a radiation source operable to generate source radiation including source energy pulses; and at least one non-linear energy-filter operable to filter the source radiation to obtain filtered radiation including filtered energy pulses. The at least one non-linear energy-filter is operable to mitigate variation in energy in the filtered radiation by reducing the energy level of the source energy pulses which have an energy level corresponding to one of both extremities of an energy distribution of the source energy pulses by a greater amount than the source energy pulses which have an energy level corresponding to a peak of the energy distribution.
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123.发明公开公开(公告)号：US20240004127A1
公开(公告)日：2024-01-04
申请号：US18234096
申请日：2023-08-15
Applicant: ASML NETHERLANDS B.V.
Inventor： Patrick Sebastian UEBEL , Peter Maximilian Götz , Sebastian Thomas Bauerschmidt , Coen Hubertus Matheus Baltis , Janneke Ravensbergen
CPC classification number: G02B6/02328 , C03B37/15 , G02B6/0096 , G02B6/02347 , G03F7/7085 , G03F9/7034 , G03F9/7065 , C03B2203/16 , C03B2203/42
Abstract: Optical components and methods of manufacture thereof. A first optical component has a hollow-core photonic crystal fiber includes internal capillaries for guiding radiation and an outer capillary sheathing the internal capillaries; and at least an output end section having a larger inner cross-sectional dimension over at least a portion of the output end section than an inner cross-sectional dimension of the outer capillary along a central portion of the hollow-core photonic crystal fiber prior to the output end section. A second optical component includes a hollow-core photonic crystal fiber and a sleeve arrangement.
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公开(公告)号：USRE49784E1
公开(公告)日：2024-01-02
申请号：US17005212
申请日：2020-08-27
Applicant: ASML Netherlands B.V.
Inventor： Weiming Ren , Xuedong Liu , Xuerang Hu , Zhong-wei Chen
IPC: H01J37/06 , H01J37/28 , H01J37/147 , H01J37/22 , G01N23/2251 , H01J37/145 , H01J37/05 , H01J37/244
CPC classification number: H01J37/06 , G01N23/2251 , H01J37/05 , H01J37/145 , H01J37/1474 , H01J37/226 , H01J37/244 , H01J37/28 , G01N2223/418 , G01N2223/6116 , H01J2237/057 , H01J2237/2448 , H01J2237/2817
Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.
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125.发明授权公开(公告)号：US11860553B2
公开(公告)日：2024-01-02
申请号：US18100400
申请日：2023-01-23
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70775 , H02K3/02 , H02K41/02 , H02K55/00
Abstract: The invention provides an assembly having a cryostat and a flat coil layer of superconducting coils for use with a magnetic levitation and/or acceleration motor system of a lithographic apparatus. The cryostat has two insulation coverings. The coil layer is arranged between the two coverings. The coverings each have an inner plate configured to be cryocooled and an outer plate parallel to the inner plate, and an insulation system with a vacuum layer between the inner and outer plate. The insulation system of said covering has a layers of circular bodies, the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.
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Patent Agency Ranking
公开(公告)号：US11860546B2
公开(公告)日：2024-01-02
申请号：US17952119
申请日：2022-09-23
Applicant: ASML NETHERLANDS B.V.
Inventor： Pepijn Van Den Eijnden , Cornelius Maria Rops , Theodorus Wilhelmus Polet , Floor Lodewijk Keukens , Gheorghe Tanasa , Rogier Hendrikus Magdalena Cortie , Koen Cuypers , Harold Sebastiaan Buddenberg , Giovanni Luca Gattobigio , Evert Van Vliet , Nicolaas Ten Kate , Mark Johannes Hermanus Frencken , Jantien Laura Van Erve , Marcel Maria Cornelius Franciscus Teunissen
IPC: G03F7/00
CPC classification number: G03F7/70341 , G03F7/70525
Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.
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公开(公告)号：US20230400783A1
公开(公告)日：2023-12-14
申请号：US18027343
申请日：2021-09-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Michael Marinus Anna STEUR , Bas JANSEN , Andre Bernardus JEUNINK , Johannes Adrianus Cornelis Maria PIJNENBURG
IPC: G03F7/00
CPC classification number: G03F7/70716
Abstract: An object table including: a holding surface for holding an object; and an actuator arrangement configured to exert a holding force on the object for holding the object to the holding surface, wherein the actuator arrangement is further configured to decrease a strain in the object caused by the holding force by sequentially detaching and re-attaching portions of the object from the holding surface, while the object is held to the holding surface.
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128.发明公开公开(公告)号：US20230400778A1
公开(公告)日：2023-12-14
申请号：US18032273
申请日：2021-10-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Roy WERKMAN , Jochem Sebastiaan WILDENBERG , Reza SAHRAEIAN
IPC: G03F7/00 , G06N3/045 , G06N3/0475 , G06N3/094
CPC classification number: G03F7/705 , G06N3/045 , G06N3/0475 , G06N3/094
Abstract: A method to infer a current sampling scheme for one or more current substrates is provided, the method including: obtaining a first model trained to infer an optimal sampling scheme based on inputting context and/or pre-exposure data associated with one or more previous substrates, wherein the first model is trained in dependency of an outcome of a second model configured to discriminate between the inferred optimal sampling scheme and a pre-determined optimal sampling scheme; and using the obtained first model to infer the current sampling scheme based on inputting context and/or pre-exposure data associated with the one or more current substrate.
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129.发明公开公开(公告)号：US20230395352A1
公开(公告)日：2023-12-07
申请号：US18362757
申请日：2023-07-31
Applicant: ASML Netherlands B.V.
Inventor： Ning YE , Jun JIANG , Jian ZHANG , Yixiang WANG
IPC: H01J37/28 , H01J37/244 , H01J37/26
CPC classification number: H01J37/28 , H01J37/244 , H01J37/265 , H01J2237/0047 , H01J2237/2817
Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.
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公开(公告)号：US20230393458A1
公开(公告)日：2023-12-07
申请号：US18031865
申请日：2021-09-27
Applicant: ASML NETHERLANDS B.V.
Inventor： Jaiin MOON
IPC: G03F1/36
CPC classification number: G03F1/36
Abstract: A method for generating a mask pattern for a patterning process. The method includes obtaining (i) a subset of target features (e.g., features too close) within a target pattern, the subset of target features having physical characteristic values below a threshold value, and (ii) an initial mask pattern (e.g., using an existing OPC process) associated with the target pattern; and modifying, based on a mask manufacturing constraint and a performance metric of the patterning process, one or more features of the initial mask pattern corresponding to the subset of target features to generate the mask pattern, the modifying including applying a curvature to a portion of the one or more features of the initial mask pattern.
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